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Patent 2054433 Summary

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(12) Patent Application: (11) CA 2054433
(54) English Title: ELECTROVISCOUS FLUID
(54) French Title: FLUIDE ELECTROVISQUEUX
Status: Deemed Abandoned and Beyond the Period of Reinstatement - Pending Response to Notice of Disregarded Communication
Bibliographic Data
(51) International Patent Classification (IPC):
  • C10M 113/12 (2006.01)
  • C10M 171/00 (2006.01)
(72) Inventors :
  • NAKAMURA, TAKASHI (Japan)
(73) Owners :
  • DOW CORNING TORAY SILICONE COMPANY, LTD.
(71) Applicants :
(74) Agent: GOWLING WLG (CANADA) LLP
(74) Associate agent:
(45) Issued:
(22) Filed Date: 1991-10-29
(41) Open to Public Inspection: 1992-04-30
Examination requested: 1997-11-25
Availability of licence: N/A
Dedicated to the Public: N/A
(25) Language of filing: English

Patent Cooperation Treaty (PCT): No

(30) Application Priority Data:
Application No. Country/Territory Date
291010/90 (Japan) 1990-10-29

Abstracts

English Abstract


ELECTROVISCOUS FLUID
ABSTRACT
The present invention relates to an
electroviscous fluid which comprises a dispersion of 0.1
to SO weight% of wet- method silica particles whose
surface adsorbed water has been replaced by an organic
compound having in its molecule at least one group
selected from the group consisting of a nitrile group,
hydroxyl group, and acid group, in an electrically
insulating fluid. The wet-method silica particles haave
an average particle diameter of 10 to 500 micrometers
and a pH that does not exceed 6.5. This electroviscous
fluid provides a substantial increase in yield value at
low voltages and an excellent shear stability.


Claims

Note: Claims are shown in the official language in which they were submitted.


CLAIMS:
1. In an electroviscous fluid comprising
a dispersion of silica particles in an electrically
insulating fluid, the improvement comprising using 0.1
to 50 weight% wet0method silica particles whose surface
adsorbed water has been replaced by an organic compound
having in its molecule at least one group selected from
the group consisting of a nitrile group, hydroxyl group,
and acid group, wherein the wet-method silica particles
have an average particle size of 10 to 500 micrometers
and a pH of not greater than 6.5.

Description

Note: Descriptions are shown in the official language in which they were submitted.


S~T BY~ PATE,~T DE~. ;10~ g1 ;1~:glA.~; ~C PAT~T ~EPT.~O~LIN~iSTRATHY~HEN~ 17
' '
2054~33
~L~KCTlR.~:SCO~JS li~UIl~
The p~e~ent in~entlon ~elates to an
el~ctr~riscoug ~luid wh~ch ~ a f1uid wh~se vi~co~ity can
be ch~n~ed by the lmpre~ion o~ npplica~.iorl of as~
exte~nal ~oltage.
VariouY type~ of theDe ~luids ha~e already been
proposed1 and they a~e typlfied b~, f~r exa~ple,
dispe~io~ o~ porous ino~ anic par~icle~ (e~ ~., silica,
aluolina, talc,~ in ~n e~ectrically in~ulatil~ fluid. In
ea~h ca~f~, throu~h the for~a~ion o~ an el~ctrica1 double
lay~r by ~ean~ oE wate~ adsorl~et on the paI~ticle
~ur~ace~, the par~icle~ b~co~Q ori~nted in ~e~ponse t~ ah
~xt~rnal ele~t~ic field and the visc~ity increa~e~ ~moxe
speci~i~ally, th~s fluid i~ conv~rted int~ a l~ingham
~luid, ~hich exhibit~ a yiald ~alue). This ef~:~ect i~
called the "Winslow ~3fP~". The ~ol~owing dis~tlv~ntages
ha~e been a~so&l~ted with ~ a- b~3~ ctrovi~cou~
~luids; the~ h~ limited applicatlon temperalturo~
~approxim~tely lO~C to aooc~, they abrad~ the sur~aunding
machine~y~ and ~he particles ~edimont~ ~till, sinc.e
~ilic~ i~ ea8ily o~ai~ed o~ an indu~trial basis and i8
higl~ly a~en~ble to imp~ov~m~nt and msnipu1ation, ik has
~een consid~red potet~ti~lly use~ul for cortain sector~ o
applica~cion, for ~ample~ machln~ry which would be u~ed
in the vicinit~r o~ ~oom t~mpe~a~ure and ~h~h wau:Ld
und~rgo llttle abr~;Ln~ motlon. ~ilics-b~sPd
electrt~vi~ce~u~ ~luids ar~ dlsclo~ed in Vnited States
Pat~nt N~ber 3,~47,507 anc1 in J~pane~e 2atent
Appli~ation I aid Oper~ [R~k~i or ll~ex~minç~ N~ber
6l-44998 [44,q9~ ], ~1t in e~ach C~80 ~he~ e~hll~i'c an
imp~acticall~ weak Win~lo~ ef~ect. Alæo, Jap~ne~e l~aten~
Application Laid Cpen Nu~ber 01-284~95 ~2~4~595~8
disc1~e~ an electro~ co-Y~ fluid in the fu~7~ of a

