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(12) Patent: | (11) CA 2493217 |
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(54) English Title: | METHOD FOR THE PRODUCTION OF A HYDROPHILIC SUBSTRATE PROVIDED WITH A LAYER ELECTRODE |
(54) French Title: | PROCEDE DE PRODUCTION D'UN SUBSTRAT HYDROPHILE POURVU D'UNE ELECTRODE EN COUCHE |
Status: | Expired and beyond the Period of Reversal |
(51) International Patent Classification (IPC): |
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(72) Inventors : |
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(73) Owners : |
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(71) Applicants : |
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(74) Agent: | NORTON ROSE FULBRIGHT CANADA LLP/S.E.N.C.R.L., S.R.L. |
(74) Associate agent: | |
(45) Issued: | 2008-06-10 |
(86) PCT Filing Date: | 2003-07-08 |
(87) Open to Public Inspection: | 2004-02-12 |
Examination requested: | 2005-01-20 |
Availability of licence: | N/A |
Dedicated to the Public: | N/A |
(25) Language of filing: | English |
Patent Cooperation Treaty (PCT): | Yes |
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(86) PCT Filing Number: | PCT/EP2003/007331 |
(87) International Publication Number: | EP2003007331 |
(85) National Entry: | 2005-01-20 |
(30) Application Priority Data: | ||||||
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Method for the production of a hydrophilic substrate provided with a layer
electrode.
The invention concerns a method for producing an insulating substrate provided
with
a layer electrode especially for an analytical test strip. A combination of
the
following method steps is disclosed: the layer electrode (14) is formed as a
structured
surface pattern on the substrate (10) and the hydrophilicity of a cover layer
(12) on
the substrate (10) is increased by a chemical or physical surface treatment.
L'invention concerne un procédé de production d'un substrat isolant pourvu d'une électrode en couche et conçu en particulier pour une bande d'essai utilisée à des fins d'analyse. Ce procédé comprend, de manière combinée, les étapes consistant à : constituer l'électrode en couche (14) sous forme de motif superficiel structuré sur le substrat (10) ; et à augmenter l'affinité d'une couche de recouvrement (12) dudit substrat (10) avec l'eau, au moyen d'un traitement superficiel chimique ou physique.
Note: Claims are shown in the official language in which they were submitted.
Note: Descriptions are shown in the official language in which they were submitted.
2024-08-01:As part of the Next Generation Patents (NGP) transition, the Canadian Patents Database (CPD) now contains a more detailed Event History, which replicates the Event Log of our new back-office solution.
Please note that "Inactive:" events refers to events no longer in use in our new back-office solution.
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Description | Date |
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Time Limit for Reversal Expired | 2018-07-09 |
Letter Sent | 2017-07-10 |
Grant by Issuance | 2008-06-10 |
Inactive: Cover page published | 2008-06-09 |
Inactive: Final fee received | 2008-03-20 |
Pre-grant | 2008-03-20 |
Notice of Allowance is Issued | 2008-02-14 |
Letter Sent | 2008-02-14 |
4 | 2008-02-14 |
Notice of Allowance is Issued | 2008-02-14 |
Inactive: IPC removed | 2008-02-13 |
Inactive: IPC removed | 2008-02-13 |
Inactive: IPC removed | 2008-02-12 |
Inactive: IPC assigned | 2008-02-12 |
Inactive: IPC assigned | 2008-02-12 |
Inactive: IPC removed | 2008-02-12 |
Inactive: IPC removed | 2008-02-12 |
Inactive: Approved for allowance (AFA) | 2007-10-01 |
Amendment Received - Voluntary Amendment | 2007-08-13 |
Inactive: S.30(2) Rules - Examiner requisition | 2007-04-25 |
Inactive: IPC from MCD | 2006-03-12 |
Inactive: IPC from MCD | 2006-03-12 |
Inactive: IPC from MCD | 2006-03-12 |
Inactive: IPC from MCD | 2006-03-12 |
Inactive: IPRP received | 2005-04-25 |
Inactive: Cover page published | 2005-03-23 |
Letter Sent | 2005-03-21 |
Letter Sent | 2005-03-19 |
Inactive: Acknowledgment of national entry - RFE | 2005-03-19 |
Correct Applicant Requirements Determined Compliant | 2005-02-17 |
Application Received - PCT | 2005-02-17 |
National Entry Requirements Determined Compliant | 2005-01-20 |
Request for Examination Requirements Determined Compliant | 2005-01-20 |
All Requirements for Examination Determined Compliant | 2005-01-20 |
Application Published (Open to Public Inspection) | 2004-02-12 |
There is no abandonment history.
The last payment was received on 2007-06-28
Note : If the full payment has not been received on or before the date indicated, a further fee may be required which may be one of the following
Patent fees are adjusted on the 1st of January every year. The amounts above are the current amounts if received by December 31 of the current year.
Please refer to the CIPO
Patent Fees
web page to see all current fee amounts.
Fee Type | Anniversary Year | Due Date | Paid Date |
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MF (application, 2nd anniv.) - standard | 02 | 2005-07-08 | 2005-01-20 |
Basic national fee - standard | 2005-01-20 | ||
Registration of a document | 2005-01-20 | ||
Request for examination - standard | 2005-01-20 | ||
MF (application, 3rd anniv.) - standard | 03 | 2006-07-10 | 2006-06-29 |
MF (application, 4th anniv.) - standard | 04 | 2007-07-09 | 2007-06-28 |
Final fee - standard | 2008-03-20 | ||
MF (patent, 5th anniv.) - standard | 2008-07-08 | 2008-06-30 | |
MF (patent, 6th anniv.) - standard | 2009-07-08 | 2009-06-19 | |
MF (patent, 7th anniv.) - standard | 2010-07-08 | 2010-06-18 | |
MF (patent, 8th anniv.) - standard | 2011-07-08 | 2011-06-22 | |
MF (patent, 9th anniv.) - standard | 2012-07-09 | 2012-06-19 | |
MF (patent, 10th anniv.) - standard | 2013-07-08 | 2013-06-20 | |
MF (patent, 11th anniv.) - standard | 2014-07-08 | 2014-06-17 | |
MF (patent, 12th anniv.) - standard | 2015-07-08 | 2015-06-17 | |
MF (patent, 13th anniv.) - standard | 2016-07-08 | 2016-06-17 |
Note: Records showing the ownership history in alphabetical order.
Current Owners on Record |
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F. HOFFMANN-LAROCHE AG |
Past Owners on Record |
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CARINA HORN |
CHRISTINE NORTMEYER |
VOLKER UNKRIG |