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Patent 2361354 Summary

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(12) Patent Application: (11) CA 2361354
(54) English Title: DIAMOND-LIKE COATING, METHOD OF ITS PLATING AND DENTAL BUR WITH THE SAID DIAMOND-LIKE COATING
(54) French Title: REVETEMENT GENRE DIAMANT, METHODE DE PLACAGE ET MEULETTE DE TOUR DENTAIRE POSSEDANT CE REVETEMENT
Status: Dead
Bibliographic Data
(51) International Patent Classification (IPC):
  • C23C 16/50 (2006.01)
  • A61C 3/00 (2006.01)
  • C23C 16/22 (2006.01)
  • C23C 16/44 (2006.01)
(72) Inventors :
  • KIRYUKHIN, MYKOLA MYKHAILOVYCH (Ukraine)
  • ZABASHTA, LIDIYA OLEKSANDRIVNA (Ukraine)
  • BABENKO, VICTOR OLEKSANDROVYCH (Ukraine)
  • VOLKOV, YURIY YAKOVYCH (Ukraine)
  • STRELNYTSKYY, VOLODYMYR YEVGENOVYCH (Ukraine)
(73) Owners :
  • KIRYUKHIN, MYKOLA MYKHAILOVYCH (Not Available)
  • ZABASHTA, LIDIYA OLEKSANDRIVNA (Not Available)
  • BABENKO, VICTOR OLEKSANDROVYCH (Not Available)
  • VOLKOV, YURIY YAKOVYCH (Not Available)
  • STRELNYTSKYY, VOLODYMYR YEVGENOVYCH (Not Available)
(71) Applicants :
  • KIRYUKHIN, MYKOLA MYKHAILOVYCH (Ukraine)
  • ZABASHTA, LIDIYA OLEKSANDRIVNA (Ukraine)
  • BABENKO, VICTOR OLEKSANDROVYCH (Ukraine)
  • VOLKOV, YURIY YAKOVYCH (Ukraine)
  • STRELNYTSKYY, VOLODYMYR YEVGENOVYCH (Ukraine)
(74) Agent: MARKS & CLERK
(74) Associate agent:
(45) Issued:
(22) Filed Date: 2001-11-09
(41) Open to Public Inspection: 2002-05-10
Examination requested: 2001-11-09
Availability of licence: N/A
(25) Language of filing: English

Patent Cooperation Treaty (PCT): No

(30) Application Priority Data:
Application No. Country/Territory Date
2000116367 Ukraine 2000-11-10
2001021387 Ukraine 2001-02-28
2001042829 Ukraine 2001-04-25

Abstracts

English Abstract



Objects of the invention: diamond-like coating, method for its plating on the
product surface and dental bur with this coating. The field of the invention:
producing
wear-resistant diamond-like coatings on metal and non-metal products, in
particular, on
medical tools. The essence of the invention: a layer of diamond-like substance
plated on
the substrate by way of carbon deposition in the gas phase under the
conditions of
reduced pressure is an aggregate of successive sub-layers of diamond-like
coating with
reduced concentration of contaminants in the sub-layers interfaces areas, the
layer is
plated in a sealed chamber under pressures lower than atmosphere pressure
controlling
the product temperature during the deposition process by the method comprising
plating
a metal sub-layer from a separate stationary source of metal plasma and
further plating
diamond-like coating on products being under floating voltage, wherein before
turning on
each of the metal or carbon plasma sources the plasma flow is completely
blocked with a
shutter, then the corresponding source is turned on, and in the predetermined
period of
time the shutter is made open. Such a coating is plated on a dental bur. The
technical
result: increase of the coating thickness and increase in its strength and
wear resistance.


Claims

Note: Claims are shown in the official language in which they were submitted.



