Note: Descriptions are shown in the official language in which they were submitted.
CA 02316530 2000-08-15
1
OPTICAL WAVEGUIDE GRATING AND
PRODUCTION METHOD THEREFOR
This application is a division of Canadian Patent
Application Serial No. 2,201,193 filed March 27, 1997, which
is a "New Act" case.
BACKGROUND OF THE INVENTION
Field of the Invention
The present invention relates to optical waveguide
gratings, particularly to radiative mode-coupled optical
waveguide gratings.
Description of the Related Art
optical waveguide gratings are optical fibers or planar
optical waveguides having constant periodic changes in the
longitudinal direction, such as periodic changes in the
refractive index of the core or periodic changes in the core
diameter_
In general, gratings can be divided into radiative mode-
coupled types and reflective mode-coupled types. Radiative
mode-coupled gratings are capable of attenuating light of
specif is wavelengths due to radiation from the optical waveguide
by coupling modes propagating in the core with modes propagating
in the cladding_ Reflective mode-coupled gratings reflect light
of specific wavelengths by coupling modes propagating through
the core in a positive direction and modes propagating through
the core in the opposite direction (negative direction)_
Mode-coupling is made possible by perturbations which occur
in the core. Generally, when gratings are formed in optical
fibers, these perturbations are often achieved by means of
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periodic changes in the core refractive index.
The main structural difference between radiative mode-
coupled gratings and reflective mode-coupled gratings is in the
periods of the periodic changes (hereinafter referred to as the
grating pitch). For example, in the case of optical fiber
gratings formed by making periodic changes in the core
ref ractive index of optical fibers, radiative gratings are
obtained by making the grating pitch approximately several
hundred microns, and reflective gratings are obtained by making
the grating pitch approximately 1 micron.
Radiative mode-coupled gratings have wavelength-
transmission loss properties (transmission spectra) as shown in
Fig. 7, wherein the transmission loss of light in a specif is
wavelength band is selectively increased. The width of the
wavelength band with an increased transmission loss is referred
to as the rejection bandwidth, the central wavelength thereof is
referred to as the central wavelength of the rejection band, and
the magnitude of the change in transmission loss is referred to
as the rejection.
As a conventional method for producing optical waveguide
gratings, there is a method for making periodic ref ractive index
changes in the core by taking advantage of the properties of
silica glass doped with germanium, of which the refractive index
will increase when exposed to strong W radiation, depending on
the amount of exposure.
For example, when producing a radiative mode-coupled
optical fiber grating, either an optical ffiber with a germanium-
doped core and a silica cladding, or an optical fiber with a
germanium-doped core and a fluorine-doped cladding is used.
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This optical fiber is hydrogenated in a hydrogen-pressurized
container (approximately 100 atm), and then either exposed to UV
radiation at constant periods along the longitudinal direction
of the optical fiber using a photomask, or exposed to W
radiation at regularly spaced intervals along the longitudinal
direction of the optical fiber.
However, conventional radiative mode-coupled optical fiber
gratings made from optical fibers with germanium-doped cores and
silica claddings or optical fibers with germanium-doped cores
and fluorine-doped claddings have the undesirable property that
the central wavelength of the rejection band has a high
temperature dependence.
Specifically, this type of optical fiber grating has a
temperature characteristic of approximately 0.05 nm/°C, meaning
that as the temperature rises (or drops) by 10 °C, the central
wavelength of the rejection band will shift to longer
wavelengths (or shorter wavelengths) by approximately 0.5 nm.
Therefore, they are not dependable in terms of their stability
and reliability as optical components.
On the other hand, the grating properties of optical
waveguide gratings are known to change with the parameters of
the gratings, i.e. the amount of change in the core refractive
index, the grating pitch, the grating shape (profile of the core
refractive index), the grating length in the longitudinal
direction of the optical fiber, and the effective refractive
index.
The following Table 1 summarizes the influence that each
parameter of a grating has on the grating properties. In the
table, x indicates no influence, O indicates some influence, and
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D indicates a small influence. Additionally, the arrows T (J,)
indicate whether the value of the grating property will increase
(decrease) in response to an increase in the parameter value.
TABLE 1
Central Rejection Rejection
PARAMETER Wavelength Bandwidth
Change in Refractive Index Ot O?
Grating Pitch OT ~ "
Grating Shape O O "
Grating Length X OT O),
Effective Refractive Index O?
Radiative mode-coupled optical ffiber gratings can be used
in the ffield of optical communications, and are especially
suitable for use in order to reduce the wavelength dependence of
the gain in erbium-doped optical ffiber amplifiers in optical
communication systems which perform wavelength-division-
multiplexed transmissions. In this case, the radiative mode-
coupled optical fiber grating should preferably be designed so
that the rejection band is the same as the wavelength region
used for transmission.
For example, Fig. 8 shows the wavelength dependence of the
gain of a erbium-doped optical fiber amplifier, and this optical
fiber amplifier can be used in an optical communication system
for performing wavelength-division multiplexed transmissions
between wavelength A and wavelength E.
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The optical fiber grating used in this optical
communication system should be designed such as to have a
rejection band which overlaps the wavelength region between
wavelength A and wavelength H, and such that the wavelength-
s transmission loss properties in this wavelength region form a
curve similar to the wavelength dependence of the gain in the
same wavelength region (the curve in the graph). This type of
design efficiently equalizes the gain in this wavelength region.
Conventionally, the only known method for controlling the
rejection band width of a radiative mode-coupled grating is to
adjust the grating length as indicated in Table 1 above.
However, the wavelength region used in wavelength-division
multiplexed transmission is usually determined by the gain band
of the erbium-doped optical fiber amplifier, and this is the
wavelength region between wavelength A and wavelength H in Fig.
8. While the bandwidth is approximately 15-20 nm, if a
radiative mode-coupled grating having a relatively narrow
rejection bandwidth corresponding thereto is to be made, the
grating length becomes extremely long.
For example, optical fibers identical to the optical fibers
used for communications are conventionally used to make optical
fiber gratings, but in order to make the rejection bandwidth
less than 15 nm with this type of optical fiber, the grating
length must be at least 50 mm.
If the grating length of an optical fiber grating is too
long, it becomes insuitable for compact optical components, and
is not capable of being contained in existing repeaters.
Additionally, while optical fiber gratings are normally
used with both sides of the cladding portior. affixed to a
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substrate or the like by means of an adhesive, the resonance
frequency of the grating portion is reduced if the grating
length is increased, so that there is a risk of the grating
portion resonating during vibration testing or during the
installation of repeaters.
Planar optical waveguides can similarly be formed into
radiative mode-coupled gratings or reflective mode-coupled
gratings by means of perturbations in the core.
These perturbations can be achieved relatively easily by
means of periodic changes in the core diameter (core width) of
the waveguide in the case of radiative mode-coupled gratings,
and can be achieved by means of changes in the core refractive
index of the waveguide in the case of ref lective mode-coupled
gratings due to the shortness of the grating pitch.
However, radiative mode-coupled gratings formed in planar
optical waveguides have a problem in that their rejections
cannot be made sufficiently large in comparison to radiative
mode-coupled gratings in optical fibers.
That is, while the rejection changes periodically if the
grating length is increased in a radiative mode-coupled grating,
in the case of an optical fiber grating, the period of the
changes in the rejection is comparatively long and the amount of
change is large, so that the rejection can be monotonically
increased if the grating length is increased within the normally
used range.
In contrast, in radiative mode-coupled planar optical
waveguide gratings, the period for the rejection change is
comparatively short and the amount of change is small, so that
the rejection cannot be made greater than a certain value
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. because the rejection will simply change periodically even if
the grating length is increased.
SUMMARY OF THE INVENTION
The present invention has the object of resolving the
following problems in radiative mode-coupled optical waveguide
gratings.
The first problem is to obtain a radiative mode-coupled
optical waveguide grating with exceptional temperature
characteristics, wherein the central wavelength of the rejection
band has a low temperature dependence.
The second problem is to make the rejection bandwidth
narrower without increasing the grating length in an optical
waveguide grating.
The third problem is to make the rejection sufficiently
large in a radiative mode-coupled optical waveguide grating.
In the present invention, the above-mentioned problems are
solved as follows.
A first aspect of the present invention offers an optical
waveguide grating using an optical waveguide composed of silica
glass material, comprising a core which is doped with germanium
and boron.
A second aspect of the present invention offers an optical
waveguide grating comprising a radiative mode-coupled grating
formed in an optical waveguide having a core with a mean
relative refractive index greater than that of optical
waveguides used for communication purposes.
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The above-mentioned optical waveguide grating according to
the second aspect of the present invention can be obtained by a
method for producing an optical waveguide grating, comprising
steps of determining the relationship between the grating
length, the mean relative refractive index difference of the
core, and the rejection bandwidth of the grating for an optical
waveguide grating; determining, based on this relationship, a
mean relative refractive index difference of the core which
simultaneously satisfies the desired grating length and
rejection bandwidth conditions; and forming a radiative mode-
coupled grating in an optical waveguide having a core with this
mean relative refractive index difference.
