Note: Descriptions are shown in the official language in which they were submitted.
PATENT
ANDO3 P-101
WATER PROCESSING APPARATUS
CROSS REFERENCE TO RELATED APPLICATION
[0001] The present application is a continuation-in-part application of
U.S. patent application Ser.
No. 17/341,729, filed Jun. 8, 2021, which claims the benefit of U.S.
provisional application Ser. No.
63/036,786, filed Jun. 9, 2020, which are each hereby incorporated herein by
reference in their
entireties.
FIELD OF THE INVENTION
[0002] The present invention is directed to apparatuses and methods for
processing or conditioning
of water.
BACKGROUND OF THE INVENTION
[0003] Water passing through water distribution or circulation systems
commonly includes organic
materials, microorganisms, and minerals that can produce biofilms and scale
deposits on surfaces of
processing equipment or components of the water distribution system, such as
interior pipe walls
and heating exchanger elements. Biofilm is a layer of microorganisms contained
in a slime layer,
which forms on surfaces in contact with water. Scale deposits or scaling
occurs in the boundary
layer between the water and the inside surface of the pipe or equipment
surface. Processing or
conditioning of water can be affected by reducing, neutralizing, or
eliminating the organic
materials, and minerals in the water that will pass through the water system.
Scale, slime, or biofilm
layers produce a boundary layer between the water and the equipment, which may
render the
equipment and components less effective or wholly ineffective, requiring out-
of-service time and
costs for cleaning or replacement. Other effects of biofilms and scaling may
include reduced heat
transfer between the water and the piping, increased fluid friction and
reduced flow rates, increased
energy and maintenance costs, increased chemical treatment costs, reduced
equipment life, and
undesirable odors.
SUMMARY OF THE INVENTION
[0004] The present invention provides a water processor or water
processing apparatus or system
for processing or conditioning water to reduce or neutralize organic
materials, such as
microorganisms and other biological contaminants, as well as inorganic
material which may be
present in a water distribution or circulation system. Reducing or
neutralizing the organic and
inorganic materials reduces the likelihood of biofilms and scale building-up
on the inner walls of
pipes or surfaces of components in a downstream water system. The water
processing system
Date Regue/Date Received 2022-10-27
includes a water processor that includes a conditioning element having
alternating conditioning
plates or discs with different patterns or configurations of flow-directing
apertures. The alternating
flow-directing apertures force the water to flow in a staggered, circuitous or
substantially indirect
fashion through the water processor, which creates turbulence and shear in the
water flow. The
turbulence and shear facilitate interaction of the water molecules and
suspended gas bubbles in the
water with the conditioning plates. The plate apertures include a sharp edge
configuration. The
sharp aperture edges and aperture configurations impart turbulence and shear
in the water flow and
facilitate the division of larger gas bubbles into smaller nano-bubbles. A
nano-bubble has a diameter
well under 1 millimeter (1 mm), such as about fifty to two-hundred nanometers
(50-200 nm). The
water processing system includes a mixer injector for introducing a
supplemental gas or fluid (e.g.
air, oxygen, ozone, etc.) into the water flow. The mixer injector introduces a
turbulent flow of the
supplemental gas into the water flow, thereby introducing additional gas
bubbles into the water
flow, upstream of the water processor. The nano-bubbles created by the water
processor are
effective in reducing organic materials, microorganisms, and biological
contaminants present in
water, such as potable water or water used in industrial equipment,
residential or commercial water
systems, clean-in-place (CIP) systems, process cooling systems, swimming
pools, hot tubs, spas,
ponds, water features, and the like. Nano-bubbles may aid in precipitating
solids suspended in the
water, so that the precipitated solids may be removed from the water via
filtration or settling. The
water processor produces or forms nano-bubbles in the water and the nano-
bubbles condition or
treat the components throughout the water system in which the processor is
installed.
[0005] According to one form of the present invention, a water processing
apparatus or system is
provided for processing or conditioning water to be distributed or circulated
downstream of the
water processing system. The water processing system includes a water
processor including a
housing having an inlet at one end and an outlet at the opposite end. The
water processor includes a
conditioning element disposed inside of the housing between the inlet and the
outlet. The
conditioning element is provided for splitting suspended gas bubbles in the
water flow into smaller
bubbles, preferably nano-bubbles. The water processing system includes a mixer
injector upstream
of the water processor. The mixer injector introduces additional gas bubbles
into a water flow
passing through the system and toward the water processor. The increase in
larger gas bubbles in
the water flow provides for a greater potential of nano-bubble production in
the processed water
-2-
Date Regue/Date Received 2022-10-27
flow as it passes through the water processor. A greater saturation of nano-
bubbles may provide
improved effectiveness of the processed water in treating downstream functions
and systems.
[0006] In one aspect, the mixer injector includes an injector body having
an upstream inlet, a
downstream outlet, and an injector inlet positioned between the upstream inlet
and downstream
outlet. A constriction in a center portion of a water conduit portion of the
body is located near the
interior entry orifice of the injector inlet such that the injector inlet is
in fluid communication with
the water flow at the constriction. The constriction creates a venturi effect,
or pressure drop, in the
water flow near the injector inlet as the water flows through the mixer
injector. The pressure drop
creates a vacuum which draws the supplemental gas into the water flow through
the injector inlet,
upstream of the water processor. The supplemental gas may enter the water flow
in a turbulent
manner causing gas bubbles to be entrained within the water flow. As such, the
total quantity and
volume of gas bubbles in the water flow upstream of the water processor is
increased, as compared
to a similar water flow without supplemental gas. Subsequently, the downstream
water processor
receives and processes the water flow having more and larger bubbles entrained
therein. The
increase in gas volume and quantity of larger bubbles facilitates a
potentially higher saturation or
concentration of nano-bubbles in the processed water, as compared to a similar
water flow without
supplemental gas. The supplemental gas can be maintained at about atmospheric
pressure such that
the pressure drop creates a pressure below atmospheric pressure to draw the
supplemental gas into
the water flow. However, it will be appreciated that the supplemental gas may
be maintained at a
desired pressure above atmospheric pressure in order to ensure an adequate
flow volume and/or
desired turbulence of the supplemental gas as it enters the water flow.
[0007] In another aspect, the conditioning element of the water processor
includes a plurality of
conditioning element plates or discs that process the water and direct the
flow of water through the
water processor. The plurality of plates may include first plates having a
first pattern or
configuration and second plates having a second pattern or configuration. The
first and second
plates are disposed in alternating spaced arrangement inside of and along the
longitudinal axis of the
housing such that the first configuration and second configuration alternate
one after the other. The
first plates each define a plurality of flow-directing apertures therethrough,
wherein the pattern or
arrangement of apertures defines the first configuration. The second plates
each define a plurality of
flow-directing apertures therethrough, wherein the pattern or arrangement of
apertures defines the
second configuration. The second configuration is different from the first
configuration such that
-3-
Date Regue/Date Received 2022-10-27
the flow path through the water processor is staggered, circuitous or
indirect. For example, in one
aspect, the first configuration may include more flow-directing apertures than
the second
configuration. The flow-directing apertures in the first and second plates
include sharp edges that
facilitate division or splitting of large gas bubbles suspended in the water
into smaller gas bubbles,
down to the nano-bubble size. Preferably, the sharpness of the edge of each
aperture is as sharp as a
knife or razor edge, e.g. having a radius of about 0.01 microns or less.
Optionally, a pump may be
provided for increasing the flow of water toward the upstream inlet of the
mixer injector and/or the
upstream inlet of the water processor. In some instances, such as during
maintenance of the water
processing system, the conduit leading to either the mixer injector or water
processor may be
blocked with a valve, and the pumped water flow is directed to only the open
conduit and the
corresponding downstream injector or processor.