SENT BY:~CC P.4TENT DEP1. ;10-28-91 :10:41~ C PATE~T l)~T.~GOWLIN~STRAT11Y&HE~E;;~ 3~7
20~4~33
di8p~r~ion in an electrically insulating fluid of
wet-method silica who~e ~urface ~dsor~ed Wi~te~ has bean
epls.c~-:l by pol~alel~t ~lcohol. Ba~et nn the form~tian
o~ an electri~ o~ble l~yer b~r the polyY~lent alcoh~l,
thi~ el~c1:ro~isco~l~ fluid exhibits an electrovi~cous
~havlor ~oI~e or less eqll~l to that of the dispersion of
~h~ un~odifled ~ilica, bu~ al~o r~tains it~
c~a~ac~eri~tic~ at hi~h~r t~mper~tures (9OC). Howevos,
~eh ir~ thi~ ca~Q, the i~t2n3ity of the Winslnw effect i8
~till m~rely ~ore or l~s~ ~qual to that o:e the prio~
w~t-method ~ilica-~a~cd ~stsms. Mo~reover, b~cau~e the
d~alectric con~nt of the polyvalenl~ alcohol decline3
with inc~eastn~ temperature, tha Win~low ~fect 8till
decline~ at ~lghex temp~rat~res.
As a cons~squ~nce ~ al 1 o~ the~e hereto~ore
propo~ed ~leCtr~vi8cou8 Iluid,Q r~n~ain un~atie~actory rc~
a prao~ical sta~dpai~t.
The pre~erlt inventlon i~troduces a silica
diap~r~ion- type el~ctrovi~cous fl~id ~hich devel~ps a
l~inslDw ef~ect ~ufficient to sati~fy indu~trial
~pplioatiorl~. The pre~en'c invento2^ car~ied o~t exten~ive
inve~ atio~ ~ith a view to solvin~ tt~ aforementi~ned
proble~, and di~cove~ed a~ a re~ult ~hat t~e
aforemen~ion~d probl~ms are ~u~s~ntially reduced by the
u~e a~ the ~i~per~e pha~e of ~ilica p~epared by replacing
the water a~sorbed ~n th~ surface of we~-method ~ilica
wit}~ ~ partic~l~r type o~ compour~d. The p~esent
invention wa~ developed based on this di~cove~y.
The ob~ect ~ th~ pr~3ent invl~ntion i~ the
introduction of ~n electrovi~cous ~luid w~ich d~elnp~ an
ezc~elle~t Win~low e~ect. The ob~ee::~ o~ the p~e~ent
inv~nI;ion ig al~o t~ utili2e a di~pcr~ion of O. l to 50
~eight percent silica particles which ~:ompri~e wet-meths~d
slïica p~rticles whose ~l~rfaee adso~b~ water ha~ b~el~

SENT BY:D~C PATENI DE~. .lO-~-gl ;10:41A~; ~C PA~ DEPl.~O~LI.~STRATHYOE~ 17
- 20~4433
3 o
repl~ced by ar~ or~anic eompoun~ ~hich contalns within its
molecule at lea~t one nit~ile ~roup~ hydra:~;Yl gr~up, or
acid ~roup, ~nd wherein the w~t-method ~ a p8rti~:1e5
hP.ve an ave~ge p~rtlcle d~m~ter o~ 10 ~o SOO
microm~ter~ arld ha~re a pH that doe~ llot exceed fi . 5, in an
electrically insulating fl~l~d. ~ ~urther obJect o~ the
pre~en~ ittventi~n i~ to p2~0vi~1e an electI~o~i~c~ou~ fluid
whlch pro~ide~ a sub~tantial increase in yield ~alue at
l~w vol~ge~ and ~ cellent ~he~ ~t~bili.~y.
The prQ~ent invention relates t~ e.n
electrn~ co~ fluid c~pri~ing ~ di~persl~n of silica
p~rticl~s in $n elect~ic:~lly insulating :~luid, the
imp~o~vement compri8ing u~ing 0.1 to 50 wei8;htX wet-me~hod
~ilica par~icles who~ ~ur~ac~ ad~rbed water 1~a~ been
replace~ by atl o~g~nic compo-md ha~inE~ ln it~ ~oleo~le At
l~a~t orle ~ ro~lp 6elected frtsn~ t~e gro~lp consi~qtlng o~ a
nitrile group, llyd~oxy} ~.rnup, or acidl g3:0up, wh~rein the
wet-method silica paxtlcle~ have an aver~ge p~r$icle ~ize
of 10 to 500 micromet~r~ and a pH of no~ gr~ater th~n
6.5. T~e p~ (hydrog;en lon ~centr~tlon) o~ the
wet-method ~i~ica particles are preer~1y n~e~8ured in a
t~ wei~ht percent a~ue~u~ su3pen~i~n, hDwever the method of
tihg~ the partic:les ~or pH is hot c:ritical to the pr~sent
invention .
T~ ~xpl~in the precedin~; in ~reAter detail, the
wet-~oethod silica particles employed by ~che pre~ant
inventior~ are prepared ~y the prclducti~n o~ silic~ by ~ch~
addition of Q~isl ~Ldex wet condition~ to wat~r ~la~
startiRg m~teri~l. The~e wet-method ~ilica particl~ ~re
an ldeal d:L~per~e phase or ~lectr~ cous fl~id~ bec~ e
their ~urfaces po~e~s a layer of ads~rbed water, which
is ideal ~or t~ develop~ent of tbe Winslow effect, an~
becau~e they ha~e opti~al partiol~ Their average
~rti~le ~i~e ~hould ~all within t~e range o~ lO to 500