A third aspect of the present invention offers a planar
optical waveguide grating having periodic changes in the
waveguide structure along the longitudinal direction of an
optical waveguide, comprising a core; and a cladding surrounding
the core, with a lower refractive index than the core; wherein
the cladding has a thickness which is at least thirteen times
the thickness of the core.
According to the first aspect of the present invention, the
following effects can be obtained.
That is, the radiative mode-coupled optical waveguide
grating according to the first aspect of the present invention
reduces the temperature dependence of the central wavelength of
the rejection band due to the use of silica glass having a core
doped with germanium and boron. Consequently, it is possible to
obtain a radiative mode-coupled optical waveguide grating having
excellent temperature characteristics which is stable and
reliable as an optical component.
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Furthermore, this radiative mode-coupled optical waveguide
grating is capable of improving the temperature characteristics
of optical waveguide gratings simply by doping with boron in
addition to germanium, allowing conventional grating production
methods to be applied without modifications, thereby making
production simple and offering an economic advantage by not
requiring the installation of new equipment.
The germanium and boron should preferably be added in the
forms of Geo2 and B203 respectively, and the concentration of
H203 in the core should preferably be less than or equal to 2.0
times the concentration of Ge02 in the core. As a result, it is
possible to obtain a radiative mode-coupled optical waveguide
grating with excellent temperature characteristics such that the
temperature dependence of the central wavelength of the
rejection band is small, as well as making it possible to
achieve a radiative mode-coupled grating having the inverse
properties as conventional gratings having cores doped only with
germanium.
Additionally, radiative mode-coupled optical fiber gratings
which use optical fibers as the optical waveguides have good
connections to optical components and the like which use other
optical fibers, thus allowing for effective use in the optical
communication ffield using optical fibers, and making it possible
to improve the temperature characteristics, stability and
reliability of optical communication systems.
According to the second aspect of the present invention,
the foiiowing effects can be obtained.
That is, the optical waveguide grating according to the
second aspect of the present invention is an optical waveguide
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grating comprising a radiative mode-coupled grating formed in an
optical waveguide having a core with a mean relative retractive
index greater than that of optical waveguides used for
communication purposes.
5 Consequently, the rejection bandwidth can be narrowed
without increasing the grating length.
Additionally, if an optical waveguide having single-mode
transmission properties in the operative wavelength region of
the grating is used, then the connection loss with single-mode
10 optical waveguides used in existing optical communication
systems can be small and it is not necessary to consider the
existence of transmission loss peaks occurring at higher order
modes.
Additionally, this optical waveguide grating can be
produced by determining the relationship between the grating
length, the mean relative refractive index difference of the
core, and the rejection bandwidth of the grating for an optical
waveguide grating; then determining, based on this relationship,
a mean relative refractive index difference of the core which
simultaneously satisfies the desired grating length and
rejection bandwidth conditions; and forming a radiative mode-
coupled grating in an optical waveguide having a core with this
mean relative refractive index difference.
As a result, an optical waveguide grating having the
desired grating length and rejection bandwidth can be easily and
reliably obtained.
According to a third aspect of the present invention, the
following effects can be obtained.
That is, the optical ~raveguide grating according to the
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third aspect of the present invention is a planar optical
waveguide grating having periodic changes in the waveguide
structure along the longitudinal direction of an optical
waveguide, comprising a core; and a cladding surrounding the
core, with a lower refractive index than the core; wherein the
cladding has a thickness which is at least thirteen times the
thickness of the core.
Consequently, the thickness of the cladding is sufficiently
large with respect to that of the core, so that the recoupling
to core propagation modes which have been coupled from cladding
modes back to the core can be reduced, so as to allow increases
in the rejection:
Additionally, the same effects can be obtained by means of
a planar optical waveguide grating wherein the substrate has a
refractive index equal to that of the cladding layer, since
these allow the cladding layer to be sufficiently thick with
respect to the core. Moreover, since the rejection can be
increased simply by making the substrate out of a material
having a refractive index equal to that of the cladding layer,
it is easily achieved without any large modifications to the
process for producing the planar optical waveguide, and is
advantageous in terms of costs because there is no need for
additional funds to install new production equipment.
Additionally, a planar optical waveguide grating provided
with a cladding mode absorption layer having a higher refractive
index than the cladding on the outside of the cladding in the
thickness direction can make cladding modes couple to the
cladding mode absorption layer so as to efficiently absorb and
attenuate them, thereby reducing their recoupling from the
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cladding mode to the core propagation mode, and increasing
the :rejection.
Furthermore, the wavelengths of the cladding modes
absorbed and attenuated by the cladding mode absorption
layer can be changed by changing the thickness of the
cladding mode absorption layer, so that it is possible to
further increase the wavelength selectivity for the light
attenuated by the planar optical waveguide grating.
These types of effects can also be obtained by means of
an optical fiber grating, by forming an optical .fiber
grating comprising a cladding mode absorption layer with a
higher refractive index: than the cladding around the
circumference of the cladding.
The invention therefore provides in a preferred
embodiment an optical waveguide grating comprising a
radiative mode-coupled grating formed in an optical
waveguide wherein said optical waveguide~ is at least one of:
a 1.3 ~Cm zero-dispersion optical fiber, a core of which has
a mean relative refractive index difference greater than
0.35u; and a cutoff wavelength shifted optical fiber, a core
of which has a mean refractive relative index difference
greater than 0.45°x; and a di:~persi.on shifted optical fiber,
a core of which has a mean relative refractive index
difference greater than 0.40.
BRIEF EXPLANATION OF THE DRAWINGS
Fig. 1 is a partial section view showing an example of
a radiative mode-coupled optical waveguide grating according
to a first embodiment of the present invention.
Fig. 2 is a plan view showing an example of an optical
waveguide grating according to a second embodiment of the
present invention.
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12a
Fig. 3 is a graph showing the relationship between
grating length, mean relative refractive index difference of
the core, and the rejection bandwidth in an example
according to the second embodiment of the present: invention.
Fig. 4 is a graph for explaining the formula for
calculating the rejection bandwidth according to a second
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embodiment of the present invention.
Fig. 5 is a graph showing the relationship between the
optical frequency and the effective refractive index for
explaining the relationship between the mean relative refractive
index difference of the core and the rejection bandwidth in an
optical waveguide grating.
Fig. 6 is a graph showing the relationship between the
length of the optical fiber, tension, and the resonance
frequency in an optical fiber grating according to a second
embodiment of the present invention.
Fig. 7 is a graph showing the properties of a radiative
mode-coupled optical waveguide grating.
Fig. 8 is a graph showing the wavelength characteristics o.f
gain in an optical fiber amplifier.
Fig. 9 is a perspective view showing a first example of an
optical waveguide grating according to the third embodiment of
the present invention.
Fig. 10 is a front view showing a first example of an
optical waveguide grating according to the third embodiment of
the present invention.
Figs. 11A-11D are perspective views showing a first example
of a production method for an optical waveguide grating
according to a third embodiment of the present invention.
Fig. 12A is a front view showing a second example of an
optical waveguide grating according to a third embodiment of the
present invention.
Fig. 12B is a graph showing the refractive index change of
a second example of an optical waveguide grating according to a
third embodiment of the present invention.
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Figs. 13A-13E are front views showing a second example of a
production method for an optical waveguide grating according to
a third embodiment of the present invention.
Fig. 14 is a graph showing the properties of an optical
waveguide grating obtained by an example according to the third
embodiment of the present invention.
Fig. 15 is a graph showing the properties of an optical
waveguide grating obtained by an example according to a third
embodiment of the present invention.
PREFERRED EMBODIMENTS OF THE INVENTION
Hereinbelow, a first embodiment for resolving the first
problem, a second embodiment for resolving the second problem,
and a third embodiment for resolving the third problem of the
present invention will be explained in detail.
<First Embodiment>
Fig. 1 is a partial section view illustrating an example of
a radiative mode-coupled optical fiber grating (hereinafter
sometimes referred to simply as an optical ffiber grating), as an
example of an optical waveguide grating according to the first
embodiment of the present invention. In the drawing, reference
numeral 41 denotes as optical fiber, reference numeral 42
denotes a core, reference numeral 43 denotes a cladding and
reference numeral 44 denotes a jacket layer.
This optical fiber grating has a grating portion 45 wherein
the refractive index of the core 42 periodically changes in the
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longitudinal direction of the optical fiber 41 formed in a
portion of the optical fiber 41.
The core 42 of the optical fiber 41 is composed of silica
glass (Si02) doped with at least germanium (Ge) and boron (H).
5 Aside from these, the core 42 may also be doped with aluminum,
erbium, titanium or the like as suitable. The cladding 43 is
composed of a silica glass having a lower refractive index than
the core, for example pure silica glass or fluorine-doped silica
glass or the like.