[0008] In yet another aspect, the total opening surface area of each of
the first plates is different
than the total opening surface area of each of the second plates, thereby
causing changes in water
flow speed past the first and second plates, while maintaining a consistent
flow rate past each of the
plates. For example, the first configuration of flow-directing apertures of
each of the first plates may
have a total opening surface area that is different than the total opening
surface area of the second
configuration of flow-directing apertures of each of the second plates, so
that the water flow speed
past the first plates is slower than the water flow speed past the second
plates for any given flow
rate. Optionally, a center-to-center spacing of adjacent ones of the apertures
of the first plate may be
different than a center-to-center spacing of adjacent ones of the apertures of
the second plate.
Further optionally, the first configuration of apertures of the first plate
and/or the second
configuration of apertures of the second plate may include at least two
differently sized apertures.
[0009] In still another aspect, the first configuration of apertures of
the first plate and/or the second
configuration of apertures of the second plate includes two non-contiguous
groupings of flow-
directing apertures spaced uniformly about the plate. Each of the groupings
are mirrored across
from the other grouping across a diametral axis of the plate. For example, the
second configuration
of apertures of the second plate may include two non-contiguous groupings of
three flow-directing
apertures spaced uniformly and circumferentially near an outer perimeter of
the second plate. Each
of the groupings of three apertures are mirrored across from the other
grouping across a diametral
axis of the second plate.
-4-
Date Regue/Date Received 2022-10-27
[0010] In yet still another aspect, the first configuration of apertures
of the first plate and/or the
second configuration of apertures of the second plate includes two or more
rings of uniformly and
circumferentially spaced flow-directing apertures, with each ring of apertures
having a different
diameter. The number of apertures of each ring may be different from the other
ring(s). For
example, each first plate may include an outer ring of twelve (12) flow-
directing apertures spaced
circumferentially near an outer perimeter of the first plate. The first plate
further includes an inner
ring of four flow-directing apertures spaced circumferentially near a center
of the first plate and
inside of the outer ring of twelve (12) apertures.
[0011] In yet another aspect, the fluid flow passing through the water
processor passes sequentially
over each of the alternating first plates and the second plates. Optionally,
the conditioning element
may include more first plates than second plates. For example, the
conditioning element may
include twelve (12) of the first plates and thirteen (13) of the second plates
in alternating spaced
arrangement.
[0012] In still another aspect, the first plates and the second plates are
fixedly coupled to an
elongate rod which is disposed coaxially with the longitudinal axis of the
housing.
[0013] Optionally, the first plate and second plates are circular metal
plates having a thickness of
between about one-eighth inch to about one-half inch (0.125-0.5 in.), and
preferably of about one-
quarter inch (0.25 in.), and may be formed of 316 stainless steel or other
relatively inert metal or
metal alloy. Preferably, the spacing between immediately adjacent ones of the
first and second
plates is between about one-half inch to about four inches (0.5-4.0 in.)
[0014] In still another aspect, each of the flow-directing apertures of
each of the first plates may be
co-axial with a corresponding flow-directing aperture of the other of the
first plates of the
conditioning element. Optionally, none of the flow-directing apertures of the
second plates are co-
axial with any of the flow directing apertures of any of the first plates.
[0015] In another form of the present invention, a water processor
includes a housing having an
inlet at one end and an outlet at the opposite end. The water processor
includes a conditioning
element disposed inside of the housing between the inlet and the outlet. The
conditioning element
includes a plurality of conditioning element plates or discs that process the
water and direct the flow
of water through the water processor. The plurality of plates each define a
plurality of flow-
directing apertures therethrough, defining an aperture configuration. The
aperture configuration of
each plate may be identical to or different from the other plates. The plates
may be disposed in the
-5-
Date Regue/Date Received 2022-10-27
housing in non-uniform orientation such that the apertures of each plate are
not necessarily aligned
or co-axial with one another, from one plate to the next. The non-uniform
arrangement of the plate
aperture configurations create a flow path through the water processor that is
staggered, circuitous
or indirect. The flow-directing apertures in the plates include sharp edges
that facilitate dividing or
splitting of large gas bubbles suspended in the water into smaller gas
bubbles, down to the nano-
bubble size. A nano-bubble is defined as a gas bubble having a diameter of
less than about one
micrometer (1 gm), and preferably less than about two-hundred nanometers (200
nm).
[0016] In yet another form of the present invention, a water conditioning
assembly includes a
plurality of first flow directing or conditioning element plates or discs with
flow directing apertures
similar to the first plates described above, a plurality of second flow
directing or conditioning
element plates or discs with flow directing apertures similar to the second
plates described above,
and an elongate supporting rod at which the first plates and second plates are
fixedly coupled in a
spaced arrangement. Optionally, the water conditioning assembly may be
installed in a housing that
is configured to be installed in-line between two water transport conduits of
a water distribution
system. However, it will be appreciated that the water conditioning assembly
may be installed
directly into a water transport conduit (e.g. a cylindrical or tubular pipe),
in-line with the water flow
through the conduit, to provide a desired amount of nano-bubble water
processing within the
conduit.
[0017] According to another form of the present invention, a method is
provided for splitting larger
suspended gas bubbles in a water flow into smaller bubbles and introducing
additional or
supplemental larger sized suspended gas bubbles in the water flow to increase
the potential for
production of greater quantities of smaller bubbles in the processed water
flow. The method
includes routing the water flow through an upstream fluid transport conduit or
pipe and toward a
water processor that is in-line with and downstream of the upstream conduit.
The water processor
may be similar or substantially identical to that described in the exemplary
embodiments above. The
water processor includes a conditioning element having a plurality of flow-
directing plates disposed
in spaced arrangement with one another and each plate includes a plurality of
flow-directing
apertures arranged in spaced arrangement. Each of the apertures has an edge
configuration (e.g.,
shape and comer radius) for splitting larger sized gas bubbles into smaller
sized bubbles. The
method includes introducing a turbulent flow of supplemental gas (e.g. air,
oxygen, ozone, etc.) into
the water flow upstream of and proximate the water processor to increase the
quantity of larger gas
-6-
Date Regue/Date Received 2022-10-27
bubbles in the water flow. The water processor processes the water flow (with
the increased
quantity of larger bubbles) by splitting the larger bubbles into smaller
bubbles as the water flow
passes through the processor. Preferably, a majority of the split, smaller
bubbles have a nano-bubble
size of much less than one millimeter (1 mm), more preferably less than about
one micrometer (1
pm), and most preferably less than about two-hundred nanometers (200 nm). The
water flow with
the split nano-bubbles is subsequently routed from the water processor to a
downstream fluid
transport conduit or pipe, which is in-line with and downstream of the water
processor. The
processed nano-bubble laden water is then routed toward a downstream portion
of a water
distribution or circulation system or portion thereof.
[0018] Accordingly, the present invention provides a water processor for
forming nano-bubbles in a
water flow, the nano-bubbles facilitating reduction of organic materials
present in water for
distribution downstream of the processor. The water processor provides a
staggered, circuitous, or
indirect flow path which, combined with sharp aperture edges, creates
turbulent and shear flow
inside of the processor. The turbulence and shear facilitates sufficient
interaction between the water
passing through the processor and the conditioning element to divide large gas
bubbles into smaller
nano-bubbles. When water laden with large gas bubbles is forced past the
plates through the
apertures under pressure, the larger bubbles contacting the aperture edges are
divided or split into
smaller bubbles, making the water laden or more saturated with nano-bubbles.
