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Patent 1047171 Summary

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Claims and Abstract availability

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(12) Patent: (11) CA 1047171
(21) Application Number: 243160
(54) English Title: MANUFACTURE OF SEMICONDUCTOR INSULATING FILMS BY ELECTROPHORESIS
(54) French Title: FABRICATION PAR ELECTROPHORESE DE PELLICULES ISOLANTES POUR SEMI-CONDUCTEURS
Status: Expired
Bibliographic Data
(52) Canadian Patent Classification (CPC):
  • 356/178
  • 204/97.18
(51) International Patent Classification (IPC):
  • H01L 21/20 (2006.01)
  • H01L 21/314 (2006.01)
  • H01L 21/316 (2006.01)
(72) Inventors :
  • COLLARIS, MARIA A. A. A. (Not Available)
  • DEBRUIJN, HENRICUS A. (Not Available)
  • SMITS, PETRUS G. H. J. (Not Available)
(73) Owners :
  • N.V. PHILIPS GLOEILAMPENFABRIEKEN (Netherlands (Kingdom of the))
(71) Applicants :
(74) Agent: NA
(74) Associate agent: NA
(45) Issued: 1979-01-23
(22) Filed Date:
Availability of licence: N/A
(25) Language of filing: English

Patent Cooperation Treaty (PCT): No

(30) Application Priority Data: None

Abstracts

English Abstract



ABSTRACT

Manufacture of semiconductor devices in which a
glass coating is provided on a semiconductor slice by means of
electrophoresis from a dispersion of glass particles in a
carrier liquid. A dispersion of the glass particles is used
with a specific conductivity of at most 10-10 ohm-1 cm-1.


Claims

Note: Claims are shown in the official language in which they were submitted.




THE EMBODIMENTS OF THE INVENTION IN WHICH AN EXCLUSIVE
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:

1. A method of manufacturing semiconductor devices
in which a glass coating is provided on a semiconductor slice
comprising one or more of said semiconductor devices in an
intermediate stage or in a final stage of manufacture, by
means of electrophoresis using a dispersion of glass particles
in a carrier liquid, characterized in that a dispersion of
the glass particles is used with a specific conductivity of
at most 10-10 ohm-1 cm-1.
2. A method as claimed in Claim 1, characterized
in that an apolar liquid dispersion medium is used.
3. A method as claimed in Claim 1, characterized
in that the liquid dispersion medium consists of one or
more hydrocarbons.
4. A method as claimed in Claim 3, characterized
in that the liquid dispersion medium consists of one or
more saturated hydrocarbons.
5. A method as claimed in Claim 1, characterized
in that the dispersion comprises at least one auxiliary
dispersion agent in the form of an ionizable material,
which material comprises a polyvalent metal and at least
one ion with at least one apolar organic group.
6. A method as claimed in Claim 1, charactierzed
in that a polymeric binder for the glass particles is added
to the dispersion.
7. A method as claimed in Claim 1, characterized
in that the slice to be treated has an average internal




17



resistance in lateral directions of at least 500 ohms per
square.
8. A method as claimed in Claim 1, characterized
in that the slice to be treated consists for the greater
part of its thickness of semiconductor material having a
resistivity of at least 20 ohm cm.
9. A method as claimed in Claim 1, characterized
in that the slice to be treated comprises surface parts
bearing an insulating coating, and on other surface parts
the semiconductor material is exposed, and that the glass
layer is provided over the whole surface of the slice.
10. A method as claimed in Claim 1, characterized
in that the semiconductor slice comprises a high-ohmic sub-
strate on which on at least one side semiconductor zones of
different conductivity and/or conductivity type are pro-
vided and on the side of the provided semiconductor zones
a network of grooves is provided down to the high-ohmic sub-
strate after which the glass coating is also provided in
the grooves.

18

Description

Note: Descriptions are shown in the official language in which they were submitted.