THE EMBODIMENTS OF THE INVENTION IN WHICH AN
EXCLUSIVE PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS
FOLLOWS:
1. A diamond-like coating comprising a layer of diamond-like substance
plated on the substrate by way of carbon deposition in the gas phase under the
conditions of reduced pressure, characterized in that the layer is an
aggregate of
successive sub-layers of diamond-like coating with reduced concentration of
contaminants in the sub-layers interface areas.
2. The diamond-like coating as set forth in claim 1, characterized in that
it further comprises an additional titanium sub-layer plated by way of
titanium
deposition in the gas phase before the diamond-like coating plating on steel
cutting
tools.
3. The diamond-like coating as set forth in claim 1 or 2, characterized in
that the thickness of each sub-layer of diamond-like coating is not less than
0.1 µm.
4. The diamond-like coating as set forth in claim 1, 2 or 3, characterized
in that the amount of sub-layers of diamond-like coating is within the range
of 1 - 20.
5. A method for plating the diamond-like coating on the product surface
comprising plating a metal sub-layer on the product surface from a separate
stationary
metal plasma source, after which the product surface is coated with a diamond-
like
coating by way of deposition of a carbon plasma flow from a pulse arc source,
the
process taking place in a vacuum chamber with pressures lower than atmosphere
pressure, and the product temperature is controlled during the deposition
process, the
product being under floating voltage, characterized in that before turning on
each of
the sources of metal or carbon plasma the plasma flow is completely blocked
with a
10


shutter, then the corresponding source is turned on, and in the predetermined
period of
time the shutter is made open.
6. The method as set forth in claim 5, characterized in that the process of
the diamond-like coating plating is repeated several times by plating a sub-
layer of the
coating each time, blocking the plasma flow each time with a shutter before
turning
on the carbon flow source, after which the source is turned on, and in the
predetermined period of time the shutter is made open.
7. The method as set forth in claim 6, characterized in that the thickness
of each sub-layer of diamond-like coating is not less than 0.1 µm.
8. The method as set forth in claim 6, 7, characterized in that the amount
of sub-layers of diamond-like coating is within the range of 1 - 20.
9. The method as set forth in any one of claims 5 - 8, characterized in
that the duration of the said predetermined period of time is within 40 - 80
seconds.
10. The method as set forth in any one of claims 5 - 9, characterized in
that the deposition of the DLC from a pulse source of carbon plasma is
performed
with the simultaneous bombardment of the product surface with argon ions from
a
separate stationary ion source.
11. The method as set forth in claim 10, characterized in that the energy of
argon ions is within the range of 4 - 6 keV.
12. The method as set forth in any one of claims 5 - 11, characterized in
that during the coating deposition the energy of carbon ions does not exceed
0.4 keV.
11


13. The method as set forth in any one of claims 5 - 12, characterized in
that the duration of the carbon source pulses does not exceed 10 µsec with
the pulse
period-to-pulse duration ratio not less than 30,000.
14. A dental bur comprising a layer of wear resistant coating, characterized
in that the coating is a diamond-like coating comprising an aggregate of
successive
sub-layers with reduced concentration of contaminants in the sub-layers
interface
area.
15. The dental bur as set forth in claim 14, characterized in that it
comprises an additional titanium sub-layer plated by way of titanium
deposition in the
gas phase before the diamond-like coating plating.
16. The dental bur as set forth in claim 14 or 15, characterized in that the
thickness of each sub-layer of the diamond-like coating is not less than 0.1
µm.
17. The dental bur as set forth in claim 14, 15 or 16, characterized in that
the amount of sub-layers of the diamond-like coating is within the range of 1 -
20.
18. A method for plating the diamond-like coating on the product surface
comprising plating a diamond-like coating on the product surface by way of
deposition of a carbon plasma flow from a pulse arc source, the process taking
place
in a vacuum chamber with pressures lower than atmosphere pressure, and the
product
temperature is controlled during the deposition process, the product being
under
floating voltage, characterized in that before turning on the carbon plasma
source the
plasma flow is completely blocked with a shutter, then the source is turned
on, and in
the predetermined period of time the shutter is made open.
12