The water processor
may optionally be used for imparting desirable characteristics to potable
drinking water, to water
used in household or commercial plumbing and HVAC systems, to water used in
industrial
machinery or processes, to water used in clean-in-place (CIP) systems, to
water used in process
cooling systems, to water used in swimming pools, hot tubs, and spas, to water
used in ponds and
water features, for example.
[0019] These and other objects, advantages, purposes and features of this
invention will become
apparent upon review of the following specification in conjunction with the
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0020] FIG. 1 is a perspective view of a portion of a water processor in
accordance with the present
invention, the water processor depicted in phantom to show internal structure;
[0021] FIG. 2 is a sectional plan view of the water processor of FIG. 1;
[0022] FIG. 3 is a schematic diagram of an exemplary water distribution
system including the water
processor of FIG. 1;
-7-
Date Regue/Date Received 2022-10-27
[0023] FIG. 4 is a plan view of a water conditioning element of the water
processor of FIG. 1,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0024] FIG. 4A is a plan view of one of the conditioning element plates of
FIG. 4;
[0025] FIG. 4B is a plan view of the other conditioning element plate of
FIG. 4;
[0026] FIG. 5 is a perspective view of a portion of another water
processor in accordance with the
present invention, the water processor depicted in phantom to show internal
structure;
[0027] FIG. 6 is a sectional plan view of the water processor of FIG. 5;
[0028] FIG. 7 is a plan view of a water conditioning element of the water
processor of FIG. 5,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0029] FIG. 7A is a plan view of one of the conditioning element plates of
FIG. 7;
[0030] FIG. 7B is a plan view of the other conditioning element plate of
FIG. 7;
[0031] FIG. 8 is a sectional plan view of another water processor in
accordance with the present
invention;
[0032] FIG. 9 is a plan view of a water conditioning element of the water
processor of FIG. 8,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0033] FIG. 9A is a plan view of one of the conditioning element plates of
FIG. 9;
[0034] FIG. 9B is a plan view of the other conditioning element plate of
FIG. 9;
[0035] FIG. 10 is a perspective view of a portion of another water
processor in accordance with the
present invention, the water processor depicted in phantom to show internal
structure;
[0036] FIG. 11 is a sectional plan view of the water processor of FIG. 10;
[0037] FIG. 12 is a plan view of a water conditioning element of the water
processor of FIG. 10,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0038] FIG. 12A is a plan view of one of the conditioning element plates
of FIG. 12;
[0039] FIG. 12B is a plan view of the other conditioning element plate of
FIG. 12;
[0040] FIG. 13 is a perspective view of a portion of another water
processor in accordance with the
present invention, the water processor depicted in phantom to show internal
structure;
[0041] FIG. 14 is a sectional plan view of the water processor of FIG. 13;
-8-
Date Regue/Date Received 2022-10-27
[0042] FIG. 15 is a plan view of a water conditioning element of the water
processor of FIG. 13,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0043] FIG. 15A is a plan view of one of the conditioning element plates
of FIG. 15;
[0044] FIG. 15B is a plan view of the other conditioning element plate of
FIG. 15;
[0045] FIG. 16 is a perspective view of a portion of another water
processor in accordance with the
present invention, the water processor depicted in phantom to show internal
structure;
[0046] FIG. 17 is a sectional plan view of the water processor of FIG. 16;
[0047] FIG. 18 is a plan view of a water conditioning element of the water
processor of FIG. 16,
depicting two superimposed conditioning element plates and relative
positioning of flow-directing
apertures of the respective plates;
[0048] FIG. 18A is a plan view of one of the conditioning element plates
of FIG. 18;
[0049] FIG. 18B is a plan view of the other conditioning element plate of
FIG. 18;
[0050] FIG. 19 is a schematic diagram of an exemplary selectively
bypassable branch of a water
distribution system, including the water processor of FIG 1;
[0051] FIG. 20 is a front perspective view of a self-contained water
processing system in
accordance with the present invention, the water processing system including
the water processor of
FIG. 1 and a mixer injector upstream of the water processor;
[0052] FIG. 21 is a schematic diagram of the water processing system of
FIG. 20;
[0053] FIG. 22 is a top plan view of the water processing system of FIG.
20, including an exterior
support frame encasing the water processing system;
[0054] FIG. 23 is a perspective view of an exemplary mixer injector for
use with the water
processing system of FIG. 20;
[0055] FIG. 24 is a sectional view of another exemplary mixer injector for
use with the water
processing system of FIG. 20; and
[0056] FIG. 25 is a diagram of a method for processing water within a
water distribution system, in
accordance with the present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0057] Referring now to the drawings and the illustrative embodiments
depicted therein, a water
processor or conditioner 10 (FIG. 1) is provided for processing or
conditioning water passing
through a water system, such as exemplary single-pass water distribution
system 12 (FIG. 3) or
-9-
Date Regue/Date Received 2022-10-27
exemplary selectively bypassable branch 600 of a water distribution system
(FIG. 19). Optionally,
the water processor may be implemented in a closed water-circulating system,
such as a re-
circulating type heating system. Optionally, the water processor 10 may be
provided within a water
processing apparatus or system 700 that includes a mixer injector 702 for
introducing a
supplemental gas (e.g. air, oxygen, ozone, etc.) into the water passing
through the water system
upstream of the water processor 10 (FIGS. 20-22). The water processor 10
includes a housing 14
and a water processing or conditioning element 16 disposed inside the housing
14 along the
longitudinal axis of the housing 14. The water conditioning element 16
includes a plurality of water
conditioning element plates or discs, including a first water conditioning
element plate or disc 18
and a second water conditioning element plate or disc 20. The plates 18 and 20
have different
aperture patterns or configurations, wherein the first plate 18 has a first
pattern or configuration of
apertures 22 and the second plate 20 has a second pattern or configuration of
apertures 24 that is
different from the first pattern or configuration. The different
configurations of apertures 22 and 24
direct the flow of water through the water processor 10 and ensure adequate
shear and/or turbulence
of the water flow across the plates. The apertures of plates 18 and 20 have
sharp edges that facilitate
dividing or splitting of suspended gas bubbles into smaller bubbles, down to a
nano-bubble size of
much less than one millimeter (1 mm), preferably less than about one
micrometer (1 gm), and more
preferably less than about two-hundred nanometers (200 nm), referred to
hereinafter as "nano-
bubbles". The nano-bubble laden water treats or conditions the components of
the water distribution
or circulating system in which the water processor 10 is installed.
[0058] The water processor 10 is particularly useful for the reduction or
neutralization of biofilm-
producing organic materials and inorganic materials that are commonly present
in water that passes
through water processing systems, such as the exemplary water distribution
system 12. The reduced
sized nano-bubbles facilitate removal or reduction of microorganisms, organic
materials, biological
contaminants, and scaling minerals in the water. It will be appreciated that
additional water
conditioning functions may be performed by the water processor 10, such as
reducing soluble salts
or minerals in the water via ionization or other processes. Further, the water
processor 10 may be
used in combination with filtration systems or other water treatment devices,
such devices including
carbon cartridge (e.g. sediment) separators and/or UV light sterilization
systems.
[0059] The housing 14 of water processor 10 may be configured similar to
that of the water
conditioner disclosed in expired Australian Patent AU-B-70484/87, filed Mar.
19, 1987, the
-10-
Date Regue/Date Received 2022-10-27
disclosure of which is hereby incorporated herein by reference in its
entirety. The housing 14
includes an inlet 26 at one end and an outlet 28 at the opposite end (FIG. 2).
