Note: Descriptions are shown in the official language in which they were submitted.
WO 95108612 PCT/US94/10247
X171529
1
USE OF HYPOCHLORITE-COMPRISING COMPOSITIONS FOR
IMPROVED MILDNESS TO THE SKIN
Field of the Invention
The present invention is related to hypochlorite-based
compositions.
Background of the Invention
The present invention relates to hypochlorite-comprising
compositions. It is highly desirable to incorporate
hypochlorite in detergent compositions for bleaching.
However, hypochlorite is an irritant and many consumers
suffer from skin irritation when using such compositions.
WO 95/08612 ~ 1 ~ 15 2 9 y~ PCT/US94/10247
2
Particularly, the hands of the user are prone to such
irritation. As a result of coming into contact with such
compositions the hands suffer from dryness and from a feeling
of tightness. This occurs when the compositions are used neat
and also when used in diluted form.
It is believed that hypochlorite attacks the uppermost
layer of the epidermal of the skin. This results in the
decrease of the elasticity of the skin. The skin also becomes
more sensitive, resulting in dryness and coarseness of the
skin. In addition the skin may become inflamed and become red
and sore and itchy. These effects are magnified in alkaline
conditions, because alkali is also an irritant. Alkalinity is
required for hypochlorite stability and it thus the preferred
condition for hypochlorite-comprising compositions. However,
alkaline conditions contribute to skin tightening because it
alters the natural pH of the skin.
The object of the present invention is to improve skin
mildness and reduce skin irritation of hypochlorite-
comprising com.~w itions.
The presECa invention overcomes these problems by the
use of the combination of amine oxides and specific alkyl
sulphates in hypochlorite-comprising compositions. It is
believed that this surfactant combination wets the skin and
provides a protective layer against hypochlorite and
alkalinity on the skin.
Amine oxides and alkyl sulphates are known in the art.
US 4 282 109 discloses a thickened bleach composition
comprising hypochlorite and a thickening amount of a
surfactant blend, comprising amine oxide C10-Clg and alkyl
sulphate Cg-C12. There is no mention of the reduction of
hypochlorite related skin irritation of these compositions.
EP 274 885 discloses thickened bleaching compositions
comprising alkali metal hypochlorite and straight chain C14
amine oxide with a mixture of branched and straight chain
C15 amine oxide. There is no mention of short chain
2171529
3
surfactants or the reduction of hypochlorite related skin
irritation.
EP 233 666 discloses a process for the manufacture of a
thickened bleaching compositions comprising hypochlorite. a
hypochlorite-soluble surfactant, including amine oxide and
an alkali metal salt of a fatty acid. There is no mention of
the reduction of hypochlorite related skin irritation.
DE 28 37 BBO covers bleaching compositions comprising
alkali metal hypochlorite and mixtures of branched and
linear amine oxides of varying chain length, (C5-C1~~ for
increased viscosity. There is no mention of other long or
short chain surfactants or the reduction of hypochlorite skin
irritation.
EP 30 401 covers thickened bleaching compositions
comprising hypochlorite and a certain number of product
characteristics including pH and viscosity. Mixtures of Cg-
Clg amine oxides and fatty acids are preferred as thickening
agents. No other surfactants are disclosed. There is also no
mention of reducing the irritation effects due to the
hypochlorite.
Summary of the Invention
The present invention is directed to the use of the combination
of an amine oxide with an alkyl sulphate in hypochlorite-comprising
compositions for improved skin mildness. Said amine oxide is
according to the formula R,RZR3N0, wherein R1 is a Cg to C18 alkyl group
and Rz and R3 are independently Cl to C3 alkyl groups. Said alkyl
sulphate is according to the formula R40SO,H, wherein RQ is a C6 to Clo
alkyl group.
All amounts, ratios, percentages and parts herein are given as
a % weight of the total composition unless otherwise stated.
.. 2171529 ~j
3a
In a particularly preferred embodiment the invention is directed
to a cleaning composition having reduced skin irritation, comprising:
a) a hypochlorite compound wherein the amount of active chlorine is
from about 0.4% to about 5% of the composition; b) from 2o to about
5g of an amine oxide having the formula: R1RZR3N0 wherein R1 is
C8-C,e alkyl; R~ and R3 are each independently C,-C3 alkyl; c) from
about 1% to about 80 of an alkyl sulfate having the formula: RQOS03H
wherein R4 is C6-Clo alkyl; d) from about 0.5% to about 0.9% of an
alkali metal salt of a CB-C18 fatty acid; and e) the balance carriers
and adjunct ingredients.
~l~
WO 95/08612 21 715 2 9 ~ pCT~S94/10247
4
Detailed Description of the Invention
The present invention is the use of the combination of
an amine oxide and an alkyl sulphate in hypochlorite-
comprising compositions for improved skin mildness.
Thus, an essential ingredient in the present invention
is hypochlorite. Preferably the hypochlorite is an alkali
metal hypochlorite. Although alkali metal hypochlorites are
preferred other hypochlorite compounds may also be used
herein and can be selected from calcium and magnesium
hypochlorite. According to the present invention the
compositions comprise said hypochlorite compound such that
the content of active chlorine in the composition is from
0.9$ to 5$, preferably from 1$ to 4~, most preferably from 1$
to 3~.