SENT BY~ PATENI DEI~. ;iQ-2g-91 ;lD:4~AN: ~ PATP~T DE~.~0~LI.~ST~ ~;# ~/17
4 2~4~3~
snicrome~er~ ~nd pr~erably fQll~ within the ran~;e o~ 50
~o 200 micrQmeters. When th~ p~rti~le size i~ le~ than
10 r~lcrom~er~, the particles e:chibit a lsr~e
c-rientability, hut the in~erpa~rt~cl~ ~orce~ are small and
a 8Ati~actory ~risco~ity Will tlOt be a~hi~v~d. On the
other ha~nd, at pa:rticle ~ize~ in excess uf 5Q()
microme~ , the oria~ntability 1~ dir~ini~hed ~nd the
thick~tling ~ect is redllcecl. Mor~o~er, at su~h
di~nen~ions, the particle ~ize itsel k~giIas to po~e
si~nificant problems. The partiel~ shap~ ~hould be as
cloeo to truly apheric~l as po~si~le. Wh~n the p~rticl~Y
~ubstan~ially de~iate from ~pha~i~31, ~h~ effe~t ive
interpartiol~ conta~t ~rea declineæ ~nd the ~ohasive
orceg a~e ~hen weak. W~th re~ard to the particle size
distri~ution, the narrow~r the bet~ce~. The pa~ le
orien~abi~i~y becorn~ increasin~sly unl~s~rsn a~ t:he particle
si ~e di~trib~lti~n be~omes narrow~r, ~hich provides fo~ a
m~re efïi~l~n~ v~sso~ity rise. V~riou~ rne~hs~d~ c~n b~
devi~ed for the production of ~ilic~ particles which have
a n~rr~r particl~ si~e d~st~ibutiosl ~n~l are as clo~e t~
~pherical a~ po3~ible, b~t ~uch particl~s a~e obt~ined
~ainl~r by de~ ng a t~lli t:a~le drying proce~ . Fo~
ex.~snple ~ 8pray d~yin~ ~Qthods Elre ~d~al .
Xn addition to the propert~e~ di~cu~d abuve,
the q~antit~r of ion in the ~ilica iB al90 a c~uci~l
facto~ in determinln~ the ta~ge~ce~ Win~low ef~ec~. While
not li~ltine the present i~ ntion to an~r pa~ti~:ular
theory, it i8 ~e~ieved that the prlncipal inn pre~ent in
the ~iliCA i~: the sodill~ ion, and thiæ i~mainly th~
excess from the ~odium io~ u~ed in ~rder to neutrali~e
the ~olid acid p~esent ~ ~n impllrity in the water gl~l818
rting ~hate~riQl. Accordingly, th~. ~luidlty ~f the
~ilica i~ goYerned by t~as magnitllde o thi~ gu~ntity of
sodi~l~ ion. Accor~in~ ta ~xpe~imen~s by the i nventor,

SEh~ BY:D~ PATENT DEPT. ;IQ-28-91 ;10~ CC PAT~T Da~T -GOW~IN~STRAl~&HE~E;;~ ~17
~,
2~4433
the pre~enc~ of f~e~ ion in t~e silicQ brin~Y a~out a
retardatior~ in par~icle ~rIentation. A clear e~ample of
thi~ phenomenon i~ the insta~ility ir~ ~qhear stre~ at a
constan~ or va~riable ahear rat~ that is ob~erved when ~n
electric field is applied to an e~l~c~rovi~cous lCluid
pr~apa~d ~y the di~pe~ion o~ Inreu ion-con~ainlng
w~t-metho~ ~qilica. In the case o;~ free ioD-containing
p~rticle~ thi~ i~ tho~ght to be due to an incs~ase in
the ti~oe req1lired for orient~tion oî the randoml~
diqtributed p~r~icle~ due to the relatively long ~ime
as~oci~te:l with ion movem~nt. Th~ res-llt is th~
a.pp~a~an,oe of in~tabili~y u~der dyns~ic conditions. ~t
is ~or this rea~on l:h~t wet-method ~1 lica depleted o~
~ree ion ~e. ~., soditlm ion, ~c. ~ l~ optimal for the
development of ~ eful Winslow ~ffect. Pure ~et-~ethod
8ilic~ gellerally exhibit:3 fluidit~ in the acid regi~n,
therefore acid~c ~ilica i8 i~eal. The ~luldity inde:c
ac:cor~ing to the pre~ent i~ ntion i~; deined a~ ~ollow3:
th~ p}l of a 4 Wt2~ aqeOU9 8~115perl8iC-I~ of ~aid si~ica mUBt
no'c exc~ed ~. 5 ~nd ~nore p;re~erably dcles not e~ceed 5 .5
A usef~ll Win~low e~ec~c doe~ not alppear at ~ralue8 in
exce~ 6.5. In ord~r to ~tain wet-m~hod sllic~
whiLch h~ sueh a flllidity, the ~Xce8B ~odiun2 ion n~us~ be
remaved to ~he m~ximum po~ le. e~ctant, or,
alter1~atively, a pure! water ~la~s whlch contai~ only
træce~ o~ ~olid acid mu~t be ~tnployed ~ the ~tar~in~
mat~ri~l .
No Yp~iflc re~tri~t:ion~ a~e placed on the
wet-method ~ilsca ~m~loye~l b~r th~ prese~t invention :1~
long as it sati~ies tha p~p;~rt:i.e~ di~cu~ed abo~e. It
may be ~e~lected ~Cro~ ~n~oll8 ~ommerci~l w~t-wethwd sili~as,
for ~xample, ~ip~il A Q- 5 from ~ippon Si.lica Kogyo
R~bu~l~iki Kai~h~ and it.~ aqui~ralent~.