I J 1~7 ~; 7 I r
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. 17.1~-75 ,~
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~ etl]od Or manufac$urin~r~semiconductor clevices in whic}-
a glas.s eoating is pro~ided, and semicollductor de~-i.ces
manu~actured acoording to said method"~
~t ' sF~
' ~
The invention relates to a method Or mallu- ~ ~
1~
facturing se]niconductor devices in which a glass coat-
ing is provid~d on a semiconductor slice compris:ing
one or more of' said scn2iconductor device~s in an :i.nter-
mediate sta~re or in a ~inal stagre of` manu:~actllre, ~y
mealls o~ elee-trophores:is usin~ a dlspe-rsi~n o:~ ~lass
partielo~s ~ a l:l.qu2.clllledium, hereinafter tc:rmed dis~
r ~ c . ~ n~ 't. l ttl) C~ ~lt ~ ' ' 3 0 O ~ '; U L~ V' ~ IJ U ,~iJ.' U '~
tect vital parts of semicoi-iduc-tor device.s~ preseilt a~ s
the surface, for exanlple, ~-junotions~ ending at t}le ~'
surf'ace~which are to be cxpc)sed to comparal;ively h~6rh
rcverse ~olta~e.s dur~ng use~, or parts wllich ar~ s-~,ns:L- `
tiv~ to atmoc;pherLc inf'luences, `,
Upon providin6r such coatin6rs, lort~>-lastj.ng'
t5 ~hormal troatlllents at modérately hiCrh teltlperal;ure ca~
ad~ersoly ;Lnfluence thc e1oc~r:Lcal propcrties o~ t]lû
. semLconductor devices. Witll a view to a reasollable
protective effect against atmospheric influellces, the ~-
.coatLng shoulcl bc sufficiently th:icl~. Howc~er in the
?0 case o~ large layer tllick~lesses, tllerllla11y causcd 5tre.s--
se~ ma-~ occur and these Illay d~amag,e the semiconcluo~or ~'
dev.l.ce. :~n order to ~ro~i.de a gla3s coa-t:Lngr with a '.
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reasonal~le thiekness and to avoid therma:L treatments ~,
Of lon~ duration, aeeording to a known methocl the
~lass layer was cloposited e, ectrophoreticai.ly from
a disporsion of fino-granular glass particles in a ~ f~
dispersion medium, for example, water, me-thanol or
ethyl aeetate. The charge of the glass particles ori~
ginated from ions àdhering ~o the particlos. Such a
deposited layer has suffieient adhesion to the device
- to ~lithstand`, for example, rinsing treatmc-nts. For a
better adhesion and screening ef:t`éc t j a thern1al trc~t
me2nt at a moclerately hl~ll tomperaturo and o:~ on]y a ~ ~,
. f
short clurat~.on ma~ thon su:~:fiee . 1~ r~
~t has been louncl, howe~2rer, that the electro-~
phoretie depo.sition is of-ten n~ b produced uniforl11l 2~ 2;
over the semiconductor surfaee cmd the deposit is
somot-:imes entiroly restricted to those parts of the i
semieoncluct-or sli.ce surf~e which are present in the
immediate proximit~ Or the eleetrode eonnec tion pro- i
vidod for the eleetro~ ores~is. :I:t has furtIlerl11ore been
establi.slled that non-uniforlll eoatiIl~s in the malIu:Eac-
ture Or varlous types of semiconductor devlces occ~lr ,
to dif ferent extent . i~.
A first idea whieh has led to the present :;n- i-
ventit>tI is that the above-ment.ioned phenomena may be
relcl ed to rosistances in tllo slice itsel.f. As i.s
,,
confir111ed by oxperiment-2, non-.unirorm deposits occur

particulariy st;roI~ y :in those scmicond1lctol sl.ices
'.