Another essential ingredient is a combination of an
amine oxide with an alkyl sulphate to improve skin mildness
of the composition. Said amine oxide is according to the
formula R1R2R3N0, wherein R1 is a Cg to Clg alkyl group and
R2 and R3 are independently C1 to C3 alkyl groups. Preferably
R1 is a Cl0-Clg, more preferably C12-C18 alkyl group and R2
and R3 are preferably independently C1-C3, more preferably
Cl-C2 alkyl groups. In the present invention the composition
comprises from 1$ to 5~, more preferably from 1.5~ to 4.5~,
most preferably from 2~ to 9~ of said amine oxide and
mixtures thereof.
Said alkyl sulphate is according to the formula RqOS03H,
wherein Rq is a Cg to C10, preferably a C~-Cg, more
preferably a Cg alkyl group. According to the present
invention the composition comprises from 1~ to 8~, more
preferably from 1.5~ to 7.5~, most preferably from 2~ to 7$
of said alkyl sulphate and mixtures thereof.
According to the present invention the compositions may
further comprise a number of additional ingredients. Suitable
optional ingredients include other hypochlorite-compatible
WO 95/08612 2 ~ ~ 5 2 g '~ PCT/US94110247
long chain surface actives including alkyl sarcosinates,
alkyl ether sulphates, paraffin sulphonates and amine oxides.
Another optional component of the present invention is
an alkali metal salt of a Cg-Clg fatty acid. Suitable fatty
acids for use herein can be any Cg-Clg fatty acid, preferably
fully saturated, preferably a sodium, potassium or lithium
salt, more preferably the sodium salt.
In a highly preferred embodiment of the present
invention the compositions have a pH greater than 10,
preferably greater than 11, more preferably greater than 12.
This is achieved by the addition of from 0.8~ to 1.5$ of a
caustic alkali. Suitable caustic alkalis for use herein
include sodium and potassium hydroxide.
According to the present invention the composition may
also comprise a number of other additional ingredients such
as hypochlorite stable and soluble colourants, perfumes and
hydrotopes such as sodium xylene sulphonate.
According to the present invention the compositions are
prepared by methods known in the art such as those described
in GB 1 329 086.
According to the present invention the compositons may
be used for a variety of purposes, such as bleaching and hard
surfaces cleaning.
According to the present invention the compositions can
be illustrated by the following examples.
WO 95/08612 ~ 1715 2 9 ~ PCT/US94/10247
Examples
EXAMPLE 1 2 3 4 5
~' weight
Ingredients
Coconut dimethyl amine0.6 0.8 1 0.6 0.6
oxide
Tetra decyldimethyl 3 3 3 4 2
amine oxide**
Octyl alkyl sulphate 3 3 3 4 3
Coconut fatty acid***0.9 0.5 0.5 0.5
Sodium hypochlorite 1.7 1.4 1.4 1.4 1.7
Sodium hydroxide 1 1 1 1 1.3
Silicate 0.4 0.04 0.04 0.04 0.4
Perfume mixture 0.3 0.3 0.3 - -
Minors
Viscosity (cps at 300 420 500 1000 25
25C
pg 13 13 13 13 13
EXAMPLE 6 7 8 9 10
weight
Ingredients
Coconut dimethyl amine0.6 0.6 0.6 0.6 0.6
oxide
Tetra decyldimethyl 2 1 - 4 4
amine oxide**
Octyl alkyl sulphate 2 1 1 4 5
Coconut fatty acid***0.9 0.9 4.5 0.5
Sodium hypochlorite 1.4 1.9 1.4 1.4 2
Sodium hydroxide 1.1 1.1 1.1 1.1 1.3
Silicate 0.4 0.4 0.4 0.4 0.4
Perfume mixture 0.25 0.25 0.25 0.3 0.25
Minors
Viscosity (cps at 280 200 20 500 30
25C.'
pH 13 13 13 13 13
WO 95/08612 PCT/US94/10247
2171529
7
EXAMPLE 11 12 13 14
weight ~ ~ $ $
Ingredients
Coconut dimethyl amine1 1 1 1
oxide
Tetra decyldimethyl 2 ~ 2 2 2
amine oxide**
Octyl alkyl sulphate 4 5 6 7
Coconut fatty acid***
Sodium h ochlorite 1.7 1.7 1.7 1.7
Sodium hydroxide 1 1 1 1
Silicate 0.04 0.09 0.04 0.04
Perfume mixture 0.3 0.3 0.3 0.3
Minors
Viscosity (cps at 15 15 15 15
25C
pH 13 13 13 13
* Hoechst raw material containing the following chain
length distribution . C10 and lower 2$max, C12 62$-75$,
C14 21~-30~, C16 C18 8$ maximum.
** Akzo raw material containing the following chain length
distribution : C12 2~, C14 97$, C16 1$.
*** Unichema raw material containing the following chain
length distribution . C8-C10 1.5~, C12 53$, C14 29~, C16
14~, C18 7.5$.