10 When the optical fiber 41 is made by means of a gaseous
phase reaction, germanium is actually added to the core 42 in
the form of Ge02 (germanium oxide), and boron is added to the
core 42 in the form of B203 (boron oxide). The concentration of~
Ge02 in the core 42 is determined so as to obtain a preferable
15 core-cladding relative refractive index difference in the
optical ffiber 41 and to allow a desired refractive index change
to be obtained in the core 42 by exposing the optical fiber 41
to W radiation_
As will be explained below, doping the core 42 with B2O3
improves the temperature characteristics of the optical fiber
grating by compensating for the refractive index changes with
respect to temperature changes in Ge02-doped silica glass.
Additionally, doping silica glass with B203 reduces the
refractive index of the silica glass. Therefore, the B203
concentration in the core 42 is set so as to improve the
temperature characteristics of the optical fiber grating
depending on the Ge02 concentration in the core 42, and to
obtain a desirable core-cladding relative refractive index
difference for the optical fiber 41.
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However, if the H203 concentration in the core 42 is too
high, the temperature characteristics of the optical fiber
grating will be degraded so as to exhibit the inverse
characteristics, so that the Hz03 concentration in the core 42
should preferably be set to less than or equal to 2.0 times the
Ge02 concentration in the core 42.
Additionally, doping with even a small amount of Bzo3 will,
however slight, improve the temperature characteristics of
optical fiber gratings. Therefore, the lower bound for the B203
concentration in the core 42 needs only to be larger than 0, and
the concentration should preferably be at least 0.5 times the
concentration of Ge02 in the core 42.
The properties of the optical fiber grating such as the
central wavelength of the rejection band, the rejection
bandwidth, and the rejection change depending on parameters such
as the amount of change in the core refractive index of the
cladding portion 45, the grating pitch, the grating shape
(profile of the core refractive index change), and length of the
grating portion 45 in the longitudinal direction of the optical
fiber 41, and these can be set as needed according to the
optical fiber grating characteristics which are desired.
Additionally, the grating pitch is set to within a range of tens
to hundreds of microns in order to obtain radiative mode-
coupling properties.
In order to produce an optical fiber grating of this type,
an optical fiber is first made using a commonly known process
such as a VAD process or an MCVD process. The core is doped
with Ge02 and B203 at this time. Next, the jacket layer 44 of
the optical fiber 41 is partially removed, and a grating portion
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45 is formed at the portion with the jacket layer removed by
periodically exposing with W radiation along the longitudinal
direction of the optical fiber 41.
The wavelength of the W radiation for irradiating the
optical fiber 41 should preferably be about 240-250 nm.
As the method for forming the grating portion 45, a
commonly known method may be used, such as a method wherein a W
beam having a comparatively large spot width is irradiated on
the optical fiber 41 through a photomask having slits spaced by
regular intervals of tens to hundreds of microns, or a method
wherein W beams are irradiated on the optical fiber 41 at
regular intervals by repeating the procedure of irradiating a W
beam with a small spot width onto the optical fiber 41 for a
constant period of time, cutting off the beam, shifting the
position of the beam along the longitudinal direction of the
optical fiber 41, and reirradiating the beam.
Below, the functions of an optical fiber grating according
to the first embodiment will be explained.
Although radiative mode-coupled optical fiber gratings have
a plurality of rejection bands, the condition expressed by the
following equation (1) applies to the central wavelength ~.~ in a
single rejection band.
~~o-~~r= A . . . (1)
Here, ~3~o represents the propagation constant for the
waveguide mode (of the core), /3~1 represents the propagation
constant for the cladding mode, and A represents the grating
pitch.
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The above equation (1) can be rewritten as the following
equation (2).
7~.~ = A' ~n«o - n«r ~ . . . ( 2 )
Here, ne~o and ne~l represent respectively the effective
refractive indices of the waveguide mode and the cladding mode
(2n/A~effective refractive index = propagation constant).
Differentiating equation (2) by temperature results in the
following equation (3).
~~=~n«o-Wd~' °-1 A+A~ a ~n«o-nm~ . . . (3)
aT aT aT
Then, the central wavelength 7~.~ can be made constant with
respect to temperature changes by making both sides of the above
equation (3) equal to zero. Since the coefficient of thermal
expansion of silica glass in which the main component is silica
is extremely small, the derivative aA laT (equal to the
coefficient of thermal expansion of glass) can be approximated
as zero. Therefore, it is sufficient to make (a/aT) (Ileco-necl)
equal to zero.
Silica glass such as used in the claddings of conventional
radiative mode-coupled optical fiber gratings and the germanium-
doped silica glass used in their cores both have the property
that their refractive indices increase with increases in
temperature. Additionally, in optical fibers in general, the
effective refractive index for the waveguide mode increases if
the refractive index of the material increases.
Since the temperature dependence of the refractive index
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change in germanium-doped silica glass is greater than the
temperature dependence of the refractive index change in silica
glass, the condition dneco~dT > ane~i~aT applies in conventional
radiative mode-coupled optical fiber gratings, so that the right
side of the above equation (3) cannot be made equal to zero.
In contrast, boron-doped silica glass has the property that
the refractive index decreases with increases in temperature.
Therefore, the temperature dependence of the refractive index of
the core 42 can be made approximately equal to the temperature
dependence of the refractive index of the cladding 43 by doping
the core 42 not only with germanium, but also with an
appropriate amount of boron. As a result, it is possible to
make dne~o~aT - ane~l~aT = 0, thereby allowing a radiative mode-
coupled optical ffiber grating wherein the central wavelength of
the rejection band has a low temperature dependence to be
obtained.
On the other hand, if the concentration of boron in the
core is too high, then the temperature characteristics of the
radiative mode-coupled optical fiber grating shift to
characteristics which are the inverse of the conventional
characteristics, such that the central wavelength of the
rejection band will shift to shorter wavelengths (longer
wavelengths) if the temperature drops (rises). If the
concentration of boron in the core 42 exceeds twice the
concentration of germanium, the temperature characteristics
shift too far toward the inverse characteristics, and therefor
this situation should be avoided.
The methods for improving the temperature characteristics
of optical fiber gratings by doping the core 42 with boron are
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not restricted to use with the optical fiber grating of the
present example. This method is effective for any optical fiber
grating having radiative mode-coupled properties, wherein the
core and cladding are composed of silica glass materials, the
5 core is doped with germanium, and the temperature dependence of
the refractive index change of the cladding material is lower
than the temperature dependence of the refractive index change
in the core material. Hence the method can be applied to
optical fibers with arbitrary structures.
<Second Embodiment>
Fig. 2 is a plan view showing an example of an optical
waveguide grating according to a second embodiment of the
present invention. Here, a radiative mode-coupled optical fiber
grating (hereinafter referred to simply as an optical fiber
grating) will be given as an example of an optical waveguide.
In the drawing, reference numeral 51 denotes an optical
fiber, reference numeral 51a denotes a core, reference numeral
51b denotes a cladding, reference numeral 52 denotes a grating
portion, reference numeral 53 denotes a substrate, reference
numeral 54 denotes an adhesive and reference numeral 55 denotes
a jacket layer_
The optical fiber 51 is composed of a core 51a and a
cladding 51b with a lower refractive index than the core, and a
grating portion 52 having a refractive index which periodically
changes along the longitudinal direction of the optical fiber 51
is formed at a portion of the core 51a.
In this example, the optical fiber 51 should preferably be
such that a portion of the jacket layer 55 of the resin-coated
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optical fiber is removed.
Additionally, the grating pitch in the grating portion 52
should preferably be set to within a range of about tens to
hundreds of microns in order to obtain radiative mode-coupled
properties.
The core 51a of the optical fiber 51 is composed of a
material wherein the refractive index changes when exposed to W
radiation, depending on the W light intensity and the exposure
time. The material should preferably be Ge02-doped silica
glass. In addition to Ge02, the core 51a may be doped with
aluminum, erbium, titanium or the like. The cladding 51b of the
optical fiber 51 should preferably be composed of silica glass
or fluorine-doped silica glass.
The optical fiber 51 used to make this optical fiber
grating may be a single-mode fiber or a multi-mode fiber, but
should preferably have single-mode transmission properties in
the operative wavelength region of the grating. This is because
the existing optical transmission systems mostly use single-mode
fibers, so that the use of single-mode fibers allows the
connection loss with existing systems to be held low, and
because the transmission loss peaks which occur at higher-order
modes can be ignored.