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which consist at least f or, the gr~3ater par t Or material
o.f .a comparal;ively hi~,h res:isti.vity, : .
The invention is furthermore based on the idc.a
p. that. in tl1e above-described 1;nown method the suspension ,
, used has a comparatively high conduc-t:ivit:y, so that the `,
internal rcsistances between the electrode connect.ion ~`
provided on the slice and the varlous parts of the se-
miconduc tor slice surface exposed to the suspensi.on,
in particular those surfaoe par ts ~hich are present
~ at some dis,tan~oe from the connection-, need not be , ~ ,~
negligibly small witl1~ respect to the resistance be~
tween each o:E the sur*aco parts and the coul1ter-el~c- '" !~
,~ , troci e provid ed in iihe su s pen s io~ . , .
It has further been considered that the charge `~ `,
I5 ~ of: the iOllS o:l~ la given sign adhering to the parti.cles ii'' .
are naturally: compensatec1 for b~ ions di~;solv~3d in'' the ; ' j
dispersion medium. Both types o: ~ons are foLmed frol~ ,I .
dissoclable sul~ ~;ances ~ hereina*ter termed auxi,liary ,
.. . ~ disp~rsion aj~ents, suitable for that purpose and added
.' 20 to the coDventional ~.ispersion media~ in w~1ioh the (
ions of one char6e type must be cQpable of adher:Lng l; .
to the sus,pended parl;:;oles and the ions of oppos:~,te
Gharge type mu~;t preferably remain dissolve(l :Ln sai.d . i
mediwn by ~):inding to the dipo1es o~ the molecules o~
the dlsperF;ion medluI,n *or wh.ich purpc se I;ho saic1 ions
Or opposite charg(3 type shoul,d pre:C`erably be, comp.lra~
, tlvely small . Consequ(3l; l;:1.y the mobi.l.ity of sa:Ld i.ons
' , ' ' . . ' ~' ~



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17.12.75
. ' " , ,' " ' ' ,. ~
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of opposite ehalge type i~ comparativcsly -lar~e~ An
othor supposi-tion is, that said small ions should form
a eomparatively clense cloud ln the po].ar mediul;lLIrollnd
~ each dispersed cliarged partiele so as to main-tain the
dispersion. For such a comparatively dense ion cloud
a correspondingly high ion concentration must be formed
.- in the solution. The said comparatively hig]l concentra-
tion Or dissolved ions and their eompnratively l~rge
niobility are responsible for tlle comparatively ll:i~rh
eonduetivity of the dispersions used :in thes abovc-
me~nt:ioned lulown ritetllod It :i5 to be noted that clue to
~h~s very small mobil.ity o~ the disl~ersed parS;:ic].os, t ~ ~'
, , Ille COnt'l'.ibUCiOn oI saicl a-t~spcriecl pa:r~icles to the ti
- eonductivity of the dispersi.on is neg].igible.
~_1 s~
- ~ further iclea underlying tlle invention is .
that for t]le electrop~loretie deposit:Lon of glass on ~i
semieonduetor slices, glass dispersion.~ of a con~e-
niently lo~ conductivity may preferably be utiliYed.
Aeeording to th~s invention a method of manu-
I`aetur~ng semicoIldtlctor desviees in ~llich a glass eoat-
lng is provided on a semiconductor ~lice compr~.s
one or Illore of said se~ico~dtlctor devices in an illter-
mediate stage or in a final sta~re of manufacture~ by
mecms of electrophoresis using a disp~srsion of glass
particlei in a liquj.d di.spersion medium, is characteriz
ed in that ~ disper.;ion of thc-, ~lass particles is used
~ith a sy~seific conductivi ty o~ at most 10 o}1m cm 1
'
. '' ' '' ' '" '; ' ~
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l'llN 7872
. 17.12.75


