Note: Descriptions are shown in the official language in which they were submitted.
1 3
METHOD FOR FORMING VIDEO DISCS
This invention relates generally to methods for
forming video discs, and, more particularly, to methods
for producing optically~readable video disc masters and
stampers for use in forming video disc replicas.
Optically-readable video disc replicas are useful
in storing va~t quantities of information, usually in
the form of a frequency-modulated ~f.m.) carrier signal,
with a hi~h recording de~sity. The f.m. signal is
typically xecorded aæ a sequence of spaced pits or
bumps arranged in a succession of substantially circular
and concentric recording tracks. Each pit and adjacent
~pace between pits represents one cycle of t~he f.m~-
signal~
Disc replicas are typically formed in inj~ction-
moldiny apparatus using disc-shaped stampers derived
from recording masters. A recording master typically
includes a glass substxate haviny a disc shaped,
planar surface, with a thin recording layer 3uch as a
metal film o~erlaying it. Information is normally
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z
recorded in the recording layer by focusing an
intensity-modulated writing beam oE light onto the
layer using a radially-movable objective lens, as the
master is rotated at a prescribed rate. The intensity
of the beam is modulated in accordance with the f.m.
signal to be alternately greater than and less than a
predetermined threshold at which the metal film is
melted, whereby the succession of spaced pits is formed
in the film. The succession of pits and spaces
preferably has a nominal duty cycle of 50/50, whereby
the signal is recorded with minimum second harmonic
distortion.
The present invention resides in methods employed
in the manufacture of video disc masters of a type
having a photoresist recording layer, and in methods
for producing stampers from such mastersO The master
includes a glass substrate with a ~mooth, planar surface
on which a thin, uniform recording layer of photoresist
is deposited. An f.m. information signal is recorded
in the photoresist recording layer using an intensity-
modulated writing beam of light, producing a su~cession
of spaced exposed regions arranged i~ a succession of
substantially circular and concentric recordiny tracks.
In one aspect of ~he invention, the glass substrate
is initially prepared by dispensing an adhesion promoter
such as stannous chloride onto the surface of the
substrate while the substrate is rotated at a relatively
low ~elocity, e.g., about 75 to 100 r.p~m. The surf~ce
is then rinsed with water while still being rotated at
the relatively slow velocity, thereby removing residual
adhesion promoter, after which the rinsed surface is
dried by being rotated at a relatively high velocity,
e.g., about 750 to 1000 r.p.m.
i ~ ~5~1 ~
The method or preparing the substrate can further
include preliminary steps of polishing the surface
using a p~lishing compound haviny a submicron particle
size, and then cleaning the polished surface. The
cleaning step can include steps of flushing the surface
~first with a detergent solution and then with water,
drying the surface by rotating the substrate at the
relatively hi.gh velocity, and wiping the surface with
acetone to remove traces of dust and oil.
In another aspect of the invention, the photo-
resist recording layer is appli~d to the prepared
surfàce of the glass substrate by dispensing a photo-
resist solution onto the surface as the substrate is
being rotated at the reiatively low velocity, by then
rotating the substrate at the relatively high velocity
to partially dry the photoresist solution and form a
layer having a substantially uniform thickness, and by
finally baking the photoresist-coated substrate in a
prescribed fashion to completely dry the photoresist
layer. The photoresist solution is preferably Shipley
AZ 1350 photoresist having a viscosity of about 1.3
centipoise, and in the step of baking, ~he master i5
preferably baked at about 80 deyrees centigrade, for
about 20 minutes.
In another aspect of the invention, a thin metal
layer is formed on the glass substrate prior to the
application of the photo~ensitive recording layer.
Still another aspect of ~he in~ention re~ides in a
method for selecting an optimum peak intensity for the
intensity-modulated writing beam of light used in
recording the f.m. ~ignal on the photoresist recording
layer. In ~h.is aspect of the invention~-a prcscribed
test signal is initally recorded on th~ disc in a
succession of narrow sets of re~rding tracks, each set
being recorded using a w~itin~ beam having a dif2rent
3 $ 6 1 3
peak intensity. Since the photoresist layer is exposed
whenever the intensity o~ the beam exceeds a prede-
termined threshold, a higher peak intensity re~ults in
exposed regions of greater length. Each separate set
of recording tracks thus has a different duty cycle~
In o n e method, three or four sets of
tracks are recorded, having peak intensities that vary
in steps of about five percent. After development in
which the exposed regions forming each track are trans-
formed into a succession of spaced pits, the developeddisc is examined to determine the particular set of
tracks having spaced pits with a duty cycle closest to
an optimum value. The peak intensity of the beam is
then adjusted in accoxdance with this determination,
whereby the f.m. information signal can thereafter be
recorded with the optimum duty cycle on the remaining,
unexposed portions of the photoresist layer.