The optical fiber 51 is formed so that the mean relative
refractive index difference of the core 51a is larger than that
of optical communication fibers. Here, the mean relative
refractive index difference of the core according to the second
embodiment of the present invention refers to the core-cladding
relative refractive index difference averaged in the cross-
sectional direction, and is defined by the following formula
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(I).
bdS
(I)
core
Here, Sore represents the cross-sectional area of the core
and b is a function which describes the distribution of the
relative refractive index. The numerator of the above formula
(I) is the integral of this function b by dS (area fragments of
core cross-section) over only the interior of the core. Taking
the distance of an arbitrary point inside the optical fiber from
the center of the optical fiber to be r, b is a function of r,
so that b = b(r) gives the relative refractive index difference
between the center of the core and a point at radius r. If b is
cylindrically symmetric and the core radius is taken to be R,
then the mean relative refractive index difference of the core
can be expressed by the following formula (II).
R
2 brdr - .
(II)
Specifically, as an optical ffiber 51 for the present
invention, it is possible to use a 1.3 ~.rm zero-dispersion
optical ffiber, a cutoff wavelength shifted optical fiber or a
dispersion shifted fiber. If a 1.3 pm zero-dispersion optical
ffiber is used, while the mean relative refractive index
difference of the cores of 1.3 um zero-dispersion optical fibers
used for communication purposes is usually about 0.35 0, the 1.3
um zero-dispersion optical fiber used in the second embodiment
of the present invention should preferably have a larger mean
CA 02316530 2000-08-15
23
relative refractive index difference.
When using a cutoff wavelength shifted optical fiber, the
mean relative ref ractive index difference of the core for cutoff
wavelength shifted optical fibers for communication purposes is
normally 0.4-0.45 %, whereas the cutoff wavelwngth shifted
optical fiber used in the second embodiment of the present
invention is formed so as to have a larger mean relative
refractive index difference of the core.
If a dispersion shifted optical fiber is used, while the
mean relative refractive index difference of the cores of
dispersion shifted fibers used for communication purposes is
usually about 0.4 %, the dispersion shifted optical fiber used
in the second embodiment of the present invention should
preferably have a larger mean relative refractive index
difference.
The difference in the mean relative refractive index
differences between the optical fiber 51 used in the second
embodiment of the present invention and communication ffibers
should be set according to the length of the grating portion 52
(grating length) and the rejection bandwidth of the desired
optical ffiber grating, because this difference causes the
rejection bandwidth of the optical fiber grating to change as
will be explained below.
When the grating length is made constant, the rejection
bandwidth will decrease as the mean relative refractive index
difference of the core of the optical fiber 51 increases as is
desirable, but in a single-mode fiber, the mode field diameter
of the optical fiber 51 will become small if the mean relative
refractive index difference of the core is made too large, so as
CA 02316530 2000-08-15
24
to result in a problem in that the connection loss for
connection to existing systems will be large.
Therefore, the mean relative refractive index difference of
the core of the optical fiber 51 used in the second embodiment
should be made as large as possible to an extent such as not to
result in any such connection loss problems in connected optical
waveguides used for communication purposes. Hence, the upper
limit is determined by the range of allowable connection losses.
For example, when the allowable range of connection losses is
less than or equal to approximately 0.2 dB, then the mean
relative refractive index difference of the core 51a of the
optical fiber 51 should preferably be set to 1.5 % or less.
In this example, a 1.3 pm zero-dispersion optical fiber
having a core 51a with a mean relative refractive index
difference of 0.7 % is used, and the radiative mode-coupled
optical fiber grating is constructed such that the grating
length is 20 mm and the rejection bandwidth is 20 nm.
The optical fiber 51 in which the grating portion 52 is
formed is afffixed to a substrate 53.
The material of the substrate 53 should be such that the
difference in the coefficient of thermal expansion with the
optical ffiber 51 is small, and a silica substrate is preferable.
The shape of the substrate 53 can be arbitrary. The optical
fiber 51 should preferably be afffixed to the substrate 53 by
using an adhesive 54, for example an epoxy adhesive, a W-
hardening adhesive or the like.
Since the grating properties of the radiative mode-coupled
grating will change if the adhesive 54 contacts the grating
portion 52, the adhesive should be applied at portions other
CA 02316530 2000-08-15
than the grating portion 52, preferably on both sides of the
grating portion 52 separated by at least 5 mm from the ends
thereof .
In this example, the length of the grating portion 52 is 20
5 mm, the distance a between the grating portion 52 and the
adhesive 54 on both sides is 5 mm, the length b required to
affix the optical fiber 51 by applying adhesive 54 is 5 mm on
both sides, and a silica tube 40 mm long is used as the
substrate 53.
10 Hereinbelow, an example of a method for producing the
optical fiber grating according to the second embodiment will be
explained.
First, as shown in Fig. 3, the relationships between the
grating length, the mean relative refractive index difference of
15 the core and the rejection bandwidth are pre-determined by a
calculation method to be explained below, and a mean relative
refractive index difference of the core which allows the desired
grating length and rejection bandwidth to be achieved
simultaneously is determined therefrom.
20 Fig. 3 is a graph showing the relationship between the mean
relative refractive index difference and the rejection bandwidth
for the cases wherein the grating length is 15, 20, 25, 30, 35
and 40 mm. In the graph, the horizontal axis represents the
mean relative refractive index of the core and the vertical axis
25 represents the results of calculations (theoretical limit
values) of the rejection bandwidth.
Below, the method for calculating the rejection bandwidths
of radiative mode-coupled optical fibers (theoretical limit
values) will be explained.
CA 02316530 2000-08-15
26
As mentioned above, radiative mode-coupled gratings are
constructed such as to be capable of attenuating the light of
the waveguide mode by coupling the waveguide mode (of the core)
with the mode propagating through the cladding. The optical
power attenuation rate 2a of the waveguide mode of such a
grating can be expressed by the following equation (4).
2a = ~ Cm~~ ~f3m~ . . . ( 4 )
m
Here, m represents a cladding mode number to be coupled, Cm
represents the coupling constant when coupling the mth mode of
the cladding. Additionally, ~(df3m) is the square root of the
Fourier transform of the grating pattern. When the pattern of
the grating portion is regularly spaced, ~(d/3~,) corresponds to
the period of the grating (the basic period when the changes in
the grating are not sinusoidal) and can be expressed by the
following equation (5).
Z~2sin~ a vn~ ~2
( l Z ~.~ n ~ ~ 2 l ~
~~~~m~ ~ n~ JL/ '~~m~~ ' ONm ZJLlA I . . . ( 5 )
Here, ~lf3m represents the difference in the propagation
constant between the mth mode of the cladding and the mode
guided through the core. Additionally, A represents the grating
pitch and v represents the number of cycles in the grating. The
relationship between ~ and 4~i in the vicinity of d/3 = 2.~/A is
shown in Fig. 4.
As shown in the drawing, if the wavelengths when 4(3 is
CA 02316530 2000-08-15
27
equal to 2 (v - 1 )n/vA and when d/3 is equal to 2 (v + 1 )n/v~1
are taken to be respectively Jll and ~,5, then when the wavelength
at the destination of propagation is between 7l1 and 7~5 (i.e.
when e(3 is between 2 (v - 1 )n/vA and 2 (v + 1 )n/vA ), the value of
~(d/3n,) in the above equation (5) becomes bound, and the
attenuation rate 2a becomes large in accordance with the above
equation ( 4 ) . When outside the range of ~.1 to ~.5, ~(e/.~")
approaches zero and the attenuation rate 2a can be ignored.
That is, between ~.1 and ~.s, the loss due to the grating is large
so as to form a rejection band, and the interval between ~1 and
~.S is defined to be the rejection bandwidth 471.
Furthermore, the relation expressed by the following
equation (6) arises.
°~U~-A~~~s~' vA . . . (6)
Equation (6) can then be rewritten as the following
equation ( 7 ) by using the relation ~.~ _ (~,I + ~,S) /2.
~~~~'+~~~W~~~'-°7~/2~= vn . . . (7)
By approximating with a first-order expansion, the above
equation (7) can be rewritten as the following equation (8).
~~a~. °~t'~'~}. ~ - ~aa. °~~~''~~~ l e~.~~=
. . . (8)
aa. °~~~'~I~ °~ _ ~
Further modifying this equation results in the following
CA 02316530 2000-08-15
28
equation (9).
~~ = vA. . . . (9)
a~. ~~~~'')I
Taking the grating length to be L, then I, = vA, so as to
give the following equation (10) which is a formula for
calculating the rejection bandwidth.
0~,= ~ ~ . . . (10)
a~ ~~~~al
In the above equation (10), A~(7~.~) is the difference
between the propagation constant of the waveguide mode of the
core and the propagation constant of the cladding mode at the
central wavelength 7l~ of the rejection band. As the mean
relative refractive index difference of the core increases, the
wavelength derivative of ~/3(~.~), i.e. the denominator in the
above equation (10), increases so that the righthand side of the
above equation (10) decreases, consequently decreasing the
rejection bandwidth (47i.).