SENT 8Y:DC~ ~ATENT DEPI`. ,IQ-28-91 ;10:42A.~: ~C PATEKT DE~.~GO~LI~ST~hT~ 7~17
,
6 20~433
Acc~din~ to th pre~ent inventi~n, the water
ad~or~esi on ~he ~urface o~ ~his wet~method sllica i~ then
replaced by an org~nic compound which cont~ins ~ nit:rile
grc-up, hydroxyl group " or acid ~roup . 'Xh~, the su~ace
of wet-mathod ~llica i~ norma:lly ccvered with a layer of
~d~o~bed water. ~I-ile ~he particular welght proportion
~or thl~ adsorbed wat~r in ~he total oilica weight ~ill
vary with the particul~ typ~ o~ ~t-method ~ilic~, in
8;~nesal it wlll fall wi~h~n the ran8e of 5X to lOZ.
since this l~yer ~f adsorbed wate~ i~ merely hydro~en
botlded to a layer of structural w~t~r w~lch resides
~nediately inward, it aan be alo~oot co~pletely
eli~inated by h~atin~ to ~round 100~C. However, ~5
discu~ed a~o~e, thi~ adsorbecl ~ter lay~ pl~y~ a
si5~nificant role in the df~svelop~ent o~ thQ Winslow
ct. Tlle cau~e f~r thi~ is bolle~ed to ~eside ma;nly
in the Ihigh diele~ric ~on~ta~t of thet wate~
(approxi~a~ly 8~ at ~oom te~ ature~. However, it~
eas~ Df elimination by heatin~ extingui~he~ the Wlnslow
effect. In the pre~en~ in~enti~n, this adso~bed water
la~er on th~ sl1rf~ce o wet-method ~iliaa 1~ replaced
with an or~anic ~ompound which contaill~ a nitr~ le ~3roup,
hydrG~cyl ESroup, or acid group. lhe nitrile
grotlp~co~taini~ orga~ic ~ompo~nd a~ speci~ied her~in is
exe~plified by ~lip~atic nitrile~ h a6 a~etonitrile,
propionitrile, n-capronltrile, ~ccin~nitrile, etc., and
b~ aromatic nit~ile~ such as ben~nnitrile,
~lpha-t~luni~rile~ ancl 9~ forth. Th~ hyd~xyl
g~clup-c~ntaining co~npo~nd i~ ex~7~pli~iet ~ m~ncnral~3nt
alc;:~hol~ such ~Y meth~nol and e~hanol; by cli~alent
~lcohols such 8,~ et~rlene ~lycol, 1, 2-prop~nediol, and
1,4-bu~anediol; and by triv~ t ~Icoh~ls ~ch as
el~r~erol Th~ ~Gld group- cslnta~nir~g compound i8
e2templi~ied ~y Qlipha~i c acida ~uc~ ~ ac~3tic acid ant
.