In the illustrated
embodiment, the housing 14 is formed of a cylindrical or tubular pipe of fluid
transport conduit
having an interior diameter of about three and one-quarter inches (3.25 in.),
however, it will be
appreciated that other embodiments of the water processor 10 may utilize
various diameters of
tubular pipe to form the housing. The diameters of the inlet 26 and outlet 28
are smaller than the
diameter of the main body of the housing 14, as shown in FIG. 2. However, it
will be appreciated
that the inlet 26 and outlet 28 diameters may be equal to or larger than the
diameter of the main
body of the housing 14, as desired to effect an optimal flow rate of water
passing through the
processor 10. Optionally, the housing 14 of the water processor may be omitted
and the plates 18
and 20 disposed directly inside of a water transport conduit of a water
distribution system without
substantially affecting the functionality and efficiency of the water
processor.
[0060] The conditioning element 16 is disposed on the interior of the
housing 14 between the inlet
26 and the outlet 28. In the illustrated embodiment of FIG. 2, the
conditioning element 16 includes
six first plates 18 and six second plates 20 positioned in alternating spaced
arrangement. However,
the number of first plates 18 and second plates 20 may be chosen in a variety
of quantities and
arrangements. For example, the conditioning element 16 may include twelve (12)
first plates 18 and
thirteen (13) second plates 20 positioned in alternating spaced arrangement
with a first plate 18
positioned closest to each end of the conditioning element 16.
[0061] The first plates 18 and the second plates 20 are fixedly disposed
in alternating spaced
arrangement along an elongate bar or rod 30 (FIG. 2). The rod 30 is
substantially coaxial with the
longitudinal axis of the housing 14. Each plate 18 and 20 includes a center
aperture 32 configured to
receive the rod 30 (FIGS. 4-4B). In the illustrated embodiments of FIGS. 4-
43B, the center aperture
32 is defined by a square hole through the center of each plate 18 and 20. The
square hole 32 is
sized and shaped to receive the rod 30 having a square cross-section
dimensioned similarly to
square hole 32. During assembly of the water processor 10, the plates 18 and
20 are fixed to the rod
30 to form a unitary assembly of the conditioning element 16 such that the
entire conditioning
element 16 may be inserted into the housing 14 pre-assembled, prior to
attachment of an end piece
including the inlet 26 or the outlet 28. In one exemplary embodiment, the
plates 18 and 20 may be
spaced at uniform intervals of up to about four inches (4 in.) along the rod
30. It will be appreciated
-11-
Date Regue/Date Received 2022-10-27
that larger spacing intervals may be advantageous depending on the flow rate,
water pressure, and
conduit inner diameter of the water processor.
[0062] The thickness of the plates 18 or 20 used in the processor 10 may
factor into the optimal
plate spacing for the processor. For example, in a water processor in which
the plates are about one
quarter of an inch (0.25 in.) thick, the plate spacing may be most optimal at
about one to one and a
half inches (1.0-1.5 in.). The diameter of housing 14, the number of plates 18
and 20, the
longitudinal spacing of plates 18 and 20, the aperture configuration of each
plate 18 and 20, and the
cross-sectional area and edge sharpness of each aperture 22 and 24 may be
chosen as a function of a
desired flow rate and pressure required for the water system. An exemplary
flow rate and pressure
drop for the water processor 10 may be about three and one-half pounds per
square inch (3.5 psi)
pressure drop, along the full length of water processor 10, at about fifty
gallons per minute (50 gpm)
flow rate.
[0063] As illustrated in FIGS. 4-4B, the first and second configurations
of apertures 22 and 24 of
respective first and second plates 18 and 20 are different from each other. In
the illustrated
embodiment of FIGS. 4 and 4A, the apertures 22 of first plate 18 include a
total of sixteen apertures
22 positioned in an outer ring of twelve (12) uniformly, contiguously, and
circumferentially-spaced
apertures and an inner ring of four (4) uniformly, contiguously, and
circumferentially-spaced
apertures 22. In the illustrated embodiment of FIGS. 4 and 4B, the apertures
24 of second plate 20
include a total of six apertures positioned in two (2) non-contiguous groups
of three (3) uniformly
spaced apertures. Each group of three apertures of the second plate 20 is non-
contiguous with
respect to the other group of three apertures as there is a discontinuation or
large interval in the
spacing between the two groups. Conversely, the outer ring of apertures and
inner ring of apertures
of first plate 18 may each be referred to as contiguous because there are no
discontinuations in their
uniform spacing. Adjacent apertures 22 of the outer ring of twelve apertures
of first plates 18 have a
different center-to-center spacing compared to the center-to-center spacing of
adjacent ones of
apertures 24 of second plates 20. The apertures 22 and 24 are typically cut
perpendicularly to the
planar faces of each plate. The perimeters of the plates 18 and 20 and the
apertures 22 and 24 of
each plate may be formed by waterj et cutting or laser cutting, which results
in a small-radiused
sharp edge defining the inlet-side and outlet-side edges of the plates and
each aperture. Preferably,
the sharpness of the apertures 22 and 24 is as sharp as a knife or razor edge,
with a radius of about
-12-
Date Regue/Date Received 2022-10-27
0.01 microns or less, and more preferably the edge sharpness is as sharp as
attainable through
known machining and cutting techniques.
[0064] In one exemplary embodiment, the apertures 22 of first plate 18
each have a diameter of
approximately one-half inch (0.5 in.), and the first plate 18 has a thickness
of one-quarter inch (0.25
in.) and a diameter of 3-7/32 inch (3.218 in.), which is about the same as or
slightly smaller than the
inner diameter of the housing 14. In another exemplary embodiment, the
apertures 24 of second
plate 20 each have a diameter of approximately three-quarter inch (0.75 in.),
and the second plate 20
has a thickness of about one-quarter inch (0.25 in.) and a diameter of 3-7/32
inch (3.218 in.), which
is about the same as or slightly smaller than the inner diameter of the
housing 14. The dimensioning
of the first and second plates 18, 20 to match the inner diameter of the
housing 14 results in most of
the water being forced through the first and second apertures 22, 24, although
at least a small
amount of water may be forced between a gap formed between an outer edge of a
given plate 18, 20
and the inner surface of the housing 14. As such, the outer edge of the plates
18 and 20 may further
impart nano-bubbles into the water flowing through the processer 10.
[0065] In reference to this exemplary embodiment, it will be appreciated
that the sixteen total first
apertures 22, each having one-half inch (0.5 in.) diameter, have somewhat
greater total opening
surface area (about 3.14 in2) as compared to the six total second apertures
24, each having three-
quarter inch (0.75 in.) diameter (about 2.65 in2). As a result, the speed of
water flow through the
second plate 20 must be greater than the speed of water flow through the first
plate 18, by about
18%, to maintain constant flow rates across the first and second plates 18,
20. However, it will be
appreciated that the apertures in each plate may be sized and numbered so as
to have equal total
opening surface areas and, therefore, equal flow speeds through each plate.
Optionally, the aperture
configurations of all plates in the conditioning element 16 may be the same
(e.g. as shown in FIG.
4A) or the aperture configurations of each plate in the conditioning element
16 may be different
than the aperture configuration of all the other plates, as desired.
[0066] The water flow speed may be determined and provided as a function
of the system in which
the processor 10 is disposed. The percentage of larger gas bubbles in a water
flow that are split or
divided into nano-bubbles may be increased or decreased as a function of the
water flow speed
passing through the processor 10. For example, in re-circulating systems, such
as a boiler heating
system, the water continuously passes through the processor and will, over
time, become more fully
saturated with nano-bubbles, and as a result the flow speed need not
necessarily be optimized.