Fig. 5 has the optical frequency (cu) on the horizontal
axis, the effective refractive index (neff) for the mode on the
vertical axis, and shows the relationship therebetween
(dispersion curve). In the graph, (i) represents a dispersion
curve for a waveguide mode in an optical ffiber with a large mean
relative refractive index difference of the core, (ii)
represents a dispersion curve for a waveguide mode in an optical
fiber with a small mean relative refractive index difference of
the core, and (iii) represents a dispersion curve for the
CA 02316530 2000-08-15
29
. cladding mode.
As shown in the drawing, when using light of the same
frequency (m), the value (corresponding to the slope of the
dispersion curve) of the effective refractive index (neff) of the
waveguide mode of the core differentiated by the frequency (w),
i.e. the frequency dependence of the effective refractive indes,
is larger in optical fibers having large mean relative
refractive index differences of the core than in optical fibers
having small mean relative refractive index differences of the
core. However, the effective refractive index for the cladding
mode is almost unaffected by changes in the mean relative
refractive index of the core. This means that the frequency
dependence of the difference in effective refractive index for
the cladding mode and the waveguide mode of the core is higher
for optical fibers with higher mean relative refractive index
differences of the core.
The absolute value of the wavelength dependence of the
difference in effective refractive index for the cladding mode
and the waveguide mode of the core is higher for optical fibers
with higher mean relative refractive index differences of the
core, because the frequency is proportional to the inverse of
the wavelength (w = 2nv = 2nCl~). Additionally, since the
propagation constant is equal to the effective refractive index
times the frequency of light in a vacuum, the absolute value of
the wavelength derivative of the difference (d~) in the
propagation constant between the cladding mode and the waveguide
mode of the core is greater for optical fibers with larger mean
relative refractive index differences_
The conditions of the grating length of the optical fiber
CA 02316530 2000-08-15
grating to be obtained are primarily determined by considering
the housability and vibration resistance of the optical fiber
grat ing .
In this example, the grating length is set to 20 mm in
5 order to obtain an optical fiber grating which can be installed
and contained in an undersea repeaters.
That is, in order to make an optical fiber grating such as
shown in Fig. 2 capable of being contained in an undersea
repeaters, the length of the substrate 53 must be 40 mm or less.
10 In the case of a radiative mode-coupled optical fiber grating,
an anchoring base of at least 10 mm must be provided on both
sides of the grating portion 52 in order to affix it to the
substrate 53 by means of an adhesive 54.
Therefore, for fixation to a substrate 53 which is less
15 than 40 mm, the grating length must be held to 20 mm or less.
Additionally, while the diameter of an optical fiber 51 is
usually about 125 pm, the tension and resonance frequency of a
silica glass chord having a diameter of 125 um have the
relationship shown in Fig. 6. Fig. 6 shows the relationship
20 between the tension and resonance frequency of silica glass
chords which are respectively 10, 15, 20, 25, 30, 35 and 40 mm
long.
Generally, when conducting vibration tests of optical
components, the upper limit of the vibrations is made 2000 Hz
25 because the frequencies of the vibrations occurring when
installing cables or repeaters are less than 2000 Hz. With
regard to the vibration resistance of optical fiber gratings, it
is possible to prevent the occurrence of breakage due to
resonance of the optical fiber during the vibration tests or
CA 02316530 2000-08-15
31
during installation if the design is such that the resonance
frequency is at least 2000 Hz.
As mentioned above, the length of the substrate 53 must be
restricted to 40 mm or less in order to allow the optical fiber
grating to be contained in an undersea repeaters. The length b
of the portion coated with adhesive 54 in order to affix the
optical fiber grating must be at least 5 mm long at both ends,
so that the length of the optical fiber between adhesive
fixation points cannot be made longer than approximately 30 mm.
On the other hand, the reliability of the optical fiber 51
becomes a problem when the tension on the optical fiber grating
is too large, so that it should preferably be used in an
environment wherein the tension is less than 1/4-1/5 of 200 gf
which is the proof strength. Therefore, the tension on the
optical fiber grating must be 40-50 gf or less.
Hence, in order to make the resonance frequency greater
than 2000 Hz under the conditions that the upper limit of the
tension on the optical fiber grating is 40-50 gf and the length
of the optical fiber between adhesive ffixation points cannot be
larger than 30 mm, the length of the optical fiber grating
between adhesive fixation points must be less than or equal to
approximately 30 mm as shown in Fig. 6. Additionally, the
grating length should preferably be 20 mm or less because the
distance a between the grating portion 52 and the adhesive 54
should be at least 5 mm.
The conditions of the rejection bandwidth of the optical
fiber grating to be obtained are determined by the method of use
of the optical .fiber grating.
For example, in an optical communication system performing
CA 02316530 2000-08-15
32
- wavelength-multiplexed transmissions, the design should be such
as to make the rejection bandwidth equivalent to the bandwidth
of the wavelength band used for transmissions in the case of a
radiative mode-coupled optical fiber grating used to reduce the
wavelength dependence of the gain of an erbium-doped optical
fiber amplifier. In this example, the rejection bandwidth
should preferably be set to 20 nm.
The most suitable mean relative refractive index difference
of the core 51a of the optical fiber 51 used to make the grating
is determined with respect to grating length and rejection
bandwidth conditions decided in this way..
In this example, as can be seen from the graph in Fig. 3,
the mean relative refractive index difference of the core 51a
should be at least 0.7 $ in order to obtain a radiative mode-
coupled optical fiber grating with a grating length of 20 mm or
less and a rejection bandwidth of 20 nm.
After a suitable mean relative refractive index difference
of the core 51a of the optical fiber 51 has been determined, an
optical fiber 51 satisfying these conditions is prepared and a
grating portion 52 is formed in a portion thereof by
periodically changing the core refractive index. .
When making the grating portion 52, the parameters of the
optical fiber grating to be obtained other than the grating
length are set as appropriate depending on the grating
properties to be obtained, since these parameters change the
central wavelength and the rejection.
Although the method for forming the grating portion 52 is
not restricted, the core 51a of the optical fiber 51 is composed
of a material with a refractive index which can be changed by
CA 02316530 2000-08-15
33
exposure to UV radiation in the present example, so that the
grating portion 52 can be formed as desired by periodically
exposing the optical fiber 5I to W radiation along the
longitudinal direction.
The wavelengths of the W beams irradiated on the optical
fiber 51 should preferably be about 200-300 nm, and as an
optical source, a KrF laser (wavelength 248 nm) can be used.
Additionally, the grating portion 52 can be foztned by
suitably using conventional methods, such as by irradiating the
optical fiber 51 with a W beam having a comparatively large
spot width through a photomask having slits spaced at uniform
intervals of tens to hundreds of microns, or by irradiating UV
beams onto the optical fiber 51 at regular intervals by
repeating the procedure of irradiating a W beam with a small
spot width onto the optical fiber 51 for a constant period of
time, cutting off the beam, shifting the position of the beam
along the longitudinal direction of the optical fiber 51, and
reirradiating the beam.
The optical fiber 51 can also be treated by hydrogenation
before irradiation with w light. In an optical fiber with a
core 51a having a germanium concentration of less than a few
percent, a pre-hydrogenation treatment should be performed in
order to obtain a sufficient core refractive index change by
means of exposure to w light. This hydrogenation treatment can
be performed by holding the optical fiber 51 inside a hydrogen-
pressurized container adjusted to approximately 100 atm and 50
°C.
However, this hydrogenation treatment is not essential, and
if the germanium concentration in the core 51a is on the order
CA 02316530 2000-08-15
34
of 30 ~ and the rejection of the optical fiber grating may be
relatively low, then it is possible~to omit the treatment.
When a hydrogenation treatment of this type has been
performed prior to exposure to w radiation, the hydrogen in the
optical fiber 51 should preferably be removed after the grating
portion 52 has been formed. This dehydrogenation process can be
performed by leaving the optical fiber 51 in a temperature of
between room temperature and 100 °C for a few days. This
dehydrogenation process is effective in preventing changes in
the grating properties which can occur over time after the
grating portion 52 has been made, due to the occurrence of
refractive index changes in the hydrogen added to the optical
fiber 51 prior to exposure to W radiation.
An optical fiber grating is completed by adhesively fixing
the optical fiber 51 onto a substrate 53 after the grating
portion 52 has been formed.
With the optical fiber grating of this example, it is
possible to make the rejection bandwidth narrower without
increasing the grating length by means of increasing the mean
relative refractive index difference of the core of the optical
fiber 51.
Additionally, when producing the optical fiber grating, the
relationship between the grating length, the mean relative
refractive index difference of the core, and the rejection
bandwidth can be determined by means of the above-mentioned
calculations, based on which suitable values of the mean
relative refractive index difference can be selected, thereby
allowing an optical fiber grating having a desired grating
length and rejection bandwidth to be easily and reliably
CA 02316530 2000-08-15
obtained.
<Third Embodiment>
In the third embodiment, the term optical waveguide refers
5 to those having a core surrounded by a cladding having a lower
refractive index than the core, including embedded planar
optical waveguides having a cladding layer formed on a substrate
and a core with a higher refractive index than the cladding
layer formed inside the cladding layer, as well as optical
10 f fibers .