The test signal preferably has a prescribed,
constant frequency, and the sets of recording tracks
are preferably located near the periphery of the photo-
resist layer. Also, each set prefera~ly includes
several hundred tracks, and is ~eparated ~rom an
adjacent set by a narrow unexposed band of the photo-
resist layer. The developed photoresist layer i5
preferably examined by scanning each set o tracks with
a reading beam of light, to produce a refle~ted beam
that is modulated in intensity in accordance with the
recorded pattern of spaced pits, and by then detecting
the modulated intensity and monitoring it using a
spectrum analyzer.
In yet another aspect of the invention, the exposed
photoresist layer is developed by dispensing onto the
layer, while it is rotating at the relatively low
velocity (eOg., 75 to 100 r.p.m.), first water, to
l 3
pre-wet the layer, then both water and a developer
solution of a prescribed normality, to partially develop
the layerl and finally developer solution, alone, to
fully develop the layer. The developed photoresist
layer is ~hen rinsed with water, to sliminate residual
developer solution, and finally rotated at the rela~
tively high velocity of preferably 750 to 1000 r.p.m.,
to dry the developed layer. The photoresist layer is
preferably derived from Shipley AZ 1350 photoresist,
and the developer solution is preferably either
potassium hydroxide or sodium hydroxide, with a
normality of about .230 to .240. In another more
detailed aspect of the invention, the step of dispensing
both water and developer solution has a time duration
of ~bout 5 to 10 seconds, the step of dispensing
developer solution, alone, has a time duration of about
20 seconds, and the step of rinsing has a time duration
of ~bout 30 to 60 seconds.
Still another aspect of the invention resides in a
technique for producing a stamper from the developed
recording master, for use in molding video disc replicas.
In this aspect of the invention, a fixst thin~ uniform
metallic film is vapor-deposited onto the d~veloped
recording layer, after which a second thin, uniform,
metallic film is electroplated onto the first film, the
two films together forming an integral metallic layer.
The integral metallic layer is then separated from the
underlying master recording, and residual photoresist
material is removed from the undersurface of the sepa-
rated metallic layer using a suitable solvent, therebyforming the stamper. The first metallic film preferably
has a thickness of about 500 to 600 A, and the second
metallic film preferably has a t~ickness of about 15
mils. Both films are preferably formed of nickel.
Many other aspects and advantages of the invention
will become appaxent from the following detailed
description, taken in conjunction wi~h the accompanying
drawings, which disclose, by way o~ example, the
5 - principles of the invention. The accompanying
drawings illustrate the invention. In such drawings:
FIG. 1 is a simplified schematic diagram of
apparatus for recording an f.m. information signal on a
recording master produced in accordance with the methods
of the present invention;
FIG. 2 is an enlarged plan view of a segment of
~he recording master of FIG. 1, showing a succession of
spaced exposed regions arranged in a plurality of
substantially circular and concentric recording tracks;
FIG. 3 is a graph showing the modulated intensity
of the writing beam in the recording apparatus of
FIG. l;
FIG. 4 is a sectional, elevational view of a
portion of the recording master, taken along a recording
track, and showing the photoresist recording layer to
: be expo~ed whenever the intensit,y of the writing beam
of FIG. 3 exceeds a predetermined threshold~
FIG. 5 is a sectional, elevational view of the
recording master of FIG. 4, after development to remove
the spaced, exposed regions; and
FIG. 6 is a perspective view of a turntable
apparatus used in forming the photoresist recording
layer on the recording master of FIG. 1.
