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(12) Patent Application: | (11) CA 2004130 |
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(54) English Title: | HIGH PERFORMANCE EPOXY BASED LAMINATING ADHESIVE |
(54) French Title: | COLLE EPOXYDIQUE A HAUT RENDEMENT, POUR LAMELLATION |
Status: | Deemed Abandoned and Beyond the Period of Reinstatement - Pending Response to Notice of Disregarded Communication |
(51) International Patent Classification (IPC): |
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(72) Inventors : |
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(73) Owners : |
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(71) Applicants : |
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(74) Agent: | GOWLING WLG (CANADA) LLP |
(74) Associate agent: | |
(45) Issued: | |
(22) Filed Date: | 1989-11-29 |
(41) Open to Public Inspection: | 1991-05-29 |
Examination requested: | 1996-11-27 |
Availability of licence: | N/A |
Dedicated to the Public: | N/A |
(25) Language of filing: | English |
Patent Cooperation Treaty (PCT): | No |
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(30) Application Priority Data: | None |
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PATENT
ABSTRACT
A high performance laminating adhesive material is
prepared using one or more epoxy components which inter-
react with a high molecular weight polyester component
through a two-stage reaction sequence. The first stage of
the sequence is the reaction of a isocyanate component with
a polyester component. The stage of the sequence is the
reaction of the isocyanate/polyester component with the
epoxy component(s). The result of the reaction process is
an adhesive material providing a flexible, high temperature
resistant, fully crosslinked adhesive with good Z-axis sta-
bility without the evolution of by-products. The adhesive
material has application to the bonding of polyimide films,
copper or other metal foils and hardboards for use in the
manufacture of flexible, hardboard or multilayer substrates
as well as surface to surface bonding of other materials.
Note: Claims are shown in the official language in which they were submitted.
Note: Descriptions are shown in the official language in which they were submitted.
Sorry, the representative drawing for patent document number 2004130 was not found.
2024-08-01:As part of the Next Generation Patents (NGP) transition, the Canadian Patents Database (CPD) now contains a more detailed Event History, which replicates the Event Log of our new back-office solution.
Please note that "Inactive:" events refers to events no longer in use in our new back-office solution.
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Description | Date |
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Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: IPC from MCD | 2006-03-11 |
Inactive: Dead - No reply to s.30(2) Rules requisition | 2002-02-01 |
Application Not Reinstated by Deadline | 2002-02-01 |
Deemed Abandoned - Failure to Respond to Maintenance Fee Notice | 2001-11-29 |
Inactive: Application prosecuted on TS as of Log entry date | 2001-02-14 |
Inactive: Status info is complete as of Log entry date | 2001-02-06 |
Inactive: Abandoned - No reply to s.30(2) Rules requisition | 2001-02-01 |
Inactive: S.30(2) Rules - Examiner requisition | 2000-08-01 |
All Requirements for Examination Determined Compliant | 1996-11-27 |
Request for Examination Requirements Determined Compliant | 1996-11-27 |
Application Published (Open to Public Inspection) | 1991-05-29 |
Abandonment Date | Reason | Reinstatement Date |
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2001-11-29 |
The last payment was received on 2000-11-02
Note : If the full payment has not been received on or before the date indicated, a further fee may be required which may be one of the following
Please refer to the CIPO Patent Fees web page to see all current fee amounts.
Fee Type | Anniversary Year | Due Date | Paid Date |
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MF (application, 8th anniv.) - standard | 08 | 1997-12-01 | 1997-11-12 |
MF (application, 9th anniv.) - standard | 09 | 1998-11-30 | 1998-10-29 |
MF (application, 10th anniv.) - standard | 10 | 1999-11-29 | 1999-11-29 |
MF (application, 11th anniv.) - standard | 11 | 2000-11-29 | 2000-11-02 |
Note: Records showing the ownership history in alphabetical order.
Current Owners on Record |
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COURTAULDS PERFORMANCE FILMS, INC. |
Past Owners on Record |
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DIANE G. NOVAK |
THOMAS F. GARDESKI |