-13-
Date Regue/Date Received 2022-10-27
Conversely, in single-pass water distribution systems in which water passes
through the processor
only a single time (e.g. water distribution system 12 of FIG. 3), the water
flow speed is
preferably optimized to ensure sufficient saturation of nano-bubbles in the
water distributed
downstream of the processor 10.
[0067] In the illustrated embodiment, the positioning of the two aperture
groups are mirrored across
a diametral axis of the plate 20 (FIG. 4B). The apertures 24 of plate 20 are
larger in diameter than
apertures 22 of plate 18, and as noted above, apertures 24 of second plates 20
have different center-
to-center spacing as compared to the outer ring of apertures 22 of first
plates 18. Accordingly, as
best shown in FIG. 4, when the plates 18 and 20 are disposed in alternating
spaced arrangement
along the rod 30, the apertures 22 of first plates 18 are not coaxially
aligned with the apertures 24 of
second plates 20, thus forming a staggered, circuitous, or substantially
indirect flow path along
which the water passes through the water processor 10. By imparting a
circuitous flow path, the
water flow has little to no direct path through the processor, causing the
flow to be turbulent, which
thereby causes the water and gas bubbles passing through the water processor
10 to mix and shear
across the plate edges defining the apertures. The mixing of the water
facilitates contact of the gas
bubbles with the aperture edges of the plates 18 and 20, thereby effectuating
sufficient division of
larger gas bubbles into nano-bubbles.
[0068] The first plates 18 are symmetrical about all four quadrants of the
circumference of the
plate. As such, the apertures 22 of each first plate 18 are co-axial with the
corresponding apertures
22 of the other first plates 18, regardless of the rotational orientation of
each first plate 18 when the
plates are disposed on the square rod 30. The configuration of apertures 24 of
the second plates 20
may be offset by ninety degrees relative to the other second plates 20 when
the plates 20 are
disposed on the square rod 30. For example, one of the second plates 20 may be
rotated ninety
degrees relative to another second plate such that the center aperture of each
group of three
apertures is not co-axial with an aperture 24 on the other second plate 20.
[0069] The exemplary water system 12 of FIG. 3 is illustrative of how the
water processor 10 may
be utilized in a water treatment or distribution process. The water system 12
includes a series or
network of water transport conduits or lines (e.g. cylindrical or tubular
pipes), a water processor 10
installed in-line with one of the water conduits, and a pump 34 to pressurize
and force water
through the water processor 10. A plurality of shutoff valves 36 are provided
in the system 12 to
selectively disrupt the flow of water through the system 12. A plurality of
bypass valves 38 and
-14-
Date Regue/Date Received 2022-10-27
bypass water lines 40 are provided with the system to bypass the various
components of the system
12, such as for maintenance of a particular component of the system 12.
Additional components of
the exemplary water system 12 include combination balancing/shut-off valves
42, strainers 44, and
check valves 46, such as shown in FIG. 3.
[0070] The components of the water processor 10 may each be formed of a
metal alloy which is
inert and resistant to corrosion, such as 316 stainless steel, such that the
main processor components
do not chemically react or interact with the water passing through the water
processor 10.
Conversely, the components of the water processor 10 may be formed of
different of metal alloys
having different chemical characteristics to facilitate water processing and
conditioning functions,
such as ionizing or deionizing the water in the distribution system, for
example.
[0071] The following provide additional exemplary embodiments for water
processors in
accordance with this disclosure. The following exemplary water processors, as
illustrated in FIGS.
5-18B, are configured similarly and function in similar fashion to water
processor 10 described
above, with significant differences discussed hereinafter.
[0072] Referring now to the illustrative embodiment of FIGS. 5-7B, another
water processor 100 is
provided for processing or conditioning water passing through a water system.
The water processor
100 includes a housing 102 and a water processing or conditioning element 104
disposed inside the
housing 102 along the longitudinal axis of the housing 102. The water
conditioning element 104
includes a plurality of first water conditioning element plates or discs 106
and a plurality of second
water conditioning element plates or discs 108. The plates 106, 108 have
different aperture patterns
or configurations, wherein the first plate 106 has a first pattern or
configuration of apertures 110
(FIGS. 7 and 7A) and the second plate 108 has a second pattern or
configuration of apertures 112
(FIGS. 7 and 7B) that is different from the first pattern or configuration of
apertures 110. The
housing 102 includes an inlet 114 at one end and an outlet 116 at the opposite
end (FIG. 6). In the
illustrated embodiment, the housing 102 is formed of a cylindrical or tubular
pipe of fluid transport
conduit having an interior diameter of about 1.37 in. The plates 106 and 108
are fixedly disposed in
alternating spaced arrangement along an elongate bar or rod 118 (FIG. 6). Each
plate 106 and 108
includes a center aperture 120 configured to receive the rod 118 (FIGS. 7-7B).
[0073] In one exemplary embodiment, as illustrated in FIGS. 7-7B, the
first plate 106 includes a
total of twelve (12) uniformly, circumferentially-spaced apertures 110 and the
second plate 108
includes a total of four (4) uniformly, circumferentially-spaced apertures
112. The apertures 110 of
-15-
Date Regue/Date Received 2022-10-27
first plate 106 each have a diameter of approximately 1/8 inch (0.125 in.),
and the apertures 112 of
second plate 108 each have a diameter of approximately 1/4 inch (0.25 in.).
The plates 106 and 108
each have a thickness of 1/4 inch (0.25 in.) and a diameter of about 1-3/10
inch (1.3 in.), which is
about the same as or slightly smaller than the inner diameter of the housing
102. The apertures 112
of plate 108 are larger in diameter than apertures 110 of plate 106 and have
different center-to-
center spacing as compared to apertures 110 of first plates 106. Accordingly,
as best shown in FIG.
7, when the plates 106 and 108 are disposed in alternating spaced arrangement
along the rod 118,
the apertures 110 of first plates 106 are not coaxi ally aligned with the
apertures 112 of second plates
108, thus forming a staggered, circuitous, or substantially indirect flow path
along which the water
passes through the water processor 100.
100741 In the illustrated embodiment, the first plates 106 and the second
plates 108 are each
symmetrical about all four quadrants of the circumference of the respective
plate (FIGS. 7-7B). As
such, the apertures 110 of each first plate 106 are co-axial with the
corresponding apertures 110 of
the other first plates 106 and the apertures 112 of each second plate 108 are
co-axial with the
corresponding apertures 112 of the other second plates 108, regardless of the
rotational orientation
of each plate when the plates are disposed on the square rod 118.
100751 Referring now to the illustrative embodiment of FIGS. 8-9B, another
water processor 200 is
provided for processing or conditioning water passing through a water system.
The water processor
200 includes a housing 202 and a water processing or conditioning element 204
disposed inside the
housing 202 along the longitudinal axis of the housing 202. The water
conditioning element 204
includes a plurality of first water conditioning element plates or discs 206
and a plurality of second
water conditioning element plates or discs 208. The plates 206, 208 have
different aperture patterns
or configurations, wherein the first plate 206 has a first pattern or
configuration of apertures,
including an outer ring of first apertures 210 and an inner ring of second
apertures 211 (FIGS. 9 and
9A) and the second plate 208 has a second pattern or configuration of
apertures 212 (FIGS. 9 and
9B) that is different from the first pattern or configuration of apertures
210, 211. The housing 202
includes an inlet 214 at one end and an outlet 216 at the opposite end (FIG.
8). In the illustrated
embodiment, the housing 202 is formed of a cylindrical or tubular pipe of
fluid transport conduit
having an interior diameter of about 1.87 in. The plates 206 and 208 are
fixedly disposed in
alternating spaced arrangement along an elongate bar or rod 218 (FIG. 8). Each
plate 206 and 208
includes a center aperture 220 configured to receive the rod 218 (FIGS. 9-9B).