19. The method as set forth in claim 18, characterized in that before
plating a diamond-like coating on metal products a sub-layer of metal is
plated on the
product surface from a separate stationary source of metal plasma, the said
source
being blocked with a shutter before turning it on, then this source is turned
on, and in
the predetermined period of time the shutter is made open.
20. The method as set forth in claim 19, characterized in that before
plating a metal sub-layer on the product surface a separate stationary ion
source of
argon is turned on, and ion bombardment of products with argon ions is
performed
during the predetermined period of time.
21. The method as set forth in claim 20, characterized in that the energy of
argon ions is established within the range of 5 - 6 keV, and a positive
potential is
applied to the products within the range of 800 - 1,500 V.
22. The method as set forth in claim 19, 20 or 21, characterized in that
after turning on the metal plasma source with the closed shutter the arc
current is
maintained within the range of 90 - 100 A, and the duration of the
predetermined
period of time, in which the shutter of the metal plasma source is made open,
is
established within the range of 50 - 60 seconds.
23. The method as set forth in claim 19, 20, or 21, characterized in that
during the predetermined period of time a separate stationary ion source of
argon is
turned on, and ion bombardment of products with argon ions is performed with
the
energy 5 - 6 keV, while a potential is applied to products within the range of
1,400 -
1,600 V.
24. The method as set forth in any one of claims 19 through 23,
characterized in that the sub-layer of metal is plated with the positive
potential on the
13


products being within the range of 180 - 200 V.
25. The method as set forth in any one of claims 18 through 24,
characterized in that the process of the diamond-like coating plating is
repeated
several times by plating a sub-layer of the coating each time, blocking the
plasma
flow each time with a shutter before turning on the carbon flow source, after
which
the source is turned on, and in the predetermined period of time the shutter
is made
open.
26. The method as set forth in any one of claims 18 through 25,
characterized in that the duration of the said predetermined period of time,
in which
the shutter of the carbon plasma source is made open, is within 40 - 80
seconds.
27. The method as set forth in any one of claims 18 through 26,
characterized in that during the coating deposition the energy of carbon ions
does not
exceed 0.4 keV.
28. The method as set forth in any one of claims 18 through 27,
characterized in that the duration of the carbon source pulses does not exceed
10 µsec
with the pulse period-to-pulse duration ratio not less than 30,000.
29. The method as set forth in any one of claims 18 through 28,
characterized in that before opening the pulse carbon source with a shutter it
is turned
off, and the ion source of argon is turned on for the predetermined period of
time.
30. The method as set forth in any one of claims 25 through 29,
characterized in that the thickness of each sub-layer of the diamond-like
coating does
not exceed 0.1 µm.
14


31. The method as set forth in any one of claims 24 through 30,
characterized in that the amount of sub-layers does not exceed 20.
32. The method as set forth in any one of claims 18 through 31,
characterized in that the deposition of the DLC from a pulse source of carbon
plasma
is performed with the simultaneous bombardment of the product surface with
argon
ions.
33. The method as set forth in claim 32, characterized in that the energy of
argon ions is within the range of 4 - 6 keV.
34. A dental bur comprising a layer of wear resistant coating, characterized
in that the coating is a diamond-like coating comprising an aggregate of
successive
sub-layers with reduced concentration of contaminants in the sub-layers
interface
area.
35. The dental bur as set forth in claim 34, characterized in that it
comprises an additional titanium sub-layer plated by way of titanium
deposition in the
gas phase before the diamond-like coating plating.
36. The dental bur as set forth in claim 34 or 35, characterized in that the
thickness of each sub-layer of the diamond-like coating is not less than 0.1
µm.
37. The dental bur as set forth in claim 34, 35 or 36, characterized in that
the amount of sub-layers of the diamond-like coating is within the range of 1 -
20.

Description

Note: Descriptions are shown in the official language in which they were submitted.