SENT BY:D(~C PATENI DE~. ;10-'~8-9l ;lD:43A.~ P.4TE~`iT DEYr.~O~Ll,~ST~4THY&HE~IDE # ~/17
2~5~3
propionic acid .snd by ars~m~tic aclds such as benzoic acid
and phthalic acid. All of the~e are suitnble ~nd no
particul~r r~Yt~ic~ion~ apply to the~e cs~l~pounds. Variotl9
method~ ca~ be de~ ed :eor the repl~cement procedure, ~t
tho f~llowin~; method hEIs pro~ren to be 8imple an~
~trais!ht~orwa~d. Fi~st, the wet-method ~ilica parti~les
are plac~d under a nitrogen ~urrent at 150~C in order to
remoY~ the ~ur~ace adsorbed water. A~ter cooling to room
tenlpe~ature Inder the nitroge:n c~trrent, I:he. stlb~tituting
compo~nd i~ thQn addsd in a qua~nti~y co~re~pondin~ t~ the
weizht loss due t~ the de~orbed water wi'ch mlxgng to
ph~rsi~al homogenei~:~r in, for example, a mi~cer. Afte~
~uch 8, tre~tment, t~l~ sur~ac~ of 'che wet-method sillca
particle~ will be c~vered by ~ l~yer of the sub~ti~utin~
compound. ~ue t~ the high dielectric con~an~ of ~ame,
Wi~lo~ effect ca~ be de~eloped which i.~ a~ l~ast
equiv~len~ t~ th~t for the ads~rbsd W~te~.
The electro~isco~s $1uid ~ccordin~ to the
present invention co~p~i~e~ the di~persion of wet-method
8ilic~ particles a~ ~pec~fied hereinbefore in a~
electri~ally in~ulatin~ fluid. However. the ~l~ct~lc~lly
in~ulating ~l~id it~elf is not pa~ticularly rest~icted
lon~ as it i~ 8 liqul~ at room temp~r~t~lre And i~
elec~ri~ally in~ulating. Su~h electr~cally in~ulating
~luids ar~ ex~mplifi~d by ~ineral oil~, dibl~tyl seb~cate,
ch70rinate~ par~~n~, fluorine oils, ~nd silicone oil9.
Amah~ th~ precedin~, ~ilisone oil~ are prefer~ed for
their ~tron~ electric~1 in6ulation~ low
t~mp~rat~r~-dependon~ vis~o~ity vari~tion. and so fort~.
These ~ilicone 0115 are exemplified h~ the fl~id
diorganopolysilo~anes with the fo~lowin~ chemic~1
~truct~r~:

SENT BY:DCC PATENI ~EPl. ;10-2~-91 ;1O:d.3AL~ PATE~T DEFYr ~0~Lli~ST~ 9~7
2~4~33
,~
R--Si~--~5~0)n- S1--R
R R R.
wl~erein R in the prec~ding formula compri~e~ monoval~nt
hyds~carl~on groups as ex~mplified b~ alkyl g~uups such as
~oet~yl, e~yl, and prc~pyl, ~nd aryl ~roup~ ch as phenyl
and n~phthyl. 1~ i~ prees~x~ed within the p~e~ent
in~ntion tlhat methyl comp~ A~ least 302~ of the ~,X'Ot~p9
R. Moreo~rer, whi.le ~he degr~e of poly~erization n i8 not
partic~lla~ly ope~:ified~ it prefer~bly ~e$ not e~c~ed
1,000 in order to acllieve a practic$1 Y~Co3ity range.
Value~ not e~ceedling lO0 are even more pre.~e~d,
Sil~cone ~ w~ th thi~ at~:ture are ~vailabla in 'che
~orm of a lar~e numbes of comn~er~ial products, for
example, SN20Q frwD Tnray l~ow Carnin~ Silico:le Co~pany,
Limited.
Fu~he~re, ~o~æ the ~illcone ~il9,
fluoro~lk~l-cDnt~inin~ dior~anopolysiloxan~s are
par~icula~ly preferr~d because the~ e~hance the Winslow
~ffect ~nd inhi~it the particJ.e ~edime~tati~n cau~ed by
3pecific gravity di~fer0nces. T~e~e are ~oncretely
expressed ~y the ollowi~g ~t~ucturai orm~1a:
R ~2 R-
n - 9i~ (8iO)~ (Sl~)p- S~-
~
whereln ~ i8 de~lned a~ abo~e, R2 i a fluoroalkyl gro~pha~ing 10 or ~ewer carbons, ant m and p a~e intege~ with
v~lu~ not e~c~dlng 1,000.
The ~tructure of the afor~nt~ned C~10
fl~oroalkyl group is not particularly specifi~d, b~t the
3,3,3- trifluoropropyl gr~up i~ pref~rred from tha
s~andpoint of ~as~ of ~ynthe~ o~de~ to obtain a

SENT ~Y:D~ PAT~DE~. :10-28-91 :10:43~M ; ~C PAT~T D~T.~O~L1~S~A~E;~10t17
20~4~3
.qub~t~nti~l enhan~.ement of the Win~low ~ffect, it will be
preferable for e~ch ~ola~ule ~o c~nt~in ~t lea~t 30 moleZ
~luoroalkyl g~oup. Moreo~er 9 while ~he degree of
polymeriz~ti~n ~ i8 a~in not partic~larly ~pecified, it
p~efer~bly doe~ no~ ex~e~d l,OOO in o~do~ to achieve a
practic~l visco~ity ra~l~e. ~lue~ not ex~eeding lOO are
aven ~re ~re~erred. The m~chaniR~ by which the
fluoroalkyl g~oup enhanoes the Winslow efect i~ not
clear. It can b~ eonjeetu~e~, howaver, that a ~tron~
intra~Dlecular dipole i8 gen~rated by ~h~ si~ult~neo~s
~resenoe in the molecul~ of the el~c~ron~gati~e fluorine
Rtom and electropo~itive ~ilicon ato~ s~pa~ated b~ a
~uita~le distance. Polarization o~ the double layer i 9
the~ pro~oted by ~ontact ~etween thi~ dlpole ~nd the
electric~l double l&yer on ~he wet-~ethod silica.
~therwise, fluorin~- containin~ fluida tend to ~ave
larger ~pecific gra~i~le~ which rea~lts i~ a~
acco~panying inhibition o~ c~ sediment~ti~n.
The~e ~lu~roal~yl-cont~ining
dior~nopoly~;lo~nes are ~omm~rcially avait~ble, for
example, as ~S~265 ~ro~ To~ay Dow Cornin~ Silicone
~ompany, Limit~d .
1~ electr~ovisc~ lutd ~ccording t~ the
pres¢n~ invention compr~9es the di~per3ion o~ we~-method
~ilica particle~ a~ te~cri~ed h~reinbe~ore in an
electrically in~latlng luid as desc~ibed ~rein~efore.
The quanti~y di~p~rsed ~hould f~ll within the r~nge o~
0.1 to 50 w~% ~nd prefer~ly is ~n the range o~ lO to 40
wtZ. A satisfactory thickenin~ ef~ct iB n~t obtai~ed at
les~ than O.l wt%. ~t ~ e~ e~ceeding sn wt%~ the
vi~c08ity of t~e ~ystem is ~o ~u~stantially inc~ea~ed
to be impractica~.