; 3L~4:7~L7~ ~ ~
It is to be noted that the fact should be takell i~ltO
acçount.that the dispc-~rsion medium in itsel~ llas a
lower cond~ctivity tl1an.tlle dispersion preparec1 witl
it so that the liqu:id dispersion mediwn should be
.. , ~t~
chosen .from liquids having a speci.~ic cond1lctlvity of`
less than 10 ohm cm . l~rater and methanol, for
examplc, have a spècif`ic concluc-tivity of more tllan
10 ohm cm . A lligher specif`ic concluctivity has ~ ! .
aLso been measured for etllyl acet:ate. Hydrolysls can ; ~ r
increase t1le coMclllctivi-ty of etllyl acetate. ~ i~
It is to be noted that in ~:i.old3 otthor tllan
sc~niconductor techl1ology, d:i.sporsions ~or e:Lcctro-
~;LOre8:ig wltll a conduct:Lvity of le~s t~l.m 10 lû o}lm ICm
ar~ known por se, ~or example, ~or the depos:ition of
piglllents or carbon particles in the manu:~acture of
disp~ay tube~
According to a proferred embodimc?nt, an apolar
liquid dispersion mecliuln is u.æed. Such an apolar clis- .
pet~sion meclium has a conductivity o~ its o~n whicll is
le~5 ~llan 1û 10 ollm 1Cm 1. 1.
It is recolmll~ndablo to C,]lOOSe tllo l~qu:Ld
dispersion mediulll froln tlle hydrocarbons~ pre~erably
tl1e sat~rated hydrocarbons. rhese have rl very low .
conduc-tl~rity o.~ tlleir own. The d:isper.sion mediulll need
not cohs:i.st of a single liqllid llydrOC,arbOn bllt Illcly
also cons.ist-oi a liquicl~nixtllre of hydrocarbons.
~ccordir3g to.a furt}lcl pre~orred embodimc?nt
.' ' ' ~
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the dispersion comprises at least one allxil:iary dis-
persion agent in tho rorm of an ionisab~e material,
Wh.iCll ..material compr.iscs a po].yvalent metal and at
~ least one ion ~ith at leasl. olle apolar orgc~ic group.
A polyvalent metal is to be eonsidered here as a Inetal
having a valene)r larger than 1. Sueh auxiliary disper-
sion agents are ~nown ~ fiO. Tho di:sociation of sueh
an auxiliary di.spers:ion agent in an apolar d:i.sper.s:ion
medium is proba~ly made possible by the occurrence o~ ~
Yan der Waals~ -rorces ~e-tween t}le apolar liqu:id and ! E
the apolar ~roup(s) o~ tlle above~ elltiolled ion, as a
J'e9Ul t of Wlli,Ch SUC11 an lon :is di~so:Lved i.n ~he apola
liqu:id. Tll~ pol~cl:L~ I.fl~ wi~ cr-~l.
thereto prol~ably forllls a morlovalent complo~ ion wh;.el
is adher~d to the glass particles, so that sai~a par~
tieles obta:Ln a eertain eharge ~rhich i.s oî opposite
. ï! ~
Si.6'11 Wit}l respect to the ehargo of tlle iO13S dissolv-
ed in the di.spersioll medium. Thc gl'OUpS bound to the
pluraly valent metal 3 in the monovalent eomple~ :ion n
~0 may provi.~le n contr:L~ution to the dispers:ion o.{ tho
glass particles. ' 1
Yan der Waalsl ~orccs are g~nc:rally low with -
res~ect to electrostatic bindin~r forces ~etweer~ :iotls
.
of mutually opposite sign or ~ctween an ion and a
' ~:
dipole.mole~cul.e. In order to nlalie dissociation of

~h~ au~ili.ary.dispersioII agellt nevertlleless posslble, ~ .


-tl-le apol.ar part of the ions d:issolved in the clispel-s:ion
'. ' ' . . . '' ,,
'~ ' '. . '
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. . ~'IIN 7~7.
. 17.~2..75
.~ ' ' .'"'"' , ' . ~


mecIium should be ~airly Iarge. For exaIllpIe, the apola.r
part may consist o~ a cha.ln of an alipIatic hydrocarbon
grollp having a conveniently large number o~ carboII atomsr
The mobllity of the lon which is a dec.isive ~actor oi`
the conductivity of the dispersion, is very small clue
. to the compara-tive size of` the ion.
Fur-tIIerlllors~ the lo~ conductivity Inay also be
ascribed to the low concentration of dissolved iOllS, '.
inter alia by a low degree of dissocia-(;ion of' the All~i-
li.ary clispers:ion agent. For ch.arge compeIlsation a cloucl
Or dissolv0d ions are f`ormed around the disp~r~cd glass '
particles whicIl cloucl is ratI~ r :klli.n~ .,th.eiapolar:.di:G~.
r ~ .L o ~ e d iun
~ocordln~ to ~ :.~urth0T pre~orred omhodiIllont a ,.
polyIller is added to the disp~rsion as a binder f`or the
~lass part:icl0s, As a result o~ this the adhesion b~
twoen the deposited glass particlcs is improved. ~s ,l ~
is kr~own ~r so, S~ICh a polymer binder may provide c~n ~ ~
~f'f~ctive contrl~ut~.on to the dispersion of solicl par~
ticl~s in an apo:Lar di.spersion mc3dium as a reinforci.n~
and stabilizing agcnt. Xn particular in the preseIIt
case o:f th-3 suspension o~ lass particl0.s which hav
a polar strllct~re thQms~lves, polymors wh:ich ma~ be
active as r0inPcircin~ cmd stabiliY;ing agc3n tS OE~ Qtic~larly
~`S~[Lil. l;~ur thern~oro the polymers ma~r adhere t:o the par~
ti.cles and ~ I;heir apt-lar p~rt S till~U Late a V~l dcr 1 ,
Wnalst bon~ to th~ mc)lecll]:es o~ the apolar Illo~ium. 'J'l-le . ~.