CA 02361354 2001-11-15
DIAMOND-LIKE COATING, METHOD OF ITS PLATING
AND DENTAL BUR WITH THE SAID DIAMOND-LIKE COATING
The invention is related to the field of producing highly rigid wear-
resistant coatings on metal and non-metal goods, in particular on medical
cutting tools, for example, on dental burs.
Background of the invention
Diamond-like coatings (DLC) are widely used in various branches of
science and technology. Main advantages of DLCs are their hardness, wear-
resistance, purity, biological inertness, etc. Due to such properties DLCs are
plated on medical tools, medical implants, cutting tools and are used in other
branches.
There is known a DLC plated by vacuum arc method disclosed in the
USSR Certificate of Authorship No. 1070949 comprising a DLC layer on a
substrate, DLC being plated by a pulse stream of compensated no-current
carbon plasma with the density of 101$-1019 cm 2c-1.
However, the disclosed coating does not have a necessary thickness due
to poor DLC adhesion to the substrate.
The closest prior art for the coating according to the invention claimed is
a coating disclosed in the USSR Certificate of Authorship No. 1494554
published on March 15, 1994, Bulletin No. 5. The coating has an increased
strength of the sub-layer adhesion to the substrate and to the following layer
of
DLC. Yet strength provided by this method is not sufficient for producing a
DLC with high wear resistance due to high concentration of contaminants in
DLC.
There is known a method for producing highly rigid DLCs on metal and
dielectric substrates by way of cathode spraying of graphite in a magnetic
field
at low pressure of the inert gas - krypton (10-5-10-2 Pa) on the substrate
being
cooled and having the temperature lower than 100 K (the USSR Certificate of
Authorship No. 411037 published in 1974, Bulletin No. 29). A drawback of
i


CA 02361354 2001-11-15
this method is poor quality of the coating, low productiveness and high cost
of
the products.
Main efforts of the researchers and manufacturers of DLCs are aimed at
increasing their wear resistance defined both by adhesion to the substrate and
the structure of the coating itself. One of the most important parameters of
the
DLC deposition process is the substrate (product) temperature that is not to
exceed the critical temperature 135-150° C during the process, since in
case it
is higher coatings start losing their physical and mechanical properties and
adhesion to the substrate due to thermal graphitization. Furthermore,
necessary
is high purity of the source material, high density of the carbon flow, high
purity of the substrate surface, etc. As a result, a pulse ion-plasma vacuum
arc
(further - vacuum arc) method of plating DLC was developed, the essence of
which lies in forming an intensive pulse flow of carbon ions in an electric
arc
m a vacuum.
One of the known vacuum arc methods of DLC plating is a method
disclosed in the USSR Certificate of Authorship No. 1070949 that involves
DLC condensation on the substrate produced by a pulse flow of compensated
no-current carbon plasma with density Of lOl8-1019 Cm 2c-~.
However, the said method does not also provide for necessary thickness
of the coating due to poor DLC adhesion to the substrate.
The closest prior art for the method according to the claimed invention is
a method disclosed also in the USSR Certificate of Authorship No. 1494554
published on March 15, 1994, Bulletin No. 5, the essence of which lies in the
fact that before vacuum arc DLC plating on the substrate surface the said
surface is coated by a sub-layer of metal, e.g. titanium having increased
strength of adhesion to the substrate and the following layer of DLC, the
product being under floating voltage during the process of plating the sub-
layer
of metal and DLC.
However, adhesion strength obtained by this method is still insufficient
for producing a DLC with high wear resistance. Besides, it is reasonable to
2


CA 02361354 2001-11-15
plate the titanium sub-layer only on metal substrates whereas DLC may be
plated on non-metal substrates as well.
One of the applications of strengthening coatings is their plating on
medical cutting tools, in particular on dental burs. Known are dental burs
made
of steel or hard-alloyed materials (for example, see the State Standard of
Ukraine - 22090-89). Yet these burs have a short durability due to
insufficient
hardness and wear resistance of cutting edges.
The closest prior art for dental burs claimed according to this invention is
dental burs of Romidan Dental Ltd. presented on the Internet at the address:
http:/www.romidan.com/fgburs.htm. The heads of these burs made of stainless
steel are coated by electrostatic gluing with a coating of diamond powder made
of natural diamonds. Drawbacks of these burs are their high cost and
relatively
short durability due to the fact that strength of the bond between the powder
and metal is determined by the glue adhesion to the powder and metal.
Summary of the invention
As far as the DLC and method of its plating are concerned, this invention
is based on the objectives of improving wear resistance of the product due to
the increase in the level of the coating adhesion to the substrate and
increasing
the coating thickness due to the change of its structure.
As far as dental burs are concerned, this invention is based on the
objective of increasing their wear resistance by introducing new materials and
elements.
The set objective as to the coating is solved as follows: the known coating
comprises a diamond-like substance layer plated on the substrate by carbon
deposition in the gas phase under reduced pressure conditions, said layer
being
an aggregate of successive sub-layers of diamond-like coating with the reduced
concentration of contaminants in the areas of the sub-layers interface.
The decrease in the concentration of contaminants is obtained as follows:
during the process of plating the coating on the product surface by deposition
3