SENT BY:DC~ ~ATENT DE~ 28-91 :10:~3.4.`il; ~CC PhTEhlT DEI~.~O~ CT~ATHY~E~ /17
20~433
The ~lectrovi~cou~ flui~ accordin8 to the
pre~ent imention a~ d~cribed ab~ve i~ u~e~ul as the
w~rk~ oil or lun~tional oil in p~rtictl].~r types o~
wnchinery, ~r e~campl~, machinar~ wh~ch will b~ emplo~ed
in th~ ~icinity o~ roo~ t~mper~ture and wh~3r~ there will
be little ~brading motion.
Tho present inyention wlll be e~cplained in
~r~ater detail below ~hrou~h the u~e of illustratlYe and
compar ' ~on example~ . In the e~ample~, CQ = centistol~e~
and the vi~cositY is tlhQ value ~t 25~c.
~ e sl~ctrovi~c2ua beha~io~ w~ mea~ured a~
follo~s . lrhe ~e~t f lui~ s~as placed in ~n allllQ;nu~ ~up
(in~erior diameter = 42 mnl) ~nto which an aluminum roto~
~di~eter - 40 nn, len~th = CO ~) was subæequentl~
inserted. Th0 resul~ing cylir~drical cell w~s set up
~v~rtically, and the cup wa~ liLn~sarly ac!cel~ted ~rom a
~h~sr rate (D) o~ zero to 330 8 1 ~ r 40 ~conds.
During thls pe~ivd, th~ torque appli~d to the ~otor wa~
m2~ured w~th ~ tor<~ue ~snscr, and this was conve~ted
into the shear ~tr~ (s~ an~ the l)-ver~u~-S curve waa
drawn vn an x-Y r~c~rd~r. In addltion, the roto~ wa~
electricall~r groul~ded and D-vexsus - S ctlrYes wer~ o
r~c~rded while applying a direct-cur~ent volta~e to the
c~p. The inter~ec~i~sn oP the e:~trapolatlon Qf tl~e lin~ar
~eg~ent ~i~h the 5~a~cis ~a~ deaign~t~d as ~he yield value
at the partic~lar fielt ~trengt2-. ~he ther~nal and ~hear
stre~ a~ ty and the ~@di~ntabilit~ ~f the
wet-method silica p~rti~les w~3re A~ examlned.
The e~ectroviscosity te~t wa~ al~o a~t up ~n
~u~h ~ ~nner that the cell te~perQture could be ~7ari~d~

SENT BY:DCC PATEI~lT DEFT. il~-23-~1 ;lO:~ PATENT DEPT.~OWLINGST~AlHY~ E;i~12~17
20~4~
Exatn~ .lç 1
Wet-method E~ilica tNipsil AQ-S fr~ln NiPpon
~ilica Ko~yo Kabu~hiki l~a~ ) ~ith an aver~;e particle
size of 100 r~icrometer~ ar~d pH - 5 . ~ to h, 5 (4 wt%
a~ ou~ ~U~p~n9ion) W~ dried ~or Z hc~urs under a
nitrogen ctl~xent at lSO~C. I~ryin~ ~au~ed this w~t-metho~
~ilica to 8u~fer a weigl-t lo~s oE approximately 9 wt%.
A~Eter the ~ri~d wet-mat~od silica had been ~oole~ t~ oom
temp~rature tmder a ni~roESen current, acetoni~c~ile was
added in a quantity equal ~ t~2 we~ht loss. Sti~ring
i~ a ~xer ~or abo~t 1 h~ur afford~d an
~cetonitrile-tr~ated w~-~ethod 8ilica, lS Wei~ht part~
o~ this acetonit~lle-trea~d ~ilica was ~u~pended and
di~persed lt~t~ 8!5 weight part~ trime~hyl~iloxy-~erminated
polydir~e~chyl~ ne (~i~co~ity = 100 cs). The
electl~ov~ ou~ ~aeha~ior of thi~ 6~spension was then
mea~u~ed a~ ell temperature ~ 25C, and th~
m~a~ureloent re~ults are reported in Table 1 belo~.
Exa~Rle 2
The el~ct~oYi~cou~ beh~ior of a ~u~pen~ion
prepared a~ in ~s~ample 1 wa~ meastlred at ~ c~ll
te~nperatura ~f gOc~ 8,n3 thef~e me~ a3n~nt re~ult~ ar~
reported in ~able 1 belo~.
l~xample 3
Elect3~0viscous fluid in the form o~ the
~t~pen~ion prep~l~ed in l~ mple 1 w~ heated ~or 1 ~eek at
90~C in a~n op~2~ r3y~ rn under air, then I~e~oved ~d
oool~d. ~ter thi~ heat trç~atmerllt, the ~le~t~oYi~cou~
behavior of~ th~ re~u:~tin~ ~uspen~ion wa~ ~e~su~ed~ ~nd
the~e re~llts a~e r~aporte~l in T~ble 1.
.