1 :lfir)6,1.~
- Referring now to the drawings, and particularly to
FIG. 1, there is shown apparatus for recording a
frequency-modulated (f.m.) information signal on a
recording master 11. The master includes a glass
substrate 13, with a smooth, planar upper surface on
which is deposited a photoresist layer 15 having a
prescribed, uniform thickness. The photore~ist layer
is exposed whenever impinged by a beam of light having
an intensity that exceeds a predetermined recording
threshold.
The recording apparatus includes a writing laser
17 such as an ar~on ion laser for producing a writing
beam of light 19 having a prescribed intensity, and an
intensity modulator 21 for modulating the intensity of
the writing beam in accordance with an f.m. information
signal received on line 23. The recording apparatus
further includes a spindle motor 25 for rotating the
recording master 11 at a prescribed angular velocity,
and an objective lens 27 for focusing the intensity-
modulated beam onto the photoresist layex 15 of therotating master. The objective lens in mounted on a
carriage (not shown) that i~ radially movable with
respect to the master, so that the focused beam trac0s
a spiral pattern on the photoresist layer.
As shown in FIGS. 2, 3 and 4, the intensity of the
intensity-modulated beam 19 is alternately greater ~han
and less than the predetermined recording ~hreshold o
the photoresist layer 15/ whereby a succession of
spaced exposed regions 29~ arranged in a plurality of
substan~ially circular and concentric recording tracks
31, is formed in the layer. Each exposed region and
adjacent space correspond to one cycle of the f.m.
9 I t~ . 3
: signal. FIG. 5 depicts the recording master 11 a~ter
deYelopment to remoYe the exposed xegions, the master
then being in suitable condition for use in producing a
stamper.
The recording master 11 is initially prepared for
use with the recording apparatus of FIG. 1 using a
special process in which the upper surface of the glass
substrate 13 is first ground and polished, and then
'3 cleaned. The photoresist layer 15 is then formed by
dispensing a photoresist solution onto the surface,
after which it is dried and baked in a prescribed
- fashion. After baking, the recording master is in
suitable condition for recording. In another aspect of
the invention, a thin metal layer is formed on the
substrate prior to forming the photosensitive layer.
More particularly, the planar surface o the glass
substrate 13 is initially prepared by first grinding it
in a conventional manner, using an aluminum oxide
compound having about a nine~micron grit. The surace
is then polished using a zirconium oxide or cerium
oxide polishing compound of sub-micron particle size.
Cerium oxide has been found to polish the surfac~ more
quickly, but is generally more difficult to clean~
The polished sur~ace of the glass substrate 13 is
cleaned in a special three-step pro~ess. First, the
surface is flushed with high-purity, de-ionized water
and brushed with a fine brush to remove most of the
polishing compound. The de-ionized water preferably
has a resistivity of 18 mega-ohms centimeter. The
cleaned surface of the glass substrate 13 is thereafter
inspected by examining it with the naked eye under a
high-intensity light. Under this lightr defects such
as scratches and microscopic pits appear as point
~ lBS~;13
souxces of scattered light. When a defect is detected,
a micxoscope is used tv m~asure its size. If any
defects larger than 25 microns are detected, or if the
number of defects under 10 microns exceed one per
square millimeter, the substrate is rejected and the
polishing and cleaning sequences are repeated. The
surface is then wiped wi~h acetone to remove any traces
of dust and oil introduced during handling.
Second, the surface i5 flushed with a detergent
solution, and third, the surface is again flushed with
de-ionized water for a period of about ten to twenty
minutesO
After cleaning, the substrate 13 is placed on a
turntable, as shown in FI5. 6, and rotated at an angular
velocity of about 750-1000 r.p.m., to dry the surface.
FIG. 6 depicts apparatus for use in forming the photo-
resist layer 15 on the ~leaned substrate 13. The
apparatus includes a variable speed motor 33 ~or
rotating the substrate in a prescribed fashion, and a
pivot arm 35 on which are mounted three dispensing
tubes 37, 39, and 41 for dispensing de-ionized water, a
stannous chloxide solution, and a photoresist solution,
respectively, in a prescribed sequence.
The substrate 13 is ~irst rotated at an angular
velocity of about 75 ko 100 r.p.m., while stannous
chloride is dispensed onto the cleaned upper surface
through the dispensing tube 39. The pivot arm 35 is
pivoted manually so that stannous chloride is applied
to the entire surface. It is believed that the stannous
chloride molecules adhere to the cleaned surface of the
substrate, and thereby promote a ~ubsequent adhesion of
the photoresist solution.