-16-
Date Regue/Date Received 2022-10-27
100761 In one exemplary embodiment, as illustrated in FIGS. 9-9B, the
first plate 206 includes a
total of twenty-four (24) apertures positioned in an outer ring of twelve (12)
uniformly,
circumferentially-spaced apertures 210 and an inner ring of twelve (12)
uniformly,
circumferentially-spaced apertures 211. The second plate 208 includes a total
of eight (8) uniformly,
circumferentially-spaced apertures 212. The apertures 210 in the outer ring of
apertures of first plate
206 each have a diameter of approximately one-quarter inch (0.25 in.), the
apertures 211 in the
inner ring of apertures of first plate 206 each have a diameter of
approximately 1/8 inch (0.125 in.),
and the apertures 212 of second plate 208 each have a diameter of
approximately 3/8 inch (0.375
in.). The plates 206 and 208 each have a thickness of 1/4 inch (0.25 in.) and
a diameter of about
(1.85 in. which is about the same as or slightly smaller than the inner
diameter of the housing 202.
The apertures 212 of plate 208 are larger in diameter than apertures 210 and
211 of plate 206 and
have different center-to-center spacing as compared to apertures 210 and 211
of first plates 206.
Accordingly, as best shown in FIG. 9, when the plates 206 and 208 are disposed
in alternating
spaced arrangement along the rod 218, the apertures 210 and 211 of first
plates 206 are not
coaxially aligned with the apertures 212 of second plates 208, thus forming a
staggered, circuitous,
or substantially indirect flow path along which the water passes through the
water processor 200.
Nom In the illustrated embodiment, the first plates 206 and the second
plates 208 are each
symmetrical about all four quadrants of the circumference of the respective
plate (FIGS. 9-9B). As
such, the apertures 210 of each first plate 206 are co-axial with the
corresponding apertures 210 of
the other first plates 206 and the apertures 212 of each second plate 208 are
co-axial with the
corresponding apertures 212 of the other second plates 208, regardless of the
rotational orientation
of each plate when the plates are disposed on the square rod 218.
100781 Referring now to the illustrative embodiment of FIGS. 10-10B,
another water processor 300
is provided for processing or conditioning water passing through a water
system. The water
processor 300 includes a housing 302 and a water processing or conditioning
element 304 disposed
inside the housing 302 along the longitudinal axis of the housing 302. The
water conditioning
element 304 includes a plurality of first water conditioning element plates or
discs 306 and a
plurality of second water conditioning element plates or discs 308. The plates
306, 308 have
different aperture patterns or configurations, wherein the first plate 306 has
a first pattern or
configuration of apertures 310 (FIGS. 12 and 12A) and the second plate 308 has
a second pattern or
configuration of apertures 312 (FIGS. 12 and 12B) that is different from the
first pattern or
-17-
Date Regue/Date Received 2022-10-27
configuration of apertures 310. The housing 302 includes an inlet 314 at one
end and an outlet 316
at the opposite end (FIG. 11). In the illustrated embodiment, the housing 302
is formed of a
cylindrical or tubular pipe of fluid transport conduit having an interior
diameter of about 4.26 in.
The plates 306 and 308 are fixedly disposed in alternating spaced arrangement
along an elongate
bar or rod 318 (FIG. 11). Each plate 306 and 308 includes a center aperture
320 configured to
receive the rod 318 (FIGS. 12-12B).
[0079] In one exemplary embodiment, as illustrated in FIGS. 12-12B, the
first plate 306 includes a
total of twenty-four (24) apertures 310 positioned in an outer ring of twelve
(12) uniformly,
circumferentially-spaced apertures 310 and an inner ring of twelve (12)
uniformly,
circumferentially-spaced apertures 310. The second plate 308 includes a total
of eight (8) uniformly,
circumferentially-spaced apertures 312. The apertures 310 of first plate 306
each have a diameter of
approximately 1/2 inch (0.5 in.), and the apertures 312 of second plate 308
each have a diameter of
approximately one inch (1.0 in.). The plates 306 and 308 each have a thickness
of 1/4 inch (0.25 in.)
and a diameter of about 4-3/16 inch (4.188 in.), which is about the same as or
slightly smaller than
the inner diameter of the housing 302. The apertures 312 of plate 308 are
larger in diameter than
apertures 310 of plate 306 and have different center-to-center spacing as
compared to apertures 310
of first plates 306. Accordingly, as best shown in FIG. 12, when the plates
306 and 308 are disposed
in alternating spaced arrangement along the rod 318, the apertures 310 of
first plates 306 are not
coaxially aligned with the apertures 312 of second plates 308, thus forming a
staggered, circuitous,
or substantially indirect flow path along which the water passes through the
water processor 300.
[0080] In the illustrated embodiment, the first plates 306 and the second
plates 308 are each
symmetrical about all four quadrants of the circumference of the respective
plate (FIGS. 12-12B).
As such, the apertures 310 of each first plate 306 are co-axial with the
corresponding apertures 310
of the other first plates 306 and the apertures 312 of each second plate 308
are co-axial with the
corresponding apertures 312 of the other second plates 308, regardless of the
rotational orientation
of each plate when the plates are disposed on the square rod 318.
[0081] Referring now to the illustrative embodiment of FIGS. 13-15B,
another water processor 400
is provided for processing or conditioning water passing through a water
system. The water
processor 400 includes a housing 402 and a water processing or conditioning
element 404 disposed
inside the housing 402 along the longitudinal axis of the housing 402. The
water conditioning
element 404 includes a plurality of first water conditioning element plates or
discs 406 and a
-18-
Date Regue/Date Received 2022-10-27
plurality of second water conditioning element plates or discs 408. The plates
406, 408 have
different aperture patterns or configurations, wherein the first plate 406 has
a first pattern or
configuration of apertures 410 (FIGS. 15 and 15A) and the second plate 408 has
a second pattern or
configuration of apertures, including an outer ring of alternating larger
apertures 412 and medium-
sized apertures 413 and an inner ring of smaller apertures 415 (FIGS. 15 and
15B) that is different
from the first pattern or configuration of apertures 410. The housing 402
includes an inlet 414 at
one end and an outlet 416 at the opposite end (FIG. 14). In the illustrated
embodiment, the housing
402 is formed of a cylindrical or tubular pipe of fluid transport conduit
having an interior diameter
of about 6.36 in. The plates 406 and 408 are fixedly disposed in alternating
spaced arrangement
along an elongate bar or rod 418 (FIG. 14). Each plate 406 and 408 includes a
center aperture 420
configured to receive the rod 418 (FIGS. 15-15B).
100821 In one exemplary embodiment, as illustrated in FIGS. 15-15B, the
first plate 406 includes a
total of twenty-four (24) apertures 410 positioned in an outer ring of sixteen
(16) uniformly,
circumferentially-spaced apertures 410 and an inner ring of eight (8)
uniformly, circumferentially-
spaced apertures 410. The second plate 408 includes a total of twelve (12)
apertures positioned in an
outer ring of apertures and an inner ring of apertures. The outer ring of
apertures of plate 408
includes four (4) larger apertures 412 and four (4) medium sized apertures 413
alternatingly and
uniformly circumferentially-spaced with one another. The inner ring of
apertures of plate 408
includes four (4) uniformly, circumferentially-spaced smaller apertures 415.