~t~'l BY:DCC PATEi\lT ~EPT. ;1~-28-~l ;10:4~ PATEI~'T DFPT.~&O~LI,~JSTR~THY&HE~IDE;~13~17
20~44~3
12
amP~e. 4
An electroviscou~ fluid in the. form o ~
su~pen~ion was pI~epa~ed a~ ~n ~xample 1~ but in this case
usin~ 1, 2- prop~n~diol .in plac~ o~ the acetonitr~ le u8ed
~n Ex8~ple 1. The ele~tro~ ous behavior o~ thi~ ~lui~
was mea~ur~d as in Exampla~ 1, and these re~ult~ are
reported ln T~bl~ 1 below.
E~mp~l,e 5
An elec:~r~vi~cous flui~ in th~ fcsrm o ~
8u8pension wa~ pr~pared ~g in Example 1~ but in thi~ ~se
uYin~ acetic a~id in place o~ the a~etonitrile u~ed in
Exa~pl~ 1. The ~lectrovisc:ou~ beha~a,ior oi~ thi9 fluid wa~
meaaus~ed a3 in Example 1, and thesg re~ults are rep~ted
in Tnble 1 below.
E~c~ple 6
A~ elæ!ctrovis~oua Plulcl wa8 prep~red a~ in
~xa~nple 1, but in ~his case ~u~pending ~d di~perslng 15
wtX o~ the ~ a in a 3l3,3-trli~ oropropyl~ethyl-
polysiloxane withL a vific~ity o~ 30C cs ~$126S-300GS
fro~ Toray Dow Corning Sili~one Company~ Limited~ in
pla~ o~ the p~lydime~hy~siloxan~ with vi~9c08i~:y - 100 C!S
us~d in Exa~ple 1. The electrovis~o~ beha~lvr of thi~
~IYpen~1oD ~as m~asured at a cell telnpe~tur~ ~f 25DG,
asld these refiults ~re reposted in Table 1 below.
Co~ i~son E~c~mple 1
~ n el~ctrovi~cous $1~id in the f~rm of a
suspen~ion w~ prepared a~ in Exa~ple 1, but in thi~ case
ua~ng th~ W~- me~hod ~ilica prior to it~ acetonitril@
~re~t~e~t in pl~ce o~ the ~cetonit~le-treated wet-~ethod
~ilica empluyed in E~mple 1~ The el~rovis~ou~
behavio~ of ~hi~ w~ measured ~ in Exampl~ 1~ and
th~ a~1rement re3~1t~ are r~ported in Table 1 ~low.

SE~T BY:DCC PATE,~ DE~T. ;10-2~-g1 ,1û:4~AM ~ PATE~T DEF~.~GO~LI.~ST~ 17
13 2~4~3
Ço~ari~on Exam~1~ 2
The electro~l~cou~ bel~avior ~f the
electrovi~cou~ fluid o~ Comparison EJ~an~ple ~ was luea~ured
at a c~ll teulperature ~f 9d~C, and the~e mea~ur~uent
results ~rc repo~ted in Table l b~low.
Co~ or~ _:ca~Ple 3
Elect~ovis~ou~ fltlid as p~Rared in Comp~riaon
~xaolple 1 wa~ heated for 1 week at ~O~C: in an open ~ystem
under air, thPn ~emov~d and cooled. ~he Ql-a~tro~scous
b~3haYior of tlle electrovi~c~u~ ~lui~ obtained fr~m this
he~t t~eatment w~ mea~ d ~t ~ cell telQper~tllre o~
25~C, and the~e re8ult~ ~re reported in Table I.
Comp~ri~on E:xample 4
An electrovisc:ou~ 1uid in the fo3~ o:e a
su~pension wa~ prep~red a3 in E~aT~ple l, bllt in this ca~o
u~ wet-methl)d ~illc~ particle~ wit~ an aVerage
p~r'cicle si:~;e of 4 mi~rom~t~r~ and p~ .5 to 6.5 (4 wt%
aq~teou~ su~pen~ion~ ln plnce o t~e ~et-me'chod ~ Q
part~cle~ with an uYerage particle oiz~ of lO0
~i~ronleter~ u8ed in R~:ampl~ l. The electro~is~o~s
beha~ior o thi~ fl~lid w~ a~red a~ in Exampl~ nd
these measure!merlt results ~re reporte~ in Tabl~ 1 below.
n l~ca~ 5
An electroviscou~ Jid lh the fnr~ of a
~u~pen~ion wa~ pr~pa~ed a~ in Ex~ple 1~ but i~ t~i~ c~e
u~ing wet-m~ d ~ a pa~ticle:s with ~n s~rer~g~
partic~e 6iae of 8.5 mi~r~meter~ and p~E = lO.0 ~ 4
wt~ aqueou~ allapen~ion~ in place of the wet-methocl 9i~ ica
particl~s wit~ arl a~rera~;e pa~ticle ~ize o~ lO~
mic~ometer~ a~ used in Exa~ple 1. T~le electrDvi~cou~
.