Water is then dispensed onto khe surface through
the dispensing tube 37, to rinse of residual stannous
chloride solution, and the angular velocity o~ the
motor 33 is then increased to about 750-1000 r.p.m., to
5-- dry the rinsed surface. The surface is now in proper
condition for dispensing of the pAotoresist solution.
The photoresist solution is prepared by diluting
Shipley AZ 1350 photoresist with Shipley AZ thinner,
which is believed to include cellosolve acetate, in a
ratio of about 3 to 1. This provides a solution having
a viscosity of about 1.3 centipoise, which is then
filtered to remove particles larger than about one half
micron. Viscosity can be measured by standard
techniques, such as, for example, using a Canon-Finske
viscometer.
The diluted photoresist solution is then dispensed
through the tube 41 onto the prepared surface of the
substrate 13, as the substrate is being rotated by the
variable speed motor 33 at an angular velocity of ahout
75-100 r.p~m. Again, the pivot arm 35 is pivoted
manually so that the solutisn is dispensed across the
entire radius of the substrate. At the ~peeds below
about 75 r.p.m., a fi].m of substantially uniform
thickness can be achieved only if a relati~ely length~
spread time is allowed but thlæ increases the likelihood
of contamination of the layer. At speeds above about
100 r.p.m., on the other hand, radial streaks and flow
marks can result, affecting the quality of the
subsequent recording of information. About 35 ml of
photoresist solution are required to ully coat a
substrate having a diameter of about 35.56 cm.
1 ~ ; 1 3
11
After the photoresist solution has been coated
onto the sur~ace of the substrate 13, the angular
velocity of the motor 33 is increased to about 750-1000
r.p.m., until dry. This provides a prescribed, uniform
thickness for the photoresist la~er 15~
Recognizing the fact that the thickness of $he
photoresist layer 15 is inversely proportional to both
r.p.m. and temperature, the specific angular velocity
at which the substrate is rotated to partially dry the
- lO photoresist solution can be conveniently adjusted to
provide the prescribed thickness. The appropriate
angular velocity can be determined in a conventional
manner using, for example, a Tolansky interferometer.
This technique provides an indication of the relative
thickness of the layer and, using an iterative process,
in which the angular velocity is successively adjusted,
the optimum velocity can be determined. If the
viscosity and temperature of the photoresist solution
can be maintained substantially uniform, this angular
velocity calibration need be performed only infre-
- quently. It is presently preferred that the layer have
a thickness of about Il50 A to 1350 A, and replica
discs sub~equently produced will have information-
- bearing b~mps or pits of corresponding height.
If it is determined khat the dried photoresist
layer 15 is de~ective in any way (elg., containing
radial ~treaks or foreign particles), the layer can be
removed using a suitable solvent such as Shipley AZ
thinner. A new layer can then be applied in the manner
described above.
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12
After removal from the turntable apparatus of
FIG. 6, the recordin~ master 11 is baked, to fully dry
the photoresist layer 15 and thereby maximize its
exposure tolerance. The master is preferably baked at
5' about 80 centigrade for about 20 minutes, These
parameters must be maintained to a tight tolerance, to
minimize variations in exposure tolerances when succes-
sively recording information on a number of recording
masters O
Since the exposure sensitivities of each of a
number of recording masters is likely to be slightly
diffexent from the others, it is desirable to optimize
the peak intensity for the intensity modulated beam of
light 19 (FIG. 1~ for each master, so that the f.m.
information signal can be recorded with an optimum
50/50 duty cycle. In accordance with another aspect of
the invention, a prescribed test signal is recorded on
each master 11 in a plurality of sets of adjacent
recording tracks r each set recorded with a different
peak intensity. After the test signal tracks have been
developed, using a developing technique described in
detail be}ow, the recording master i5 exami~ed to
determine the particular set of txacks havi~y a duty
cycle closest to the desired 50/50 value~ The optimum
peak intensity thereby can 'be determined and the f.m.
information signal thereafter can be recorded with the
optimum duty cycle on the remaining, unexposed portions
of the recording mastex.