CA 02361354 2001-11-15
of a carbon plasma flow from a pulse arc source in a sealed chamber at
pressures below atmosphere pressure, before turning on the carbon plasma
source the plasma flow is blocked with a shutter, then the source is turned
on,
and then in the predetermined period of time the shutter is made open. Then a
relatively thin DLC sub-layer is plated, the source is turned off, the shutter
is
closed, and the process is repeated.
The improvement claimed in this invention consists in the creation of the
coating structure out of a number of successive sub-layers with a sharp
decrease in concentration of contaminants both at the interface of the
successive sub-layers and within one sub-layer. This increases adhesion of sub-

layers to each other and to the substrate and so allows to increase the DLC
quality and thickness that in turn increases the coating strength and wear
resistance.
A further improvement of the coating according to the invention is an
additional titanium sub-layer plated by titanium deposition in the gas phase
before plating the diamond-like coating on the steel substrate. Adhesion of
the
whole coating to the substrate is increased due to the fact that titanium has
increased adhesion to metal, especially to steel, as a metal. A particular
effect is
obtained when before plating titanium the titanium plasma flow is blocked with
a shutter for a certain period of time. This also leads to decrease in amount
of
contaminants at the interface and to increase in the DLC adhesion to the
substrate and wear resistance of the coating.
In specific embodiments of the invention as a result of the research
performed the following parameters of the coating were optimised:
thickness of the diamond-like coating sub-layer is not less than 0.1 ~.m;
amount of the diamond-like coating sub-layers is within the range of 1 -
20.
The objective set as to the method is solved by adding new operations to
the known method of DLC plating on the product surface comprising plating a
4


CA 02361354 2001-11-15
diamond-like coating on the product surface by deposition of a carbon plasma
flow from a pulse arc source, the said process taking place in a sealed
chamber
under pressures lower than atmosphere pressure, the temperature of the product
being controlled during the deposition process, and the product being under
floating voltage, said new operations being as follows: before turning on the
carbon plasma source this source is completely blocked with a shutter, then
the
source is turned on, and in the predetermined period of time the shutter is
made
open.
The blocking of the carbon plasma source with a shutter before turning it
on does not allow the carbon plasma flow to be deposited on the products, and
it is these initial periods when a great amount of contaminants, which
impregnate the cathode during free air entering into the chamber and during
the
process of pumping out by oil pumps, are penetrating into the plasma when
leaving the surface of the carbon plasma source cathode made of graphite and
being a porous material with a well-developed surface. Contaminants present in
initial layers of coatings reduce significantly the adhesion of one layer to
another one and impair the coating quality. Therefore, the improvement
claimed in this invention reduces sharply the quantity of contaminants getting
on the product surface and hereby increases the metal adhesion to the product
surface and to the DLC, which in turn increases wear resistance of the DLC.
A further improvement of the method according to the invention is that
before plating a diamond-like coating on metal products a sub-layer of metal
is
plated on the product surface from a separate stationary source of metal
plasma, the said source being blocked with a shutter before turning it on,
then
this source is turned on, and in the predetermined period of time the shutter
is
made open.
As it is known, a sub-layer of metal, e.g. titanium has an enhanced
adhesion to the substrate metal, and on the other hand, a sub-layer of metal
plated by the aforesaid method has an increased purity and therefore has an
enhanced adhesion to the following sub-layer of DLC.