The optical waveguide gratings according to the third
embodiment have periodic changes in the waveguide structure
along the direction of propagation of these optical waveguides,
and exhibit radiative mode-coupling properties.
15 As specific features for forming the waveguide structure of
the optical waveguide, there are the core diameter (core width),
core refractive index and refractive index difference, of which
it is most preferable to use the core width (hereinafter defined
as the size of the core in a direction normal to the direction
20 of propagation and parallel to the substrate), with which
periodic changes can be easily formed.
In this third embodiment, when a planar optical waveguide
is used as the optical waveguide, the core thickness refers to
the size of the core in a direction normal to the direction of
25 propagation and normal to the substrate, and the cladding
thickness refers to the distance from the core surface to the
cladding surface measured in the same direction as the core
thickness. When an optical fiber is used, the core thickness
refers to the core diameter, and the cladding thickness refers
CA 02316530 2000-08-15
36
to the distance from the circumferential surface of the core to
the circumferential surface of the cladding.
Below, a radiative mode-coupled optical waveguide grating
(hereinafter sometimes referred to simply as a palnar optical
waveguide grating) will be explained as an example of the third
embodiment.
Figs. 9 and 10 show a planar optical waveguide grating in
accordance with the present example; Fig. 9 is a perspective
view and Fig. 10 is a front view. Reference numeral 1 denotes a
substrate.
A cladding layer 2 is formed on the substrate 1, and a core
4 is formed inside the cladding layer 2. That is, the structure
comprises a core 3 surrounded by a cladding layer 2.
The substrate 1 is a flat plate composed of a material
having the same refractive index as the cladding layer 2, for
which a silica glass substrate is preferable.
The core 3 has a grating structure wherein the width
periodically changes along the direction of light propagation
(indicated by an X in Fig. 9). That is, the core 3 comprises a
strip-shaped trunk portion 3a extending along the direction of
light propagation on top of the substrate 1, and rectangular
branch portions 3b extending from the trunk portion 3a in the
width direction of the core 3 (indicated by a Z in Fig. 9)
spaced by predetermined uniform intervals along the direction of
light propagation.
The cladding layer 2 comprises a lower cladding layer 2a
formed beneath the core 3 on top of the substrate 1, and an
upper cladding layer 2b formed above this lower cladding layer
2a, i.e. on top and to the sides of the core 3.
CA 02316530 2000-08-15
37
The material of the core 3 is composed of Si02 (silica
glass) doped with germanium (Ge), boron (B), phosphorus (P) or
the like, while the material of the cladding layer 2 is composed
of Sio2 doped with B, P or the like, such that the lower
cladding layer 2a and the upper cladding layer 2b are composed
of the same material. The refractive index of the core 3 is
higher than the refractive index of the cladding layer 2. The
relative refractive index difference between the core 3 and the
cladding layer 2 can be set as appropriate, e.g. preferably, it
should be set such that d = 0.3 %.
In this example, the thicknesses of the substrate 1, the
lower cladding layer 2a and the core 3 in a direction normal to
the substrate 1 and a direction normal to the direction of light
propagation (indicated by Y in the drawing) should preferably be
such that the thickness T1 of the substrate 1 is 1 mm, the
thickness ( T2) of the core 3 x the width ( W1 ) of the trunk
portion 3a is 8 um x 8 arm, the width (Wz) of the branch portions
3b of the core 3 are 5 um, the thickness T3 of the lower
cladding layer 2a is 10 arm, and the thickness T4 of the upper
cladding layer 2b is 110 um. These dimensions can be changed as
suited to the required properties and functions.
A planar optical waveguide grating of this type of
structure can be produced in the following manner.
Figs. 11A-11D show the steps in a method for producing a
planar optical waveguide grating according to this example.
First, as shown in Fig. 11A, a substrate 1 is prepared and
the surface is cleansed.
Next, as shown in Fig. 11B, a first cladding glass layer 12
to become the lower cladding layer 2a is formed on top of the
CA 02316530 2000-08-15
38
substrate 1, then a core glass layer 13 to become the core 3 is
formed thereon. Each of these glass layers can be formed by
depositing glass soot on top of the substrate 1 by means of an
FHD process (flame hydrolysis deposition), then making the glass
soot transparent by sintering the substrate 1 with the glass
soot at 1290 °C in a helium (He) and oxygen (02) atmosphere.
Then, an Si resist film 14 is formed on top of this core
glass layer 13. This Si resist film can be formed by means of
Ar sputtering accumulation process.
Thereafter, the core glass layer 13 is etched by means of a
conventional photolithography process to shape the core 3 into
the pattern shown in Fig. 11C. This pattern can be formed by,
for example, first forming a photoresist layer on top of the Si
resist film 14, exposing to light through a mask pattern
corresponding to the shape of the core 3, then forming the
pattern of the core 3 on the Si resist film 14 by means of
etching. Subsequently, reactive ion etching (RIE) is performed
with the Si resist film 14 as a mask to form the core glass
layer 13 into the shape of the core 3.
Next, as shown in Fig. 11D, a second cladding glass layer
15 to become the upper cladding layer 2b is formed on top of the
first cladding glass layer 12 and the patterned core 3. The
second cladding glass layer 15 is formed by the same method as
the ffirst cladding glass layer 12. The second c7_adding glass
layer 15 is formed so as to have a predetermined thickness
thicker than that of the core 3, so that the core 3 is embedded
inside the first cladding glass layer 12 and the second cladding
glass layer 15. Additionally, both the first cladding glass
layer 12 and the second cladding glass layer 15 are composed of
CA 02316530 2000-08-15
39
a material having a lower refractive index than the core 3, and
the core 3 embedded in this way forms an optical waveguide with
a grating structure.
The substrate 1 having an optical waveguide formed by the
core 3 in this way has the area around the core 3 cut into a
desired shape depending on need, so as to form an optical
component such as an optical filter.
Below, the functions of the planar optical waveguide
grating of this example will be explained.
In a conventional radiative mode-coupled planar optical
waveguide grating, the rejection simply changes periodically and
cannot be made higher than a certain value even if the grating
length is increased. This is believed to be because of the
occurrence of recoupling from the cladding mode due to the
thinness of the cladding layer. That is, with a planar optical
waveguide structure, the width of the cladding layer on both
sides of the core is usually made sufficiently large, but the
thickness of the cladding layer on both sides of the core is
only about 3-4 times the thickness of the core, which is
relatively small.
In contrast, with the planar optical waveguide grating of
the present example, the refractive index of the substrate 1 is
equal to that of the cladding layer 2, so that the substrate 1
acts as a cladding for the optical waveguide structure.
Consequently, the effective thickness of the cladding underneath
the core 3 is equal to the sum of the thickness T3 of the lower
cladding layer 2a and the thickness T1 of the substrate 1.
Therefore, in this example, the thickness of the cladding
underneath the core 3 can be made approximately 125 times as
CA 02316530 2000-08-15
thick as the thickness of the core 3 simply by using a silica
glass substrate for the substrate 1. As a result, the
recoupling from cladding modes to core propagation modes due to
the thinness of the lower cladding layer 2a can be reduced, and
5 the rejection of the radiative mode-coupled optical waveguide
grating can be increased.
Additionally, since the planar optical waveguide grating of
this example allows the rejection to be increased simply by
using silica glass for the substrate 1, it can be easily
10 achieved without any large changes to the process for producing
the planar dptical waveguide. Therefore, it offers an advantage
in terms of cost because there is no need for extra funds to
install new production equipment.
Additionally, it is possible to effectively increase the
15 rejection by increasing the thickness T4 of the upper cladding
layer 2b in addition to essentially increasing the thickness of
the lower cladding layer 2a by making the refractive index of
the substrate 1 equal to that of the cladding layer 2. As such
a method for making the upper cladding layer 2b thicker, the
20 glass soot can be deposited more thickly if this layer is formed
by means of a FHD process.
In this case, the thickness (Tø - T2) of the cladding layer
2 above the core 3 should preferably be set so as to be at least
13 times the thickness T2 of the core 3. The thicker the
25 cladding layer 2, the higher the rejection.
However, if the upper cladding layer 2b is made too thick,
the production efficiency will drop and the production costs
will increase. Therefore, it is possible to obtain a desirable
rejection and to offer an advantage ir~ terms of cost by simply
CA 02316530 2000-08-15
41
. increasing the thickness of the lower cladding layer 2a and
setting the thickness T4 of the upper cladding layer 2b within a
range such as to allow the properties of a radiative mode-
coupled gratings to be obtained, depending on the method of use
of the planar optical waveguide grating.