~ 8
.

- -~ n~N 7~72 `
17,12,75

7~7~ :
.., . 1~
polymer may compr:ise side chains of at least 4, fo
example, 10-20, carbon atoms. Polylne-thaciy:l:Lc acicl
compounds may be very useful. In a short duratio
thermal treatment possibly sucoeeding the depositlon
of the glass coating, such compounds may rapicll~ dis- `i
appear, also due to depolymcr:isation. '~ ~-
It has no-~ ~een found that it is poss:ible by ~;
means Or the method according to tlle invent:ion, to
ef~icaciously pro~ide glass coatings of uniform thick- ,.
ness on semieonductor slices of comparative1y higrh
resistances ln lateral directiorls, e~ren on 91:iccs
t~
av;n~ an average ~ ternal resistance in lateral t
dlrectiorls oi` at loast 500 ohnls per squaxe.
Glass eoatings are partlcularly usefu] for ¦
semlconductor devices having pn-junctions, for which
a high brea~clown voltage is roquired. In thct manufac-
ture of such devices use is made of a semiconductor
slice of high resistivi-ty in ~-hich, one or more æones
of opposito con~uctivi-ty types are pro~ided, for
c~ampl~,by d:ifrusion. A sliee thus treatcd s~
consists Or the original high-ohmic material for -the ,
greater part Or its thickness. In particular in that ¦
- càse non-uniform glass depo~its are obtained witl~
the ~l0~ method. The method ~ccording to the inventic~
llo~ makes it possible to suGcess~ully cone slices
}liCh conslst of sellliconductoL Inaterial having a re-
siistivity Or at least 20 Ohm.cnl over the greatex part
' ' ' '' ~

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of their thicl~ness.
- . Xn semiconductor dev~.ces wlt;}~ higrll-oll~ic sub-
strates, f`or example, diodes ~Yith h:igh brea~idown voltlge
~ and many thyristors, glass coatings are u.secl in order
to obviate lo~ breakdo-~n volttges by peri.pher~l dis-
turbances wllere ~-jw~ctions are encling ~ the semi-
conductor surfaoe. In a pre~errecl embodiment a ~serni~
conductor s~ice_is used WhiCll comprises a higll-o]lmic .
eubstrate on which on a-t least one side at leas-t one .
semieonductor zono of a diiferel1t conducti.vil:y .nd/or
conductivity type :is l~rov.iclecl. Accordingr to 9aid pJ'e-
fcrled el~ odilllont, on the sicle o:C tlle providocl sem:i-
concluc~or Y.onetSj a net~York Or grooves is proviclecl
do~Yn to in the hig}l-ohmic substratej after which the ;
glass coating i5 also deposi-ted in the grooves f`roIll the
dispersion in the apolar disp-rsion medium. In this ~;
manner~ junctiolls debouch;.n~; into the grooves~. .
may be covered with a stabilising glass layer. S:ince
- the groovos extend lnto tho hig}l-ohmic nlaterial the
~ various senliconduc-tor parts enclosed by the grooves
are connec-ted tog-3t}ler only by h:igh-ohin:ic su~stra-te
material causing non-negli~rible lateral resistances
in the slice. When g1ass coatings are fornied oii sen
conductor slices using knot~7ri ~ispersions of glass
~5 partic1es :i.n l;olar dis},ersiol1 me~licl the coatirig.s pl-O-
~ .
duce~ ma~r le of non~uI~ ornl thi.c]clless or ~na~ 1e-ve . ~.
parts of t}le sllce uncoated, whereas a glas~s COting i
,' ~
.'' ''. ` . '' '' ' ~
, ' _ 11)''- . ', '
' ; .~",