The apertures 410 of
first plate 406 each have a diameter of approximately 3/4 inch (0.75 in.). The
larger apertures 412 in
the outer ring of apertures of second plate 408 each have a diameter of
approximately 1-1/2 inches
(1.5 in.), the medium-sized apertures 413 in the outer ring of apertures of
second plate 408 each
have a diameter of approximately one inch (1.0 in.), and the smaller apertures
415 in the inner ring
of apertures of second plate 408 each have a diameter of approximately three-
quarter inch (0.75 in.).
The plates 406 and 408 each have a thickness of 1/4 inch (0.25 in.) and a
diameter of about 6.31 in.,
which is about the same as or slightly smaller than the inner diameter of the
housing 402. The
apertures 412,413 in the outer ring of apertures of plate 408 are larger in
diameter than apertures
410 of plate 406 and have different center-to-center spacing as compared to
apertures 410 of first
plates 406. The apertures 415 in the inner ring of apertures of plate 408 have
a different center-to-
center spacing as compared to apertures 410 of first plates 406. Accordingly,
as best shown in FIG.
15, when the plates 406 and 408 are disposed in alternating spaced arrangement
along the rod 418,
-19-
Date Regue/Date Received 2022-10-27
the apertures 410 of first plates 406 are not coaxially aligned with the
apertures 412, 413, and 415
of second plates 408, thus forming a staggered, circuitous, or substantially
indirect flow path along
which the water passes through the water processor 400.
[0083] In the illustrated embodiment, the first plates 406 and the second
plates 408 are each
symmetrical about all four quadrants of the circumference of the respective
plate (FIGS. 15-15B).
As such, the apertures 410 of each first plate 406 are co-axial with the
corresponding apertures 410
of the other first plates 406 and the respective apertures 412, 413, and 415
of each second plate 408
are co-axial with the corresponding apertures 412, 413, and 415 of the other
second plates 408,
regardless of the rotational orientation of each plate when the plates are
disposed on the square rod
418.
[0084] Referring now to the illustrative embodiment of FIGS. 16-18B,
another water processor 500
is provided for processing or conditioning water passing through a water
system. The water
processor 500 includes a housing 502 and a water processing or conditioning
element 504 disposed
inside the housing 502 along the longitudinal axis of the housing 502. The
water conditioning
element 504 includes a plurality of first water conditioning element plates or
discs 506 and a
plurality of second water conditioning element plates or discs 508. The plates
506, 508 have
different aperture patterns or configurations, wherein the first plate 506 has
a first pattern or
configuration of apertures 510 (FIGS. 18 and 18A) and the second plate 508 has
a second pattern or
configuration of apertures 512 (FIGS. 18 and 18B) that is different from the
first pattern or
configuration of apertures 510. The housing 502 includes an inlet 514 at one
end and an outlet 516
at the opposite end (FIG. 17). In the illustrated embodiment, the housing 502
is formed of a
cylindrical or tubular pipe of fluid transport conduit having an interior
diameter of about 8.33 in.
The plates 506 and 508 are fixedly disposed in alternating spaced arrangement
along an elongate
bar or rod 518 (FIG. 17). Each plate 506 and 508 includes a center aperture
520 configured to
receive the rod 518 (FIGS. 18-18B).
[0085] In one exemplary embodiment, as illustrated in FIGS. 18-18B, the
first plate 506 includes a
total of thirty-two (32) apertures 510 positioned in an outer ring of sixteen
(16) uniformly,
circumferentially-spaced apertures 510, a middle ring of twelve (12)
uniformly, circumferentially-
spaced apertures 510, and an inner ring of four (4) uniformly,
circumferentially-spaced apertures
510. The second plate 508 includes a total of eight (8) uniformly,
circumferentially-spaced apertures
512. The apertures 510 of first plate 506 each have a diameter of
approximately one inch (1.0 in.),
-20-
Date Regue/Date Received 2022-10-27
and the apertures 512 of second plate 508 each have a diameter of
approximately two inches (2.0
in.). The plates 506 and 508 each have a thickness of 1/4 inch (0.25 in.) and
a diameter of about
8.26 in., which is about the same as or slightly smaller than the inner
diameter of the housing 502.
The apertures 512 of plate 508 are larger in diameter than apertures 510 of
plate 506 and have
different center-to-center spacing as compared to apertures 510 of first
plates 506. Accordingly, as
best shown in FIG. 18, when the plates 506 and 508 are disposed in alternating
spaced arrangement
along the rod 518, the apertures 510 of first plates 506 are not coaxially
aligned with the apertures
512 of second plates 508, thus forming a staggered, circuitous, or
substantially indirect flow path
along which the water passes through the water processor 500.
[0086] In the illustrated embodiment, the first plates 506 and the second
plates 508 are each
symmetrical about all four quadrants of the circumference of the respective
plate (FIGS. 18-18B).
As such, the apertures 510 of each first plate 506 are co-axial with the
corresponding apertures 510
of the other first plates 506 and the apertures 512 of each second plate 508
are co-axial with the
corresponding apertures 512 of the other second plates 508, regardless of the
rotational orientation
of each plate when the plates are disposed on the square rod 518.
[0087] The water processors 10, 100, 200, 300, 400, and 500 of the
illustrated embodiments of
FIGS. 1-18B may be coupled to upstream and downstream fluid distribution
conduits or pipes by
various connection types. For example, as shown in the water processor
embodiments 10, 300, 400,
and 500 illustrated in FIGS. 1 and 10, 13, and 16, a flange or collar 48 and a
reducer or tapered
portion 49 may be provided at each end of the respective water processor. As
illustrated in FIG. 19,
the flange 48 of the water processor 10 attaches or mates to a corresponding
flange or collar 50 of
an upstream pipe 52 or downstream pipe 54. The mated flanges 48 and 50 are
secured together,
such as with mechanical fasteners or welds, in order to form a watertight
connection between the
water processor and the upstream and downstream pipes. For another example, as
shown in the
water processor embodiment 100 of FIG. 5, a pipe fitting 56 and reducer 58 may
be provided at
each end of the respective water processor. The pipe fitting 56 attaches or
mates to a corresponding
pipe fitting (or a pipe itself) of an upstream or downstream pipe. It will be
appreciated that the pipe
fitting 56 may be one of many known pipe fitting types, such as slip fittings,
sweat fittings,
compression fittings, male national pipe taper (MNPT) fittings, female
national pipe taper (FNPT)
fittings, etc.
-21-
Date Regue/Date Received 2022-10-27
[0088] Referring now to the illustrative embodiment of FIG. 19, the
exemplary selectively
bypassable branch 600 provides a detailed view of a water processor 10
installed in a water
distribution system, such as system 12 shown in FIG. 3. The bypassable branch
600 includes an
upstream shutoff valve 36a installed with the upstream pipe 52 and a
downstream shutoff valve 36b
installed with the downstream pipe 54 to selectively disrupt the flow of water
through the branch
600 and to and from the water processor 10. A bypass valve 38 and a bypass
water line 40 are
provided with the branch 600 to bypass the water processor 10, such as for
maintenance of the
water processor.
[0089] Referring now to the illustrative embodiments of FIGS. 20-24, the
water processing system
or apparatus 700 is provided for a water distribution system. The water
processing system 700 may
form a subsystem of the overall water distribution system. The water
processing system 700 is
provided for introducing additional gas bubbles into a water flow and
subsequently splitting
suspended gas bubbles in the water flow into smaller bubbles. The water
processing system includes
a water processor, such as water processor 10 described above. The water
processor 10 includes a
conditioning element 16 between an inlet 26 and outlet 28 of the processor
housing 14. The water
processor 10 is provided for splitting suspended gas bubbles in the water flow
into smaller bubbles.
The water processing system 700 further includes a mixer injector 702 upstream
of the water
processor 10 to introduce a supplemental gas (e.g. air, oxygen, ozone, etc.),
in the form of additional
gas bubbles, into the water flow upstream of the conditioning element 10.