CA 02361354 2001-11-15
Besides, similar to the case with the carbon plasma source, the shutter
blocking the metal plasma flow being formed after turning on the source does
not allow this metal plasma flow to be deposited on the substrate during
initial
periods of the source operation when the amount of contaminants in the flow is
the highest.
Thus, this improvement further increases the DLC adhesion to the
substrate.
In a further improvement of the method according to the invention before
plating a metal sub-layer on the product surface a separate stationary ion
source
of argon is turned on, and ion bombardment of products with argon ions is
performed during the predetermined period of time. Such a bombardment heats
up at least the surface layer of the products and contributes to cleaning the
surface from contaminants entering the external space. This further increases
the metal adhesion to the product surface.
In a specific embodiment of the bombardment of products with argon ions
the energy of argon ions is established within the range of 5 - 6 keV, and a
positive potential is applied to the products within the range of 800 - 1,500
V.
In a specific embodiment of the method, which comprises plating a metal
sub-layer, after turning on the metal plasma source with the closed shutter
the
arc current is maintained within the range of 90 - 100 A, and the duration of
the predetermined period of time, in which the shutter of the metal plasma
source is made open, is established within the range of 50 - 60 seconds. These
ranges were determined experimentally to be the most appropriate ones for the
maximum removal of contaminants from the metal plasma source cathode.
A further improvement of the method according to the invention, which
comprises plating a metal sub-layer, is that during the said predetermined
period of time a separate stationary ion source of argon is turned on, and ion
bombardment of products with argon ions is performed with the energy 5 - 6
keV, while a potential is applied to products within the range of 1,400 -
1,600
V. The effect of the bombardment on the degree of the metal sub-layer
6


CA 02361354 2001-11-15
adhesion to the product surface is described above, and performing the
bombardment during the metal plasma source preparation for operation reduces
the period of plating the coating. The aforesaid ranges of physical values are
also determined experimentally and are the most appropriate ones for the said
operation.
In a specific embodiment of the method, which comprises plating a metal
sub-layer, this sub-layer is plated with the positive potential on the
products
being within the range of 180 - 200 V. The said range is optimum for plating a
metal sub-layer and is also determined experimentally.
A further improvement of the method according to the invention is to
repeat the process of the diamond-like coating plating several times with
plating a sub-layer of the coating each time, wherein each time before turning
on the source of carbon plasma the plasma flow is blocked completed with a
shutter, then the source is turned on, and in the predetermined period of time
the shutter is made open. This allows to obtain reduced concentration of
contaminants in every sub-layer interface area, which decreases stresses in
this
area and enables to increase the coating strength and wear resistance to
further
extent.
In a specific variant of any of the aforesaid embodiments of the method
according to the invention the duration of the predetermined period of time,
in
which the shutter is made open, is within the range of 40 - 80 seconds. This
experimentally determined period of time is sufficient for contaminants to be
removed to the utmost from the surface of the carbon plasma source cathode.
By experimental research of conditions of DLC plating on products
without exceeding the critical temperatures specific values of the process
parameters were chosen, namely:
- energy of carbon ions not exceeding 0.4 keV;
- duration of the carbon source pulses being 10 sec with the pulse
period-to-pulse duration ratio not less than 30,000;


CA 02361354 2001-11-15
which may be used in the method according to the invention both separately
and in the aggregate.
A further improvement of the method according to the invention is that
before opening the pulse carbon source with a shutter it is turned off, and
the
ion source of argon is turned on for the predetermined period of time. This
allows to clean the product surface before plating the next sub-layer on
products due to the increase in their temperature and enhance the adhesion of
the following DLC layer to the preceding one.
In specific embodiments of the method, wherein a number of sub-layers
of the coating are plated, the thickness of each sub-layer of the diamond-like
coating is not less than 0.1 ~m and/or the amount of sub-layers is within the
range of 1 - 20.
A further improvement of the method according to the invention is to
introduce an additional new operation of argon ion bombardment of the
product surface from a separate ion source during the process of the DLC
deposition from a pulse source of carbon plasma.
In the known methods of producing DLC with the help of a pulse source
of carbon plasma it was impossible to produce a coating more than 1.5 pm
thick due to poor adhesion and large internal stresses in the coating, while
many practical applications require coatings up to 5 ~,m thick and more.
As it is known, the DLCs produced by the known methods have a
columnar structure having large internal stress when the coating is
sufficiently
thick, which results in the cracking of coating at the border of grains and in
its
detachment from the substrate with the great thickness of the coating.
Furthermore, one of the causes explaining the quality impairment of the
DLC plated by the said method on small-sized products with sharp cutting
edges and poor thermal conductivity is the local heating of products to
temperatures higher than critical temperature, which results in graphitization
of
metastable diamond structure of the coating and disastrous reduction of wear
s