~ IN 7872
" , , , , . 1 17.12.75

~7~L7~

on the sen1iconductor surfa.ce o r a substantially ~Ini-
form thic];ness is obtained over the whole are of tlle
slice by m~clns Or the metllod according to the inven- ,
tion. , ,
- ~ further ilnportant aspect of the mcthod ac-
cord.ing to -the invention is as folLows. In the l;nown
,deposition~ only exposecl senliconductor and possib:Ly
metallically conducti~e surI`ace parts are covered,
whereas insu'Lating layers already present, also i~
these are eon~paratively thin, remain uncoverecl. By ~ E
means oI` t;ho method aecording to the invention, S~II'- ' ~.
' ~no(3 parts consistin~ o~ insulAI;Ion nl~terial are aL,so
~overe~l witn tho giass pa~t~e-.es. ~s a result of` thls j
an improved protection o-f vi.tal parts Or the semicon~
ductor device t.o be manufactured oan be obt~ined.
The invention furthormore extonds to semicon~
ductor devices obtained by meaIls of -the methocl accord-' ,,
ing to the iDvention. ' , 'I ' ~;
The inventi.on wlll now be dcseribed in greater , .
,20, dotAil Wit]l rc:~ercnco to an elJIbodilllent.
ln t,his embodilllent,a glass coa-tinG is,provid- ~ ~'
' ed on a silico~ slice which has been'obtQined, for i
example~ as follows~
, Startin~ material, is a disc-shaped sliee :'o~ ,
2S . monocrystallinf~ sllicon }iav:in~ a resistivity of approx.i- -
~ . .
matel~ 50 oI~nl.em. ~Yle s:Lice has. a diameter o~ approxi-
m~toly 50 nlln and a thic~ ess o~ 200/unl. ~t has been
. '' ' '' ' ' '' ~
.

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~47
. i i,,
obtained frolu a rod-shape(l sin~le crystal by sawing
in the direction Or r 100~ -planes~ a~ter ~hich the
slice has bQen ~iven thc above thicl~ness by grinclin~,
~ polishing and etchine
One or more zones destined fGr semiconclucto
devices to be n~anurac-turecl are provided on one side
by means of ~o~Yn metllods, for example, by d:ifIusion
and pos.sibly ep.itaxial dcposition, ~-thlch zonc o:r Y,OIleS `
differs or dirfer in conductivity type and/or conduc- `~
tivity from tllose Or the rema:in:ln~r pc~rt o~ the origi-
n~l mater~al of tho slice. Saicl remalnln~r part ~YhiC]~.
constitutes the ~reator ~art o:E` the thicl~.ness o:~` the
Slj ce ~rill hereinafter be re~errecl to as the hi~?h-O}l!l~j_C
~ ~substrate. A layer of insulatiug matcrial, ~or e~am~le
t5 Or silicon oxide, may be providecl according to a desir- --
ed.pattern on the scmiconciuctor surface on -tlle siclc? o~
the proviclc?d zone~s).
On l;he rele~ant side of the sl:ice ~here the ,, r~
zonc(s) is (nrc) sl.tuated g:rc-oYes are no~r for~i~ecl, :
~0 ex~mple, accord:illg to a net~-rork of scr:ibirl~ lan~s alon~
wh:ich the s.l.:ice can be sevc?red into a number of semicon- ~ ~`
ductor clevices. Said ~rooves may be prov:Ldcd in kno~rn
manll-?r, in ~Yhich first a possiblc layc~r of insulation ~.
matcrial accordine to the pattern Or grooves is re- `
moved Accordingr to the ciesirecl pattcrn o~ ~rooves,
t;]le silicon iS ctch(cl anisotropically (US:).}l~,' an e l;C]I~
resistan-t mask.in~) do~Yn to a de~th cxcceclin~; t}le thic3i- -~


- 12

~ .