[0090] Exemplary mixer injectors for use with the water processing system
700 include those
described and illustrated in U.S. Pat. No. 4,123,800, U.S. Pat. No. 5,863,128õ
and U.S. Pat. No.
7,779,864, the disclosures of which are hereby incorporated herein by
reference in their entireties.
The mixer injector 702 includes an injector body 704 having an upstream inlet
706, a downstream
outlet 708, and an injector inlet 710 positioned at a center portion of body
704 between the
upstream inlet 706 and downstream outlet 708 (FIGS. 23 and 24). A water
conduit portion 709 is
formed through the axial center of the body 704 between the inlet 706 and
outlet 708. A constriction
712 in a center portion of the water conduit portion 709 is located adjacent
to the injector inlet 710
(FIG. 24). As the water flow passes through the mixer injector 702, the
constriction 712 creates a
venturi effect, or pressure drop, in the water flow near the injector inlet
710. The pressure drop
creates a vacuum or reduced pressure zone, which draws the supplemental gas
into the water flow
through the injector inlet 710, upstream of the water processor 10.
-22-
Date Regue/Date Received 2022-10-27
[0091] Preferably, the supplemental gas enters the water flow in a
turbulent manner such that gas
bubbles are entrained within the water flow. As such, the total volume of gas
and quantity of gas
bubbles in the water flow upstream of the water processor 10 is increased, as
compared to a similar
water flow without supplemental gas. The water processor 10 subsequently
processes the water
flow with additional larger bubbles as it passes through the processor. The
increase in gas volume
and quantity of larger bubbles passing through the water processor 10
facilitates a higher saturation
or concentration of nano-bubbles in the processed water flow, as compared to a
similar water flow
without supplemental gas added. It may only be necessary that the supplemental
gas be maintained
at atmospheric pressure such that the pressure drop inside the mixer injector
702 creates a pressure
below atmospheric pressure to draw the supplemental gas (at roughly
atmospheric pressure) into the
water flow. However, it will be appreciated that the supplemental gas may be
maintained at a
desired pressure above atmospheric pressure in order to ensure an adequate
flow volume and/or
desired turbulence of the supplemental gas as it enters the water flow. As an
example, the mixer
injector 702 may be a three-quarter inch (0.75 in.) injector, Model No. 0584
from Mazzei Injector
Company, LLC of Bakersfield, Calif.
[0092] The water processing system 700 includes a network or series of
fluid transport conduits or
pipes for directing a water flow through the various components of the system
700, including an
upstream inlet conduit or pipe 714 and a downstream outlet or discharge
conduit or pipe(s) 716
(FIGS. 20-22). A pump 718 is positioned downstream of the inlet pipe 714 to
pressurize and force
water from the inlet pipe 714 through the system 700. A plurality of shutoff
valves 720 are provided
to selectively disrupt or restrict the flow of water through the system 700. A
bypass valve 722 and a
bypass conduit or pipe 724 are provided with the system 700 to bypass the
mixer injector 702, such
as for maintenance of the system 700 (FIGS. 20 and 21). A strainer 726, a
check valve 728, a flow
meter 730, and a set of pressure meters 732 are also provided with the system
700 (FIG. 21). In the
illustrated embodiment of FIG. 22, the water processing system 700 is
supported within an exterior
frame 734 encasing and protecting the components of the system 700.
[0093] Referring to the illustrative embodiment of FIG. 25, a method 800
is provided for splitting
larger suspended gas bubbles in a water flow passing through a water
distribution system or
circulation system into smaller bubbles. The method includes routing 802 the
water flow through an
upstream fluid transport conduit or pipe 714 toward a water processor 10 that
is in-line with and
downstream of the upstream conduit 714. It will be appreciated that while
water processor 10 is
-23 -
Date Regue/Date Received 2022-10-27
described with method 800, either of water processors 100, 200, 300, 400, or
500 may be utilized in
a system for performing method 800, as well as any other suitable water
processor or conditioner.
The method 800 includes introducing 804 a supplemental gas into the water flow
upstream of and
proximate the water processor 10 to increase the gas volume and number of
larger gas bubbles
entrained in the water flow. As described in detail above with reference to
FIGS. 1, 2, and 4-4B, the
exemplary water processor 10 includes a conditioning element 16 having a
plurality of flow-
directing first plates 18 and second plates 20 disposed in alternating spaced
arrangement with one
another and each plate includes a plurality of flow-directing apertures
arranged in spaced
arrangement. Each of the apertures has an edge configuration for splitting
larger sized gas bubbles
into smaller sized bubbles.
[0094] The water processor 10 processes 806 the water flow with the
increased larger bubbles by
splitting the larger bubbles into smaller bubbles as the water flow passes
through the processor 10
(FIG. 25). Preferably, a majority of the split, smaller bubbles have a nano-
bubble size of much less
than one millimeter (1 mm), more preferably less than about one micrometer (1
gm), and most
preferably less than about two-hundred nanometers (200 nm). The water flow
with the split, smaller
bubbles is subsequently routed 808 from the water processor 10 to a downstream
fluid transport
conduit or pipe 716, which is in-line with and downstream of the water
processor 10 (FIGS. 20-22
and 25. The supplemental gas is introduced 804 via a mixer injector 702 that
is positioned along the
upstream fluid transport conduit 714 and upstream of and proximate the water
processor 10 (FIGS.
20-22 and 25). As the water flow passes the constriction 712 in the injector
702, the water
experiences a pressure drop that is used to draw the supplemental gas into the
water flow and
toward the water processor 10 (FIGS. 20-25). By introducing 804 a supplemental
gas into the water
flow, method 800 effectively increases the potential quantity of nano-bubbles
that can be formed or
created within the water processor 10. Thus, method 800 provides additional
nano-bubbles in the
processed water flow for more efficient and effective treatment of downstream
equipment or
systems.
[0095] Thus, the exemplary water processors, water processing system, and
method provide for
creating a processed water flow that is substantially saturated with nano-
bubbles. The water
processor includes a staggered, circuitous, or substantially indirect flow
path through the water
processor, which facilitates sufficient interaction between the water and the
conditioning element of
the processor. The conditioning element is formed of alternating conditioning
element plates or
-24-
Date Regue/Date Received 2022-10-27
discs. The plates include respective patterns or configurations of flow-
directing apertures. Due to
the alternating arrangement of the plates and aperture configurations, the
water passing through the
processor becomes turbulent. The turbulence ensures that the water passing the
processor is
sufficiently processed by contacting the aperture edges of the plates. The
edges of the apertures cut
or split suspended gas bubbles into smaller nano-bubbles. The aperture
configurations, the aperture
edge sharpness, the spacing of the alternating plates, and the dimensions of
the water processor can
be selected as a function of desired nano-bubble saturation, required water
flow rates, and required
pressures necessary for the downstream water distribution or processing
system. Optionally, the
water processing system includes a mixer injector for introducing a
supplemental gas (e.g.
additional larger gas bubbles of air, oxygen, ozone, etc.) into the water flow
upstream of the water
processor. The increased larger bubbles within the water flow provide for a
greater potential
quantity of nano-bubbles that can be created within the water processor, and
therefore a processed
water flow with higher saturation of nano-bubbles for treating downstream
functions and systems.
100961 Changes and modifications in the specifically described embodiments
can be carried out
without departing from the principles of the present invention which is
intended to be limited only
by the scope of the appended claims, as interpreted according to the
principles of patent law
including the doctrine of equivalents.
-25-
Date Regue/Date Received 2022-10-27