Furthermore, while a planar optical waveguide was used as
an optical waveguide for the above-given first example, the
effect of increasing the rejection can also be obtained in a
radiative mode-coupled optical fiber grating by similarly
increasing the thickness of the cladding with respect to the
core. Normally, the thickness of the cladding in an optical
fiber used in an optical fiber grating is about 15 times the
core diameter, but the rejection can b~e effectively increased as
long as the thickness of the cladding is at least 13 times the
core diameter.
Hereinbelow, a second example of the third embodiment will
be explained by using the example of a radiative mode-coupled
planar optical waveguide grating.
Fig. 12A shows a front view of a planar optical waveguide
grating according to this example, and Fig. 12B is a graph of
the refractive index change in the thickness direction across
the core. Reference numeral 21 denotes a substrate.
A cladding mode absorption layer 24, a cladding layer 22
and a cladding mode absorption layer 25 are sequentially
deposited onto a substrate 21, and a core 23 is formed inside
the cladding layer 22. That is, the core 23 is surrounded by
the cladding layer 22.
The substrate 21 is a flat plate, for which various
materials can be used such as silica glass substrates and
CA 02316530 2000-08-15
42
silicon substrates (Si).
As with the above-given first example, the core 23 has a
width that periodically changes along the direction of
propagation so as to form a grating structure. That is, the
core 23 comprises a strip-shaped trunk portion 23a which extends
along the direction of propagation on top of the substrate 21,
and rectangular branch portions 23b which extend from the trunk
portion 23 in the width direction (indicated by a Z in the
drawing) spaced by uniform intervals along the direction of
light propagation.
The cladding layer 22 comprises a lower cladding layer 22a
formed underneath the core 23 and an upper cladding layer 22b
formed on top of the lower cladding layer 22a, i.e. above and to
the sides of the core 23.
The material of the core 23 is composed of SiOz (silica
glass) doped with germanium (Ge), boron (B), phosphorus (P) or
the like, while the material of the cladding layer 22 is
composed of Si02 doped with B, P or the like, such that the
lower cladding layer 22a and the upper cladding layer 22b are
composed of the same material. The refractive index of the core
23 is higher than the refractive index of the cladding layer 22.
The relative refractive index difference between the core 23 and
the cladding layer 22 can be set as appropriate, e.g. it should
preferably be set such that d = 0.3 %.
Cladding mode absorption layers 24 and 25 are formed on
both outer sides in the thickness direction of the cladding
layer 22 (indicated by a Y in the drawing), i.e. between the
cladding layer 22 and the substrate 21, and on the upper surface
of the cladding layer 22. As shown in Fig. 12B, these cladding
CA 02316530 2000-08-15
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. mode absorption layers 24 and 25 are formed so as to have a
higher refractive index than the cladding layer 22, and may be
composed of Si02 doped with germanium (Ge), boron (B),
phosphorus (P) or the like. The relative refractive index
difference between the cladding mode absorption layers 24 and 25
and the cladding layer 22 should preferably be such that d = 1-5
s. Additionally, the thickness of the cladding mode absorption
layers 24 and 25 should be set as appropriate depending on the
grating properties to be obtained, since the wavelengths of
light absorbed and attenuated by the cladding mode absorption
layers 24 and 25 change therewith.
A planar optical waveguide grating with this type of
structure can be made as follows.
Figs. 13A-13E show the steps in a method for producing a
planar optical waveguide grating according to the present
example.
First, as shown in Fig. 13A, a substrate 21 is prepared and
the surface is cleansed. If an Si substrate is used,then an RCA
cleansing method should preferably be used.
Next, as shown in Fig. 13B, a high refractive index glass
layer 31 to become the cladding mode absorption layer 24, a
first cladding glass layer 32 to become the lower cladding layer
22a, and a core glass layer 33 to become the core 23 are
sequentially formed over the substrate 21. These glass layers
can be formed by depositing glass soot onto the substrate 21 by
means of an FHD process (flame hydrolysis deposition), then
making the glass soot transparent by sintering the substrate 21
with the glass soot at 1290 °C in a helium (He) and oxygen (OZ)
atmosphere.
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The refractive index glass layer 31 can be formed by
depositing a predetermined thickness of glass soot while adding
dopant materials such as to make the refractive index higher
than that of the cladding layer 22 when depositing glass soot by
means of an FHD process. Alternatively, it can be formed during
the process for forming the first cladding glass layer 32 by
adding a dopant material for raising the refractive index for
the first few minutes during the deposition of glass soot.
Then, an Si resist film 34 is formed on top of this core
glass layer 33. This Si resist film 34 can be formed by means
of an Ar sputtering accumulation process.
Thereafter, the core glass layer 33 is etched by means of a
conventional photolithography process to shape the core 23 into
the pattern shown in Fig. 13C. This pattern can be formed by,
for example, first forming a photoresist layer on top of the Si
resist film 34, exposing to light through a mask pattern
corresponding to the shape of the core 23, then forming the
pattern of the core 23 on the Si resist film 34 by means of
etching. Subsequently, reactive ion etching (RIE) is performed
with the Si resist film 34 as a mask to form the core glass
layer 33 into the shape of the core 23.
Next, as shown in Fig. 13D, a second cladding glass layer
35 to become the upper cladding layer 22b is formed on top of
the first cladding glass layer 32 and the patterned core 23.
The second cladding glass layer 35 is formed by the same method
as the first cladding glass layer 32. The second cladding glass
layer 35 is formed so as to have a predetermined thickness
thicker than that of the core 23, so that the core 23 is
embedded inside the first cladding glass layer 32 and the second
CA 02316530 2000-08-15
cladding glass layer 35. Additionally, both the first cladding
glass layer 32 and the second cladding glass layer 35 are
composed of a material having a lower refractive index than the
core 23, and the core 23 embedded in this way forms an optical
5 waveguide with a grating structure.
Subsequently, as shown in Fig. 13E, a high refractive index
glass layer 36 to become the cladding mode absorption layer 25
is formed on the second cladding glass layer 35.
This high refractive index glass layer 36 can be formed by
10 depositing a predetermined thickness of glass soot while adding
a dopant material for increasing the refractive index so as to
be higher than that of the cladding layer 22 while glass soot is
being deposited by means of an FHD process. Alternatively, it
can be formed during the process for forming the second cladding
15 glass layer 35 by adding a dopant material for raising the
refractive index for the last few minutes during the deposition
of glass soot.
The substrate 21 having an optical waveguide formed by the
core 23 in this way has the area around the core 23 cut into a
20 desired shape depending on need, so as to form an optical
component such as an optical filter.
Hereinbelow, functions of the planar optical waveguide
grating of the present example will be explained.
The planar optical waveguide grating of the present example
25 has cladding mode absorption layers 24 and 25 with a refractive
index higher than the cladding layer 22 formed on both outer
sides of the cladding layer 22 in the thickness direction. The
cladding modes are coupled to these cladding mode absorption
layers 24 and 25 so as to be efficiently absorbed and
CA 02316530 2000-08-15
46
attenuated. As a result, the recoupling of cladding modes from
the cladding layer 22 can be reduced, thereby allowing the
rejection of the radiative mode-coupled optical waveguide
grating to be increased.
Additionally, in the planar optical waveguide grating of
the present example, the wavelengths of the cladding modes which
are absorbed and attenuated by the cladding mode absorption
layers 24 and 25 change with the thickness of the cladding mode
absorption layers 24 and 25. Therefore, the wavelength
selectivity for the light to be attenuated by this planar
optical waveguide grating can be improved by appropriately
setting the thicknesses of the cladding mode absorption layers
24 and 25.
While cladding mode absorption layers 24 and 25 were
provided on both outer sides of the cladding layer 22 in the
second example, it is possible to gain the effects of increasing
the rejection and improving the wavelength selectivity by
providing only one of the two cladding mode absorption layer 24
or 25. However, these effects can be attained more efficiently
by providing both cladding mode absorption layers 24 and 25.
For example, in planar optical waveguide gratings of the
structure shown in Figs. 9 and 10, it is possible to obtain a
structure with a cladding mode absorption layer on one outer
side of the cladding layer 2 by using a substrate 1 with a
higher refractive index than the cladding layer 2.
Furthermore, while a planar optical waveguide was used as
an optical waveguide in the above-described second example, it
is also possible to gain effects of increasing the rejection and
improving the wavelength selectivity in a radiative mode-coupled
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47
- optical fiber grating by similarly forming a cladding mode
absorption layer with a higher refractive index than the
cladding around the cladding.
In this case, as methods for forming a cladding mode
absorption layer around the cladding of the optical fiber, there
is a method wherein a high refractive index coating material is
used when forming a coating layer around the cladding, or a
method which can be used when the optical fiber preform is
formed by means of an FHD process, wherein after the cladding
portion is formed and sintered, glass soot containing a dopant
for raising the refractive index is deposited around the
cladding portion for sintering.
Next, Examples 1 and 2 in accordance with the first
embodiment of the present invention and Comparative Example 1
will be explained.