: ~ ~:
l"lN.7872 7:
2~ 75 ,

~47~ ~
- .
ness of the provide.d zone(s) 011 t~lC relevant si.de of
t}le sliee. Julletions in the semieoncluctor mat.erial,
for example, between SUCll a zone ancl t]le substrate
~ material, may mer~e at the surraee~ a-t the ~alls Or ;
the grooves
A dispersioll of glass par-tieles in a su.:Ltable ;
liquid disporsion n~edi.um is preparod for use in the
elcetropllore-tie deposition Or a glass eoati~g on the :
. se~nieondue-tor sliee surfaee. The glass parti.elcs eon- '.. .
sistof a su:Lta~le high-ohlllie ~lass on the basis o:~
sil.ieon oxide, lead oxide and alu~i.n.iulll o~i.clo~ u.ld.
hio]l glass ~oI`volls at app:roxilnato:l.y 8~oo to 850C .
~ ~cc ^~ th:7.~ ~ i.J ~ v~ ?:L' ~ î ~r .~m:i- r :
eondlletor uses. . ! 1
Tho gra.in dian~eter of the glass particles i5 '~ .
between approximately 0.1 ancl 10/um ~ith an a~rerage
, ~nlue Or approximately 3/um. ;
~ As a liquivl dispersion llled:iuln is usod a mix- ..
t~lro Or isopnrarri.ns havillg 9-12 earbon atoms por molo-
~20 eule, il~ tl~is eas0 a mixtvu:rc? whieh :is eommc?reially .
available as "Sholl Sol T0".
~ .
~or the auxiliary dispersion agents to be
addcd is used a mixture eomprisillg -
-1 part by ~eight Or a ealcium soap of dide-
25. eyl estc?r o.~ suJ.rJllosuceil]ie aeidj
1 par~ by ~eig]lt o~ a ehrorlliuln soap o~ a
.mlxture Or allc)rl salieyla.tcs, the all;yl group o~ whieh
. " ," ~
~. , . ' , . . ' ~
. ~ 13 - - ~
.',,` ' '." .' "' ` ~

PllN 7~7'.
. . 17.12.75

7~
comprises 8~ carbon atoms.
1 part by we:ight; of a co-polymer of lauryl
stcaryl methacrylate c~nd 2-methyl,5-vinyl pyridinc~ d
~ 3 parts ~y wcight of a suitable solven-t, Por
example xyleno.
Such a 7nixture is commercially ~vailab]e as
~'A S ~ - 3i' o~ Shell Cy. 0.75 g of said m:ixture is
dlssol~.ed in 1 l of the abo~e~montiome~l isoparaPri
mixture. OP this mixture tlle calciuln soap and the
c~lromlum soap :~orm the ionisab].o aux:i.liary clisper~sio
a~en~.s. Tho co polymer ~orllls a re:inforcin6r c~nd sta-
bili.~.inGr agenl
In the present example a furtller re:;nforci.ng
.
- and stabiliz.in~r agent in the form of a lauryl st~aryl
polym~thacrylate solution of 20 g per litre of the al- `.
ready mentiollecl isoparafrin mixture is us~
The suspension is prepared by add.intr~r;
10 g oP the ~rlass parti:cles to be suspendec1
20 lnl Or tlle ~A.~.~.3~-sv:Lution clnd
10 ml of -tho lauryl stearyl polymethacry].~-te
SOltltiOll ~ ~,
to 1 litre of the isoparclffin n1ixture "Shell So]. T0".
The specif`lc conclucti~;ity of the dispersion is 5x10 2ol~m
crn
~n.c~g~ por-l;:;on oP th6 serlliconduc~or sl.ic~
to bc covered is connected to c~n electric :Load melllbor
.cons:i.stin~r of p].atinulll by means oP a cj.a~ and hullg
'', ' - ' ~
,

IN r/ 8 7 2
. . 17. I~ . 75

,

~L'~'k`7~.7~L .

in -the suspellsiol~, the sl:i.ce forlIlin~,r on~ e].cc trocle in
the electrop]loresis bat~l, A p1.ati.nurll coullter--c.1.ectrodc
in -th~ rorm of a d:isc having a diamctcr of 5 Clll iS ar-
~ i~arc,ed diroctly opposite thQ s~.cle ~:ith l;he groovcs,
so tllat tlle mutual d:Lstance be twee,n t]-le slice *o bc
treatod an~l the platinum counter-electrode :is approxi-
- mately 1~ mm everywhore. '
' . A volta~e o~ 200 volts i.s thcn appliec~ acros~s
tho electrodes, the semiconductor slico being nogat:ive-
ly b:Lasecl rolat.Lve to the cowlter-ei.ecl:rod~. A~tc,~r ~p-
prox:Lmatoly 1 mLnute a unLform i.ayor ap])rox:i.mclteLy 'l5/u
th:Lcl~ htl5 beon provided on tlle semicollductor s i. Lcc ~sur-
~aco on the side with the groovo.s and covers the sc.~nli-
conductor slicc surrace and, iLf preserlt, insulating
,
layei~ portlons.
Aft~.?r dryill~, thc sltce witll the result:Lng
coati..ng,of glass particles, mainly bonclccl by mctll.c~- ;
crylato~ :is s~lLj'ected to a tllermal tro.ltlllcllt in air
1t: 1 telllpcra~ul~o o:~ 500C ~or 10 Ill:L31u~o.s, c~ ? 01' -
~20 ganic chcllllcal con~t:Ltuellts, for cxalllple, tho nletha- ~'
crylate, dis~u~pear.ing par-tly by depolynler:isa*:Lon .~ld'
~ ~ evuporltion, and partly by oxlclation~ Tlle glass par-
- . ticles arc then fuscd to rorm a dcnsc glass layer by
llcating at ~OO~C for approx,inlatcly 7 nlinutos.
I~or conlpari.so)~, silllilar solnico3lductor sl:i.ces
erc Sll~J ecl:~d to c:Loctrop~lo:rctic coa-Ling t:reatlllellt~
.Ln 1 dis~C?rC;.iOIl of ~lus9 p~J~tiC~.CS il3 1lieth~llo.1. as t~
.. , ;
1S