The test signal preferably has a constant frequency
of about 7 to 8 MHz, and the signal is preferably
recorded on three.or four sets of tracks each set
recorded with a peak beam intensity ~hat v~ries by
about five percent. Each set is recorded for about 10
seconds, corresponding to several hundred recording
~ 3~5~t3
tracks. Also the sets are pxe~erably separated ~rom
each other by narrow bands o~ unexposed portions of the
photoresist layer 15, and are located in a narrow
region-adjacent the inner periphery of the layer.
~ The successive sets of developed recordiny tracks
can be conveniently examined using a reading beam of
light (not shown~ for scanning each set to produce a
reflected beam having an intensity that is modulated i~
accordance with the recorded test signal. The reflected
beam is modulated in intensity because the reflectance
of unaltered portions of photoresist layer 15 is about
4 percent, whereas the reflectance of altered portions
of the layer is essentially zero~ The modulated beam
is suitably detected an~ monitored in a conventional
spectrum analyzer, to determine the presence of second
harmonic distortion. This distortion is a minimum when
the test signal is recorded with the optimum 50/50 duty
cycle.
It is not necessary that the reading beam follow
any individual recording track in each set of tracks,
since the same test signal is recoxded on adjacent
tracks. Care must be taken, however, to ensure that
eccentricities in the recording master 11 do not cause
the reading beam to scan more than a single set o~
tracks at a time. The reading beam is preferabl~
produced by a helium-neon laser so that its wavelenyth
will not expose the photoreslst layer 15.
Using the recording apparatus of FIG. 1, with the
peak intensity of the writing be~m lg adjusted tv the
prescribed, optimum value, the f.m. information signal
is then recorded on the remaining, unexposed portion of
the photoresist recording layer 150 The recorded
master 11 is then developed to convert each recording
6 ~ 3
~.~
track into a succession of spaced pits of uniorm depth
and width and of continuously-variable ler!gth.
In yet another novel aspect of the inve~tion, the
- exposed recording master 11 is developed in a special
process in which a succession of fluids are dispensed
onto the master as it is being rotated ~y a turntable
of the type depicted in FIG. 6, at a velocity of about
75 to lO0 r.p.m. In the process, wa~er is first
dispensed to pre wet the layer, then both water and a
developer solution of prescribed normality are dispensed,
to partially develop the layer, and finally developer
solution, alone is dispensed, to fully develop the
layer~ The developed photoresist layer is then rinsed
with water, to remove r~sidual developer solution,
after which the angular velocity of the rotating master
is increased to about 750-1000 r.p.m., to dry the
developed layer.
The preferred developer solution is selected from
a group including potassium hydroxide and sodium
hydroxide, and has a normality of about 0.230 to 0.240.
Preferably, the step of dispensing both water and
developer solution has a duration of about 5 to lO
seconds, the step of dispensing developer solution,
alone, about 20 seconds, and the step of rinsing about
30 to 60 seconds.
A stamper, suitable for use in molding video disc
replicas, is produced from the developed recording
master ll. In another aspect of the invention, the
stamper is produced by first vapor depositing a uniform
metallic film of about 500-6G0 A thickness onto the
photoresis~ recording layer 15, and then el~ctroplating
a second uniform metallic film of about 15 mils thick-
ness onto the first film. The undersurface of the
first film conforms exactly to the pattern of spaced
~ ~6~61;~
pits formed in the photoresist layer, and the two films
together form an integral mekallic layer. This integral
metallic layer can be separated from the underlying
xecord1ng master and residual pho-toresist material
5 - removed using a suitable photoresist thinner, thereby
forming the stamper. In one embodiment, both
metallic films are formed of nickel.
It will thus be appreciated from the foregoing
description that the present invention provides a
number of no~el techniques for use in efficiently
producing recording masters. The masters include
photoresist recording layers in which f.m. information
signals can be recorded with high signal-to-noise
ratios and high density. In other aspects of the
invention, metallic stampers are produced from these
recording masters, for use in molding replicas of the
master.
Although the invention has been described in detail,
it will be understood by one of ordinary skill in the
art that various modifications can be made without
departing from the spirit and scope of the invention.
Accordingly, it is not intended that the invention be
limited, except as by the appended claim~.