SENT BY:DCC PAT~'~T DEPr. :1Q-28-91 ;10:4~1t1: KC pATEriT [3EPr.~O~L INCSTRAlHY&~E;#1~17
-
14 2~44~3
beh~viol of ~his fluid wn~ mea~ured ~ ln ~x~mple l, ~nd
t~ese m~asurement re~ult~ ar~ repor~ed in T~ble 1 below.
TA~le I
~ --_ .~ .. .. _........... .__
9HEAR PARTICL~
THE~MAL Y~ELD ~ALUESTRE9S S8DIM~
~A~L~ TREAT~ ~_ STAB~LITY ~ IL IT~
1 RVfllun 2XV~m7n
~. .. _ ~ _~. ~
EX. 1 n~ne ~4~ 4gO high mediwa
EX. 2 none ~05 460 high m~diun
~X. 390C~l wk 75 l60 hi~h medium
~X. 4 none 215 440 high Tnediun
. ~ n~he 200 39n medium m~di~n
El~. 6 non~ 315 660 high l~
COMPAR.none 220 4~0 hiqh medlum
CxXlli 2R. s~one150 300 high o~ediu~n
~X. 390C/1 wk35 60 high ~diu~n
COMPAn .n~De 135 2~0 high mediwn
~X.~
~X. Snone 16~ 325 1~w medi~
.... _ _ ~ ........
Becau~e the el~trovi~co1ls ~ it ~c~c~rdin~5 ~o
the pre~ t i~v~ntlon compris~s a disper~ion o~ 0~ l to
50 weight ~r~ent wet~ hod ~ilica parti~les who8e
~urface adsor~ed wat~r ha~ been replaced b~ ~ parti~ular
type of or~anic cumpo~nd in an electr~c~lly insulatin~:
flll~d, this electroviscou~ fluid i~ chara~teriz2d by a
~ub~.anti~l in~rea~e ~n yield value ~t low ~olta~es and
a~l ~xcelle~ heer ~tability.
.. . .

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Event History

Description Date
Inactive: IPC from MCD 2006-03-11
Application Not Reinstated by Deadline 2001-10-29
Time Limit for Reversal Expired 2001-10-29
Deemed Abandoned - Failure to Respond to Maintenance Fee Notice 2000-10-30
Inactive: Abandoned - No reply to s.30(2) Rules requisition 2000-09-25
Inactive: S.30(2) Rules - Examiner requisition 2000-05-25
Amendment Received - Voluntary Amendment 1998-02-04
Letter Sent 1997-12-11
Inactive: Status info is complete as of Log entry date 1997-12-11
Inactive: Application prosecuted on TS as of Log entry date 1997-12-11
Request for Examination Requirements Determined Compliant 1997-11-25
All Requirements for Examination Determined Compliant 1997-11-25
Application Published (Open to Public Inspection) 1992-04-30

Abandonment History

Abandonment Date Reason Reinstatement Date
2000-10-30

Maintenance Fee

The last payment was received on 

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Fee History

Fee Type Anniversary Year Due Date Paid Date
MF (application, 6th anniv.) - standard 06 1997-10-29 1997-09-09
Request for examination - standard 1997-11-25
MF (application, 7th anniv.) - standard 07 1998-10-29 1998-09-02
MF (application, 8th anniv.) - standard 08 1999-10-29 1999-08-26
MF (application, 2nd anniv.) - standard 02 1993-10-29
Owners on Record

Note: Records showing the ownership history in alphabetical order.

Current Owners on Record
DOW CORNING TORAY SILICONE COMPANY, LTD.
Past Owners on Record
TAKASHI NAKAMURA
Past Owners that do not appear in the "Owners on Record" listing will appear in other documentation within the application.
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Document
Description 
Date
(yyyy-mm-dd) 
Number of pages   Size of Image (KB) 
Description 1998-02-04 14 585
Cover Page 1994-04-09 1 13
Abstract 1994-04-09 1 20
Description 1994-04-09 14 585
Claims 1994-04-09 1 16
Acknowledgement of Request for Examination 1997-12-11 1 178
Courtesy - Abandonment Letter (Maintenance Fee) 2000-11-27 1 183
Courtesy - Abandonment Letter (R30(2)) 2000-12-04 1 171
Fees 1996-09-11 1 90
Fees 1995-09-14 1 89
Fees 1994-09-16 1 99
Fees 1993-09-13 1 68