, ,' ' ' ''' ' "' .
.. - , ~

PIIN 7872
- 17.12.75




dispersion med:ium and ~lC13 lS an auxil~ary d:ispersion
agent The speeific condllc-t:ivity of the dispersioll in
Dlethanol was between 6~10 5 o]lnl cm and 10~10 501lm cm
dispersion in eil-lyl.lc~tate was also usecl wl~ich had a
specific conducti~ity o~ 3xlO 90hlll Clll 1, Mle slices
were not coated electr-opll.oretically ~ith a layer of
glass par-tieles or we]-e only eoated elecl:rophoretieally
near tlle provided ~leetrod~ con)lee-t:Lon. l~rhen using
an~ of said d:Lsper.sio*s ~:itll polar cl.L.~p~r.ioll med:ia
1n no deposit:ion o:~ ~J.ass plr-ticle~ ~as Obta.:LrlC`CI clt .. ln~'
sur~aec3 portiolls a~ which insu].atin~ layorc~ olo a:l.-
ready pres~llt.
Results sirnilar -to the glass coat;in~ proee~s
according t;o the abov~ eJllbodlment are obt:a:ined in si-
. .
mil.lrly treating semiconductor slices clest:incd for
th~rristors, in whieh on eitller sid~ ~ones have been
dif~sQd in a hi.gl--ohmie silieon .sl:ie6 and. a networl~
o~` grooveci llave been prov:i.decl on both sic1'3s down l;o the
substl~ate. Tl~e lat~ral rosistaneo Oe saicl slico9 iS on
, 20 an average 200 ohms per square. T~o dise-s~lapecl eounter-
olec-trodes are usecl,one on each s.ide o~ the selniconduc-
tor slice ancl at equal distances t]ler~.~roin.
It ~-lll be obviou~ l;llat the invention is not
restrictecl to the above embodinlQnts W:it]l d:ispers:ion.s
~5 -:i.n apo.lar media and l:llat .~mic.olJdue1;or .ql.iees Or selni-

eondue-tol materi..l:l. other than silieon and/or i.i.t]l
hetero~ nctions ean be provi.dod with ~la.ss eoatin~S
~ ec~rresI)orldi~l~JJIlmner ~it]lout ~ p~:rtin~ :t`30JII t~e
.~e~ e c~:e tl~o ~ l.i.on.

.
. ~ 16

Representative Drawing

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Administrative Status

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Administrative Status

Title Date
Forecasted Issue Date 1979-01-23
(45) Issued 1979-01-23
Expired 1996-01-23

Abandonment History

There is no abandonment history.

Owners on Record

Note: Records showing the ownership history in alphabetical order.

Current Owners on Record
N.V. PHILIPS GLOEILAMPENFABRIEKEN
Past Owners on Record
None
Past Owners that do not appear in the "Owners on Record" listing will appear in other documentation within the application.
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Document
Description 
Date
(yyyy-mm-dd) 
Number of pages   Size of Image (KB) 
Drawings 1994-04-13 1 13
Claims 1994-04-13 2 57
Abstract 1994-04-13 1 19
Cover Page 1994-04-13 1 25
Description 1994-04-13 15 730