CA 02361354 2001-11-15
resistance and strength of the coating. During the bombardment of the product
surface with argon ions obtained from a separate ion source, which takes place
simultaneously with the DLC deposition from the pulse carbon source, the
argon ions irritate the columnar structure, which contributes to more uniform
stress distribution in the coating and reduces the internal stress appearing
in the
coating during the deposition, whereby graphitization of the structure is
avoided. Thus increased quality of the coating is provided, and it is possible
to
increase its thickness.
By experimental research of conditions of DLC plating on products
without exceeding the critical temperatures the energy of the doping argon gas
ions was chosen to be within the range of 4 - 6 keV in the specific embodiment
of the invention.
The objective set in this invention as to the dental bur improvement is
solved as follows: in a dental bur comprising a wear-resistant coating layer
the
coating is a diamond-like coating comprising a number of successive sub-
layers with reduced concentration of contaminants in the sub-layers interface
areas.
The technical result obtained thereby lies in the increase in wear
resistance of burs due to the plating continuous and homogeneous coating and
to the increase in the coating adhesion to the bur material.
The improvements and specific embodiments of the dental bur according
to the invention are similar to those described above for the coating.
9

Representative Drawing
A single figure which represents the drawing illustrating the invention.
Administrative Status

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Administrative Status

Title Date
Forecasted Issue Date Unavailable
(22) Filed 2001-11-09
Examination Requested 2001-11-09
(41) Open to Public Inspection 2002-05-10
Dead Application 2005-11-09

Abandonment History

Abandonment Date Reason Reinstatement Date
2004-11-09 FAILURE TO PAY APPLICATION MAINTENANCE FEE
2004-11-19 R30(2) - Failure to Respond
2004-11-19 R29 - Failure to Respond

Payment History

Fee Type Anniversary Year Due Date Amount Paid Paid Date
Request for Examination $400.00 2001-11-09
Application Fee $300.00 2001-11-09
Maintenance Fee - Application - New Act 2 2003-11-10 $100.00 2003-10-27
Owners on Record

Note: Records showing the ownership history in alphabetical order.

Current Owners on Record
KIRYUKHIN, MYKOLA MYKHAILOVYCH
ZABASHTA, LIDIYA OLEKSANDRIVNA
BABENKO, VICTOR OLEKSANDROVYCH
VOLKOV, YURIY YAKOVYCH
STRELNYTSKYY, VOLODYMYR YEVGENOVYCH
Past Owners on Record
None
Past Owners that do not appear in the "Owners on Record" listing will appear in other documentation within the application.
Documents

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Document
Description 
Date
(yyyy-mm-dd) 
Number of pages   Size of Image (KB) 
Description 2001-11-15 9 453
Claims 2001-11-15 6 219
Representative Drawing 2002-02-07 1 7
Abstract 2003-05-21 1 29
Description 2003-05-21 12 610
Claims 2003-05-21 6 196
Claims 2003-10-21 6 182
Abstract 2001-11-09 1 36
Description 2001-11-09 9 560
Claims 2001-11-09 2 103
Drawings 2001-11-09 1 13
Cover Page 2002-05-03 2 56
Correspondence 2001-11-23 1 17
Assignment 2001-11-09 2 121
Prosecution-Amendment 2001-11-15 17 717
Prosecution-Amendment 2003-05-21 21 892
Prosecution-Amendment 2003-10-24 2 30
Prosecution-Amendment 2004-04-16 4 195
Prosecution-Amendment 2004-05-10 1 16
Prosecution-Amendment 2004-05-19 4 192