(Example 1)
First, an optical fiber comprising a core composed of
silica glass doped with 12 o mol of Ge02 and 8 o mol of B2O3, and
a cladding composed of (pure) silica glass was prepared. Next,
after removing a portion of the jacket layer of the optical
fiber, the optical fiber was irradiated through a photomask
having slits formed therein with UV light of wavelength 248 nm
at the portion with the jacket layer removed to form a grating
portion. The grating pitch A was 400 um and the overall length
of the grating portion was 20 mm.
The optical fiber grating obtained in this manner had the
properties of a radiative mode-coupled grating, and the central
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wavelength of the rejection band was 1560.0 nm at room
temperature.
Upon analyzing the temperature dependence of the central
wavelength in a temperature range of -20 to 80 °C, it was found
to be 0.01 nm/°C for this optical fiber grating.
(Example 2)
An optical fiber grating was made in a manner identical to
that of the above-described Example 1, with the exception that
an optical fiber comprising a core composed of silica glass
doped with 8 $ mol Ge02 and 16 ~ mol B203 and a cladding composed
of (pure) silica glass was used as the optical fiber.
The resulting optical fiber grating had the properties of a.
radiative mode-coupled grating, and the central wavelength of
the rejection band was 1538 nm at room temperature. Upon
analyzing the temperature dependence of the central wavelength
in a temperature range of -20 to 80 °C, it was found to be
-0.045 nm/°C for this optical fiber grating, thus exhibiting the
inverse properties with respect to Example 1.
(Comparative Example 1)
As a comparative example, an optical fiber grating was made
using an optical fiber with a core not doped with B203.
An optical fiber grating was made in a manner identical to
that of the above-described Example 1, with the exception that
an optical fiber comprising a core composed of silica glass
doped with 4.0 o mol GeOz and a cladding composed of (pure)
silica glass was used as the optical ffiber.
The resulting optical fiber grating had the properties of a
CA 02316530 2000-08-15
49
radiative mode-coupled grating, and the central wavelength of
the rejection band was 1490 nm at room temperature. Upon
analyzing the temperature dependence of the central wavelength
in a temperature range of -20 to 80 °C, it was found to be 0.052
nm/°C for this optical fiber grating.
The results of Examples 1 and 2 and Comparative Example 1
demonstrate that the temperature dependence of the central
wavelength of the rejection band for the optical fiber grating
can be improved over the case wherein the core is not doped with
H203 by using a silica glass optical ffiber wherein the core is
doped with B203 in addition to Ge02.
Additionally, as shown in Example 2, it is possible to
realize an optical fiber grating wherein the temperature
dependence of the central wavelength of the rejection band
exhibits characteristics which are the inverse of conventional
characteristics, depending on the concentration by which the
core is doped with B203.
While the above-explained examples were radiative mode-
coupled optical waveguide gratings using optical fibers as the
optical waveguides, the temperature dependence of the central
wavelength of the rejection band can be increased according to
the same principles in the case wherein a planar optical
waveguide is used as the optical waveguide.
Next, Example 3 in accordance with the second embodiment of
the present invention and Comparative Example 2 will be
explained.
CA 02316530 2000-08-15
(Example 3)
First, a 1.3 um zero-dispersion optical fiber comprising a
core composed of silica glass doped with GeOZ and a cladding
composed of pure silica glass, having a core with a mean
5 relative refractive index difference of 1.0 ~, was prepared.
After irradiating this optical fiber with UV light (wavelength
248 nm) having a spot width of 200 pm, the irradiation was
stopped, then the irradiation position was moved along the
longitudinal direction of the optical fiber for a subsequent
10 irradiation, and this operation was repeated in order to form
the grating portion. The grating pitch was 400 Nm, and the
grating length was 20 mm. .
The resulting optical fiber grating had the properties of a.
radiative mode-coupled grating, with a rejection bandwidth of 15
15 nm.
(Comparative Example 2)
First, a 1.3 arm zero-dispersion optical fiber for
communication purpoese comprising a core composed of silica
20 glass doped with Ge02 and a cladding composed of pure silica
glass. This optical fiber had a mean relative refractive index
difference of the core of approximately 0.35 0.
A grating portion was formed on this optical fiber by the
same method as the above-given Example 3. The grating pitch was
25 400 um as with Example 3. Even when the grating length was made
40 mm which is twice that of Example 3, the rejection bandwidth
could only be made as narrow as approximately 20 nm.
In the above examples, grating portions were formed by
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51
periodically changing the core refractive index, but the
structure of the grating portion can be any arbitrary structure
as long as it results in a radiative mode-coupled grating which
satisfies the above equation (4).
Additionally, there is no restriction to the optical
waveguide grating being an optical fiber grating, the second
embodiment of the present invention can be applied in a similar
manner by using a planar optical waveguide as the optical
waveguide.
Next, Examples 4 and 5 in accordance with the third
embodiment and Comparative Examples 3 and 4 will be explained.
(Example 4)
A planar optical waveguide grating having the structure
shown in Figs. 9 and 10 was prepared. Silica glass (SiOz)
(refractive index 1.447) was used for the substrate 1, Si02
(refractive index 1.447) was used for the cladding layer 2, and
Ge02-doped SiOz (refractive index 1.4516) was used for the core
3.
The thickness T1 of the substrate 1 was 1 mm, the thickness
T3 of the lower cladding layer 2a was 10 um, and the thickness
T4 of the upper cladding layer 2b was 110 arm. Additionally, the
thickness TZ of the core 3 was 8 arm and the width Wl of the
trunk portion was 6 um.
Additionally, the width W2 of the branch portion of the
core 3 was 9 arm, the pitch of the periodic changes in the width
of the core 3 was 400 um, and the grating length was 10 mm.
This planar optical waveguide grating was analyzed for the
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52
optical intensity of transmission while changing the wavelength.
The results are indicated by the solid curve in Fig. 14. In the
graph of Fig. 14, the horizontal axis represents the wavelength
and the vertical axis represents the transmission. The
resulting planar optical waveguide grating exhibited radiative
mode-coupled grating properties, wherein the central wavelength
was 1.32 pm, the rejection was 5.5 dB, and the rejection
bandwidth was 0.3 Vim.
(Comparative Example 3)
A planes r optical waveguide grating was made in a manner
identical to that of Example 4, with the exception that silicon
(Si) (refractive index 3.5) was used as the substrate 1, the
thickness T3 of the lower cladding layer 2a was 30 um, and the
thickness T4 of the upper cladding layer 2b was 30 um.
This planar optical waveguide grating was analyzed for the
optical intensity of transmission while changing the wavelength_
The results are indicated by the dashed curve in Fig. 14. The
resulting planar optical waveguide grating exhibited radiative
mode-coupled grating properties, wherein the central wavelength
was 1.27 um, the rejection was 2.5 dB, and the rejection
bandwidth was 0.3 Nm.
(Example 5)
A planar optical waveguide grating having the structure
shown in Fig. 12 was prepared.
Silicon (Si) was used for the substrate 21, Ge02-doped Si02
(refractive index 1.5) was used for the cladding mode absorption
layers 24 and 25, P203-doped Si02 (refractive index 1.44726) was
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53
used for the cladding layer 22, and Ge02-doped Si02 (refractive
index 1.4516) was used for the core 23.
The thickness of the substrate 21 was 1 mm, the thickness
of the cladding mode absorption layers 24 and 25 was 4 pm, and
the thickness of the cladding layer 22 was 25 um. The thickness
of the core 23 was 8 pm and the width of the trunk portion was 6
pm.
Additionally, the width of the branch portions of the core
3 was 9 pm, the pitch of the periodic changes in the width of
the core 3 is 400 pm, and the grating length was 10 mm.
This planar optical waveguide grating was analyzed for the
optical intensity of transmission while changing the wavelength.
The results are indicated by the open squares in Fig. 15. In
the graph of Fig. 15, the horizontal axis represents the
wavelength and the vertical axis represents the rejection. The
resulting planar optical waveguide Brat ing exhibited radiative
mode-coupled grating properties, wherein the central wavelength
was 1.36 um, the rejection was 9 dB, and the rejection bandwidth
was 0.05 pm.
(Comparative Example 4)
A planar optical waveguide grating was made in a manner
identical to that of Example 5, with the exception that the
cladding mode absorption layers 24 and 25 were not formed.
This planar optical waveguide grating was analyzed for the
optical intensity of transmission while changing the wavelength.
The results are indicated by the closed circles "-" in Fig. 15.
This optical waveguide did not exhibit radiative mode-coupled
grating properties.
CA 02316530 2000-08-15
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The results of Example 4 and Comparative Example 3
demonstrate that the rejection can be increased by making the
refractive index of the substrate 1 equal to the refractive
index of the cladding layer 2.
The results of Example 5 and Comparative Example 4
demonstrate that it is possible to obtain radiative mode-coupled
grating properties selectively attenuating specific wavelengths
of light and to achieve relatively high rejections by means of
providing cladding mode absorption layers 24 and 25.
